Polymers in electronics : : based on a symposium sponsored by the Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983

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Polymers in electronics : : based on a symposium sponsored by the Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983 / Theodore Davidson, editor

資料種別:

電子ブック

出版情報:

Washington, DC : American Chemical Society, 1984

形態:

1 online resource (620 pages)

シリーズ名:

ACS symposium series ; 242

著者名:

ISBN:

9780841210707 [0841210705]

書誌ID:

EB00001996

子書誌情報

フルテキスト

所蔵情報

書誌詳細

注記:

Includes bibliographical references and index.
Distributed in print by Oxford University Press.

主題:

Butadienes; Catalysis; Drug Compounding; Elastomers; Elastomers--analysis; Electric Conductivity; Electricity; Electrochemistry; Electronics; Electrons; Engraving and Engravings; Hot Temperature; Imides--chemical synthesis; Lewis Acids--analysis; Organometallic Compounds; Photoacoustic Techniques; Physical Phenomena; Plasma Gases; Plasma Gases--chemical synthesis; Polyacetylenes; Polyenes--analysis; Polymerization; Polymers; Polymers--analysis; Polymers--chemical synthesis; Printing; Quinones--analysis; Radiochemistry; Semiconductors; Solvents; Spectroscopy, Fourier Transform Infrared; Spectrum Analysis; Surface Properties; TECHNOLOGY & ENGINEERING / Materials Science / Electronic Materials; TECHNOLOGY & ENGINEERING / Textiles & Polymers; Tellurium; Thermogravimetry; Vinyl Compounds--analysis

言語:

英語

目次情報:

Applications of Photoinitiated Cationic Polymerization to the Development of New Photoresists / Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing / Semiempirical Calculations of Electronic Spectra: Use in the Design of Mid-UV Sensitizers / Mid-UV Photosensitization of Diazoquinone Positive Photoresists / Deep UV Photolithography with Composite Photoresists Made of Poly(olefin sulfones) / Method for a Comparative Study of Positive Photoresist Lithographic Performance / Dependence of Dissolution Rate on Processing and Molecular Parameters of Resists / Effect of Composition on Resist Dry-Etching Susceptibility: Novel Vinyl Polymers / Resists for Electron Beam Lithography / Chain-Scission Yields of Methacrylate Copolymers Under Electron Beam Radiation / Poly(tetrafluorochloropropyl methacrylate) as Positive Electron Resist / Radiation-Induced Degradation of Poly(2-methyl-1-pentene sulfone): Kinetics and Mechanism / The Radiation Degradation of Poly(2-methyl-1-pentene sul / CRIVELLO, J. V. / ITO, HIROSHI; WILLSON, C. GRANT / MILLER, R. D.; MCKEAN, D. R.; TOMPKINS, T. L.; CLECAK, N.; WILLSON, C. GRANT; MICHL, J.; DOWNING, J. / BABIE, W. T.; CHOW, M-F.; MOREAU, W. M. / HIRAOKA, H.; WELSH, L. W. / WALKER, C. C.; HELBERT, J. N. /

Plasma Polymerized Organometallic Thin Films: Preparation and Properties / Polyacetylene, (CH)x: An Electrode-Active Material in Aqueous and Nonaqueous Electrolytes / / SADHIR, R. K.; SAUNDERS, H. E.; JAMES, W. J. / KANER, R. B.; MACDIARMID, A. G.; MAMMONE, R. J. /

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