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1.

図書

図書
International Institute of Refrigeration. Commission B2 ; International Institute of Refrigeration. Commission C2 ; International Institute of Refrigeration. Commission E2
出版情報: Buenos Aires : Its Organizing Committee, 1992  364 p. ; 25 cm
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2.

図書

図書
issued by International Institute of Refrigeration ; [editor, Kostadin Fikiin] = edité par Institut International du Froid
出版情報: Paris : Institut International du Froid, c2000  701 p. ; 24 cm
シリーズ名: Science et technique du froid = Refrigeration science and technology ; 1998-6
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3.

図書

図書
International Institute of Refrigeration
出版情報: Paris, France : Institut international du froid (International Institute of Refrigeration), 1990  871 p. ; 24 cm
シリーズ名: Science et technique du froid = Refrigeration science and technology ; 1990-4
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4.

図書

図書
OECD Department of Economics and Statistics = Département des affaires économiques et statistiques, OCDE
出版情報: Paris : Organisation for Economic Co-operation and Developement, 1980-  v. ; 32 cm
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5.

図書

図書
International Institute of Refrigeration. Commission B1
出版情報: Paris, France : Institut international du froid, [1988]  409 p. ; 24 cm
シリーズ名: Science et technique du froid = Refrigeration science and technology ; 1988-1
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6.

図書

図書
édité par Institut international du froid = issued for International Institute of Refrigeration
出版情報: Paris, France : Institut International du Froid, [1994]  372 p. ; 24 cm
シリーズ名: Science et technique du froid = Refrigeration science and technology ; 1994-5
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7.

