Spectroscopic Ellipsometry: Principles and Applications

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Spectroscopic Ellipsometry: Principles and Applications / Hiroyuki Fujiwara

資料種別:: 電子ブック
出版情報:: Wiley Online Library - AutoHoldings Books
Chichester : John Wiley & Sons, Inc., 2007
著者名:: Fujiwara, Hiroyuki
ISBN:: 9780470016084 [0470016086]
9780470060193 [0470060190]
書誌ID:: OB00561614

子書誌情報

フルテキスト

所蔵情報

書誌詳細

その他の標題:

SPECTROSCOPIC ELLIPSOMETRY

言語:

英語

目次情報:

Foreword

Preface

Acknowledgments

Introduction to Spectroscopic Ellipsometry / 1：

Features of Spectroscopic Ellipsometry / 1.1：

Applications of Spectroscopic Ellipsometry / 1.2：

Data Analysis / 1.3：

History of Development / 1.4：

Future Prospects / 1.5：

References

Principles of Optics / 2：

Propagation of Light / 2.1：

Propagation of One-Dimensional Waves / 2.1.1：

Electromagnetic Waves / 2.1.2：

Refractive Index / 2.1.3：

Dielectrics / 2.2：

Dielectric Polarization / 2.2.1：

Dielectric Constant / 2.2.2：

Dielectric Function / 2.2.3：

Reflection and Transmission of Light / 2.3：

Refraction of Light / 2.3.1：

p- and s-Polarized Light Waves / 2.3.2：

Reflectance and Transmittance / 2.3.3：

Brewster Angle / 2.3.4：

Total Reflection / 2.3.5：

Optical Interference / 2.4：

Optical Interference in Thin Films / 2.4.1：

Multilayers / 2.4.2：

Polarization of Light / 3：

Representation of Polarized Light / 3.1：

Phase of Light / 3.1.1：

Polarization States of Light Waves / 3.1.2：

Optical Elements / 3.2：

Polarizer (Analyzer) / 3.2.1：

Compensator (Retarder) / 3.2.2：

Photoelastic Modulator / 3.2.3：

Depolarizer / 3.2.4：

Jones Matrix / 3.3：

Jones Vector / 3.3.1：

Transformation of Coordinate Systems / 3.3.2：

Jones Matrices of Optical Elements / 3.3.3：

Representation of Optical Measurement / Jones Matrices3.3.4：

Stokes Parameters / 3.4：

Definition of Stokes Parameters / 3.4.1：

Poincare Sphere / 3.4.2：

Partially Polarized Light / 3.4.3：

Mueller Matrix / 3.4.4：

Principles of Spectroscopic Ellipsometry / 4：

Principles of Ellipsometry Measurement / 4.1：

Measured Values in Ellipsometry / 4.1.1：

Coordinate System in Ellipsometry / 4.1.2：

Jones and Mueller Matrices of Samples / 4.1.3：

Ellipsometry Measurement / 4.2：

Measurement Methods of Ellipsometry / 4.2.1：

Rotating-Analyzer Ellipsometry (RAE) / 4.2.2：

Rotating-Analyzer Ellipsometry with Compensator / 4.2.3：

Rotating-Compensator Ellipsometry (RCE) / 4.2.4：

Phase-Modulation Ellipsometry (PME) / 4.2.5：

Infrared Spectroscopic Ellipsometry / 4.2.6：

Mueller Matrix Ellipsometry / 4.2.7：

Null Ellipsometry and Imaging Ellipsometry / 4.2.8：

Instrumentation for Ellipsometry / 4.3：

Installation of Ellipsometry System / 4.3.1：

Fourier Analysis / 4.3.2：

Calibration of Optical Elements / 4.3.3：

Correction of Measurement Errors / 4.3.4：

Precision and Error of Measurement / 4.4：

Variation of Precision and Error with Measurement Method / 4.4.1：

Precision of ([psi], [Delta]) / 4.4.2：

Precision of Film Thickness and Absorption Coefficient / 4.4.3：

Depolarization Effect of Samples / 4.4.4：

Interpretation of ([psi], [Delta]) / 5：

Variations of ([psi], [Delta]) with Optical Constants / 5.1.1：

Variations of ([psi], [Delta]) in Transparent Films / 5.1.2：

Variations of ([psi], [Delta]) in Absorbing Films / 5.1.3：