図書

図書
edited by Jacques Carmona and Michèle Vergne
出版情報: Berlin ; New York : Springer-Verlag, 1979  244 p. ; 25 cm
シリーズ名: Lecture notes in mathematics ; 728
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目次情報: 続きを見る
Introduction to Acoustics / 1:
Fundamental Physical Principles / 1.1:
Sound Pressure / 1.1.1:
Particle Velocity / 1.1.2:
Sound Power / 1.1.3:
Frequency / 1.1.4:
The Speed of Sound / 1.1.5:
Wavelength / 1.1.6:
Characteristics of the Auditory System / 1.2:
The Sensation of Loudness / 1.2.1:
Masking / 1.2.2:
Directional Characteristics / 1.2.3:
Directional Hearing / 1.2.4:
The Cocktail Party Effect / 1.2.5:
Masking for the Musician / 1.2.6:
Sensitivity to Changes in Frequency and Sound Pressure Level / 1.2.7:
Structure of Musical Sound / 2:
Introducing the Model / 2.1:
Frequency-and Level: Structures / 2.2:
The Harmonic Tone Structure of Sound Spectra / 2.2.1:
The Frequency Range of Sound Spectra / 2.2.2:
Formants / 2.2.3:
The Effect of Individual Partials / 2.2.4:
Frequency Width of Partials / 2.2.5:
Noise Contributions / 2.2.6:
Dynamics and the Sound Spectrum / 2.2.7:
Dynamic Range and Sound Power / 2.2.8:
Time Structures / 2.3:
Deviations from a Steady Vibration Process / 2.3.1:
The Starting Transient / 2.3.2:
Inharmonic Components / 2.3.3:
Decay of Resonating Systems / 2.3.4:
Decay Time and Reverberation Time / 2.3.5:
Fluctuations in the Quasistationary Part / 2.3.6:
Tonal Characteristics of Musical Instruments / 3:
Brass Instruments / 3.1:
The French Horn / 3.1.1:
The Trumpet / 3.1.2:
The Trombone / 3.1.3:
The Tuba / 3.1.4:
Woodwind Instruments / 3.2:
The Flute / 3.2.1:
The Oboe / 3.2.2:
The Clarinet / 3.2.3:
The Bassoon / 3.2.4:
String Instruments / 3.3:
The Violin / 3.3.1:
The Viola / 3.3.2:
The Cello / 3.3.3:
Double Bass / 3.3.4:
The Piano / 3.4:
Sound Spectra / 3.4.1:
Dynamics / 3.4.2:
Time Structure / 3.4.3:
The Harpsichord / 3.5:
The Harp / 3.5.1:
Percussion Instruments / 3.6.1:
Timpani / 3.7.1:
The Bass Drum / 3.7.2:
Snare Drum / 3.7.3:
Gong / 3.7.4:
Cymbals / 3.7.5:
The Triangle / 3.7.6:
The Singing Voice / 3.8:
Choral Singing / 3.8.1:
Foundations of Directional Sound Radiation / 4:
Directional Effects and Polar Diagrams / 4.1.1:
Evaluation and Representation / 4.1.2:
General Considerations / 4.2:
The Double Bass / 4.4.2:
The Grand Piano / 4.5:
Lid Open / 4.5.1:
Lid Closed / 4.5.2:
Lid Half Open / 4.5.3:
Lid Removed / 4.5.4:
The Timpani / 4.5.5:
The Drum / 4.7.2:
Gongs / 4.7.3:
Color Plates Following Page / 4.8:
Foundations of Room Acoustics / 5:
Reflection and Refraction / 5.1:
Reflection from a Flat Surface / 5.1.1:
Reflection from Curved Surfaces / 5.1.2:
Influence of the Wavelength / 5.1.3:
Absorption / 5.2:
Reverberation / 5.3:
Direct Sound and Diffuse Field / 5.4:
The Energy Density / 5.4.1:
The Direct Sound / 5.4.2:
Diffuse-Field Distance / 5.4.3:
Temporal Structure of the Sound Field / 5.5:
Acoustical Properties of Old and New Performance Spaces / 6:
Concert Halls / 6.1:
Tonal Requirements / 6.1.1:
Reverberation Time and Hall Size / 6.1.2:
Sound Field and Hall Shape / 6.1.3:
Acoustic Conditions on the Stage / 6.1.4:
The Location of the Conductor / 6.1.5:
Opera Houses / 6.2:
Reverberation Time and Room Size / 6.2.1:
Direct Sound and Early Reflections / 6.2.2:
Churches / 6.3:
Chamber Music Halls / 6.4:
Studios / 6.5:
Special Purpose Rooms / 6.6:
Open Air Stages / 6.7:
Seating Arrangement in the Concert Hall / 7:
Customary Positioning of Instrument Groups / 7.1:
The Tonal Effect in the Hall / 7.2:
Grand Pianos / 7.2.1:
Harps / 7.2.6:
Combined Sound of the Orchestra / 7.2.7:
Singing Voices / 7.2.8:
Acoustic Considerations for Instrumentation and Playing Technique / 8:
Strength of Ensembles / 8.1:
Historical Development / 8.1.1:
Adapting to the Hall / 8.1.2:
Performance Technique / 8.2:
Articulation and Tone Presentation / 8.3.1:
Vibrato / 8.3.2:
Playing Positions of Wind Instruments / 8.3.3:
Tempo and Room Acoustics / 8.4:
Acoustical Problems in the Opera House / 9:
Strength of the Orchestra / 9.1:
Sound Level in the Hall / 9.1.1:
Sound Level in the Orchestra Pit / 9.1.3:
Seating Arrangement in the Orchestra Pit / 9.2:
Customary Arrangements of Instrument Groups / 9.2.1:
Balance between Singers and Orchestra / 9.2.2:
Arrangement of Choirs and Music on Stage / 9.4:
Musicians in the Scene / 9.4.1:
Musicians behind the Scene / 9.4.2:
Appendix Table for Angular Dependence of the Statistical Directivity Factor
References
Subject Index
Author, Composer, and Composition Index
Introduction to Acoustics / 1:
Fundamental Physical Principles / 1.1:
Sound Pressure / 1.1.1:
8.

図書

図書
International Institute of Refrigeration. Commission C2
出版情報: Paris, France : Institut international du froid, 1988  295 p. ; 24 cm
シリーズ名: Science et technique du froid = Refrigeration science and technology ; 1988-3
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9.

図書

図書
issued by International Institute of Refrigeration = edité par Institut International du Froid
出版情報: Paris : Institut International du Froid, [1998]  424 p. ; 24 cm
シリーズ名: Science et technique du froid = Refrigeration science and technology ; 1998-5
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10.

図書

図書
edited by Hermann A. Maurer
出版情報: Berlin : Springer-Verlag, 1980  ix, 684 p. ; 25 cm
シリーズ名: Lecture notes in computer science ; 71
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目次情報: 続きを見る
Preface
Fabrication / Part I:
Introduction / Chapter 1:
What are MEMS? / 1.1:
Why MEMS? / 1.2:
Low cost, redundancy and disposability / 1.2.1:
Favorable scalings / 1.2.2:
How are MEMS made? / 1.3:
Roadmap and perspective / 1.4:
Essay: The Role of Surface to Volume Atoms as Magnetic Devices Miniaturize
The substrate and adding material to it / Chapter 2:
The silicon substrate / 2.1:
Silicon growth / 2.2.1:
It's a crystal / 2.2.2:
Miller indices / 2.2.3:
It's a semiconductor / 2.2.4:
Additive technique: Oxidation / 2.3:
Growing an oxide layer / 2.3.1:
Oxidation kinetics / 2.3.2:
Additive technique: Physical vapor deposition / 2.4:
Vacuum fundamentals / 2.4.1:
Thermal evaporation / 2.4.2:
Sputtering / 2.4.3:
Other additive techniques / 2.5:
Chemical vapor deposition / 2.5.1:
Electrodeposition / 2.5.2:
Spin casting / 2.5.3:
Wafer bonding / 2.5.4:
Essay: Silicon Ingot Manufacturing
Creating and transferring patterns-Photolithography / Chapter 3:
Keeping it clean / 3.1:
Photoresist / 3.3:
Positive resist / 3.3.1:
Negative resist / 3.3.2:
Working with resist / 3.4:
Applying photoresist / 3.4.1:
Exposure and pattern transfer / 3.4.2:
Development and post-treatment / 3.4.3:
Masks / 3.5:
Resolution / 3.6:
Resolution in contact and proximity printing / 3.6.1:
Resolution in projection printing / 3.6.2:
Sensitivity and resist profiles / 3.6.3:
Modeling of resist profiles / 3.6.4:
Photolithography resolution enhancement technology / 3.6.5:
Mask alignment / 3.6.6:
Permanent resists / 3.7:
Essay: Photolithography-Past, Present and Future
Creating structures-Micromachining / Chapter 4:
Bulk micromachining processes / 4.1:
Wet chemical etching / 4.2.1:
Dry etching / 4.2.2:
Surface micromachining / 4.3:
Surface micromachining processes / 4.3.1:
Problems with surface micromachining / 4.3.2:
Lift-off / 4.3.3:
Process integration / 4.4:
A surface micromachining example / 4.4.1:
Designing a good MEMS process flow / 4.4.2:
Last thoughts / 4.4.3:
Essay: Introduction to MEMS Packaging
Solid mechanics / Chapter 5:
Fundamentals of solid mechanics / 5.1:
Stress / 5.2.1:
Strain / 5.2.2:
Elasticity / 5.2.3:
Special cases / 5.2.4:
Non-isotropic materials / 5.2.5:
Thermal strain / 5.2.6:
Properties of thin films / 5.3:
Adhesion / 5.3.1:
Stress in thin films / 5.3.2:
Peel forces / 5.3.3:
Applications / Part II:
Thinking about modeling / Chapter 6:
What is modeling? / 6.1:
Units / 6.2:
The input-output concept / 6.3:
Physical variables and notation / 6.4:
Preface to the modeling chapters / 6.5:
MEMS transducers-An overview of how they work / Chapter 7:
What is a transducer? / 7.1:
Distinguishing between sensors and actuators / 7.2:
Response characteristics of transducers / 7.3:
Static response characteristics / 7.3.1:
Dynamic performance characteristics / 7.3.2:
MEMS sensors: principles of operation / 7.4:
Resistive sensing / 7.4.1:
Capacitive sensing / 7.4.2:
Piezoelectric sensing / 7.4.3:
Resonant sensing / 7.4.4:
Thermoelectric sensing / 7.4.5:
Magnetic sensing / 7.4.6:
MEMS actuators: principles of operation / 7.5:
Capacitive actuation / 7.5.1:
Piezoelectric actuation / 7.5.2:
Thermo-mechanical actuation / 7.5.3:
Thermo-electric cooling / 7.5.4:
Magnetic actuation / 7.5.5:
Signal conditioning / 7.6:
A quick look at two applications / 7.7:
RF applications / 7.7.1:
Optical applications / 7.7.2:
Piezoresistive transducers / Chapter 8:
Modeling piezoresistive transducers / 8.1:
Bridge analysis / 8.2.1:
Relating electrical resistance to mechanical strain / 8.2.2:
Device case study: Piezoresistive pressure sensor / 8.3:
Capacitive transducers / Chapter 9:
Capacitor fundamentals / 9.1:
Fixed-capacitance capacitor / 9.2.1:
Variable-capacitance capacitor / 9.2.2:
An overview of capacitive sensors and actuators / 9.2.3:
Modeling a capacitive sensor / 9.3:
Capacitive half-bridge / 9.3.1:
Conditioning the signal from the half-bridge / 9.3.2:
Mechanical subsystem / 9.3.3:
Device case study: Capacitive accelerometer / 9.4:
Piezoelectric transducers / Chapter 10:
Modeling piezoelectric materials / 10.1:
Mechanical modeling of beams and plates / 10.3:
Distributed parameter modeling / 10.3.1:
Statics / 10.3.2:
Bending in beams / 10.3.3:
Bending in plates / 10.3.4:
Case study: Cantilever piezoelectric actuator / 10.4:
Thermal transducers / Chapter 11:
Basic heat transfer / 11.1:
Conduction / 11.2.1:
Convection / 11.2.2:
Radiation / 11.2.3:
Case study: Hot-arm actuator / 11.3:
Lumped element model / 11.3.1:
Distributed parameter model / 11.3.2:
FEA model / 11.3.3:
Essay: Effect of Scale on Thermal Properties
Introduction to microfluidics / Chapter 12:
Basics of fluid mechanics / 12.1:
Viscosity and flow regimes / 12.2.1:
Entrance lengths / 12.2.2:
Basic equations of fluid mechanics / 12.3:
Conservation of mass / 12.3.1:
Conservation of linear momentum / 12.3.2:
Conservation equations at a point: Continuity and Navier-Stokes equations / 12.3.3:
Some solutions to the Navier-Stokes equations / 12.4:
Couette flow / 12.4.1:
Poiseuille flow / 12.4.2:
Electro-osmotic flow / 12.5:
Electrostatics / 12.5.1:
Ionic double layers / 12.5.2:
Navier-Stokes with a constant electric field / 12.5.3:
Electrophoretic separation / 12.6:
Essay: Detection Schemes Employed in Microfluidic Devices for Chemical Analysis
Microfabrication laboratories / Part III:
Hot-arm actuator as a hands-on case study / Chapter 13:
Overview of fabrication of hot-arm actuators / 13.2:
Cleanroom safety and etiquette / 13.3:
Experiments / 13.4:
Wet oxidation of a silicon wafer / Experiment 1:
Photolithography of sacrificial layer / Experiment 2:
Depositing metal contacts with evaporation / Experiment 3:
Wet chemical etching of aluminum / Experiment 4:
Plasma ash release / Experiment 5:
Characterization of hot-arm actuators / Experiment 6:
Notation / Appendix A:
Periodic table of the elements / Appendix B:
The complimentary error function / Appendix C:
Color chart for thermally grown silicon dioxide / Appendix D:
Glossary
Subject Index
Preface
Fabrication / Part I:
Introduction / Chapter 1:
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