Dielectric Function Models / 5.2：

Lorentz Model / 5.2.1：

Interpretation of the Lorentz Model / 5.2.2：

Sellmeier and Cauchy Models / 5.2.3：

Tauc-Lorentz Model / 5.2.4：

Drude Model / 5.2.5：

Kramers-Kronig Relations / 5.2.6：

Effective Medium Approximation / 5.3：

Effective Medium Theories / 5.3.1：

Modeling of Surface Roughness / 5.3.2：

Limitations of Effective Medium Theories / 5.3.3：

Optical Models / 5.4：

Construction of Optical Models / 5.4.1：

Pseudo-Dielectric Function / 5.4.2：

Optimization of Sample Structures / 5.4.3：

Optical Models for Depolarizing Samples / 5.4.4：

Data Analysis Procedure / 5.5：

Linear Regression Analysis / 5.5.1：

Fitting Error Function / 5.5.2：

Mathematical Inversion / 5.5.3：

Ellipsometry of Anisotropic Materials / 6：

Reflection and Transmission of Light by Anisotropic Materials / 6.1：

Light Propagation in Anisotropic Media / 6.1.1：

Index Ellipsoid / 6.1.2：

Dielectric Tensor / 6.1.3：

Jones Matrix of Anisotropic Samples / 6.1.4：

Fresnel Equations for Anisotropic Materials / 6.2：

Anisotropic Substrate / 6.2.1：

Anisotropic Thin Film on Isotropic Substrate / 6.2.2：

4 x 4 Matrix Method / 6.3：

Principles of the 4 x 4 Matrix Method / 6.3.1：

Calculation Method of Partial Transfer Matrix / 6.3.2：

Calculation Methods of Incident and Exit Matrices / 6.3.3：

Calculation Procedure of the 4 x 4 Matrix Method / 6.3.4：

Interpretation of ([psi], [Delta]) for Anisotropic Materials / 6.4：

Variations of ([psi], [Delta]) in Anisotropic Substrates / 6.4.1：

Variations of ([psi], [Delta]) in Anisotropic Thin Films / 6.4.2：

Measurement and Data Analysis of Anisotropic Materials / 6.5：

Measurement Methods / 6.5.1：

Data Analysis Methods / 6.5.2：

Data Analysis Examples / 7：

Insulators / 7.1：

Analysis Examples / 7.1.1：

Advanced Analysis / 7.1.2：

Semiconductors / 7.2：

Optical Transitions in Semiconductors / 7.2.1：

Modeling of Dielectric Functions / 7.2.2：

Analysis of Dielectric Functions / 7.2.3：

Metals/Semiconductors / 7.3：

Dielectric Function of Metals / 7.3.1：

Analysis of Free-Carrier Absorption / 7.3.2：

Organic Materials/Biomaterials / 7.3.3：

Analysis of Organic Materials / 7.4.1：

Analysis of Biomaterials / 7.4.2：

Anisotropic Materials / 7.5：

Analysis of Anisotropic Insulators / 7.5.1：

Analysis of Anisotropic Semiconductors / 7.5.2：

Analysis of Anisotropic Organic Materials / 7.5.3：

Real-Time Monitoring by Spectroscopic Ellipsometry / 8：

Data Analysis in Real-Time Monitoring / 8.1：

Procedures for Real-Time Data Analysis / 8.1.1：

Linear Regression Analysis (LRA) / 8.1.2：

Global Error Minimization (GEM) / 8.1.3：

Virtual Substrate Approximation (VSA) / 8.1.4：

Observation of Thin-Film Growth by Real-Time Monitoring / 8.2：

Process Control by Real-Time Monitoring / 8.2.1：

Data Analysis in Process Control / 8.3.1：

Process Control by Linear Regression Analysis (LRA) / 8.3.2：

Process Control by Virtual Substrate Approximation (VSA) / 8.3.3：

Appendices

Trigonometric Functions

Definitions of Optical Constants

Maxwell's Equations for Conductors

Jones-Mueller Matrix Conversion

Index

Foreword

Preface

Acknowledgments

Introduction to Spectroscopic Ellipsometry / 1：

Features of Spectroscopic Ellipsometry / 1.1：

Applications of Spectroscopic Ellipsometry / 1.2：

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