Preface |
Introduction / 1: |
Analytical parameters / 1.1: |
Define what is to be measured? / 1.1.1: |
How important is this analysis? / 1.1.2: |
What is the sample, how is it sampled and how does it get to the lab? / 1.1.3: |
Accuracy / 1.1.4: |
Precision / 1.1.5: |
Sensitivity / 1.1.6: |
Limit of detection / 1.1.7: |
Time of analysis / 1.1.8: |
Importance of the results / 1.1.9: |
What spectrometric technique is to be used? / 1.1.10: |
What sample preparation is required? / 1.1.11: |
Available resources / 1.1.12: |
Reporting and post-analysis actions / 1.1.13: |
Reference materials / 1.2: |
Validation / 1.3: |
Atomic absorption spectrometry and atomic fluorescence spectrometry / Gerhard Schlemmer2: |
Basic principles of atomic absorption spectrometry and atomic fluorescence spectrometry / 2.1: |
Interaction of photons with electrons / 2.1.1: |
Line width of absorbing atoms / 2.1.2: |
Line width of emitting atoms in the source / 2.1.3: |
Absorption process / 2.1.4: |
Flame optical emission spectroscopy / 2.1.5: |
Atomic fluorescence / 2.1.6: |
Technical means to facilitate AAS and AFS / 2.2: |
General layout / 2.2.1: |
Radiation source / 2.2.2: |
Photometer and spectrometer / 2.2.3: |
Counting photons and transfer to electrical information: Principle way of operation and criteria for optimal use / 2.2.4: |
Zero absorption: technical means to define the baseline / 2.2.5: |
Separation of specific and nonspecific absorption / 2.2.6: |
Sample introduction and principles of atom generation in AAS / 2.2.7: |
Physicochemistry outside and inside the atomizer / 2.3: |
Flames / 2.3.1: |
Graphite furnace / 2.3.2: |
Chemical vapor generation / 2.3.3: |
Mastering the spectrometer and its accessories / 2.3.4: |
Figures of merit / 2.4.1: |
Mastering the application; instrument suitability; method development; estimation on expected working range, basics of method optimization for flame, furnace, CVG, cold vapor, cold vapor fluorescence. Special applications: coupling of methods. Analytical quality versus sample and element throughput / 2.5: |
Instrument performance verification / 2.5.1: |
Estimate of the expected working range / 2.5.2: |
Is the instrument suitable for the application? / 2.5.3: |
Typical applications in AAS and AFS / 2.6: |
Contaminated soils: An easy standard flame AAS application / 2.6.1: |
Geochemistry: The determination of refractory elements in refractory matrix / 2.6.2: |
Determinations in ultrapure materials: An unusual challenge / 2.6.3: |
Between liquid and solid: the direct analysis of clinical samples in GF-AAS / 2.6.4: |
Plants and other biological tissue: The way to fast GF-AAS determinations / 2.6.5: |
Element-matrix separation: The determination of As and Sb in water samples / 2.6.6: |
CVG with analyte trapping for ultra, ultra-traces / 2.6.7: |
The determination of mercury with the cold vapor technique and AFS / 2.6.8: |
References |
Inductively coupled plasma and microwave-induced plasma optical emission spectroscopy / José Luis Todolí3: |
Introduction to inductively coupled plasma optical emission spectroscopy / 3.1: |
Plasma generation and fundamental parameters / 3.2: |
Characteristics of the ICP / 3.2.1: |
Mixed gas plasmas / 3.2.2: |
Generators / 3.2.3: |
Sample introduction systems / 3.3: |
Conventional liquid sample introduction system / 3.3.1: |
Drawbacks of conventional liquid sample introduction system / 3.3.2: |
Efficient nebulizers or spray chambers / 3.3.3: |
High solid nebulizers / 3.3.4: |
Cooled spray chambers / 3.3.5: |
Desolvation systems / 3.3.6: |
Low sample consumption systems / 3.3.7: |
Electrothermal vaporization / 3.3.8: |
Torch configuration / 3.4: |
General characteristics / 3.4.1: |
Low argon consumption torches / 3.4.2: |
Plasma viewing mode / 3.4.3: |
Optical system / 3.5: |
Dispersive system / 3.5.1: |
Detectors / 3.5.2: |
General configurations / 3.6: |
Interferences in ICP-OES / 3.7: |
Spectroscopic interferences in ICP-OES / 3.7.1: |
Non-spectroscopic interferences (matrix effects) in ICP-OES / 3.7.2: |
Comparing spectroscopic and non-spectroscopic interferences / 3.7.3: |
Effect of the analyte chemical form / 3.8: |
Optimizing an ICP-OES system / 3.9: |
Optimization from the point of view of analytical figures of merit / 3.9.1: |
Optimization from the point of view of accuracy / 3.9.2: |
Methods for analyte quantification through ICP-OES / 3.10: |
Troubleshooting and maintenance in ICP-OES / 3.11: |
Microwave plasma optical emission spectroscopy / 3.12: |
Instrumentation in MWP-OES / 3.12.1: |
Matrix effects in MWP-OES / 3.12.2: |
Optimization in MWP-OES / 3.12.3: |
Comparison of ICP-OES, MIP-OES with other spectrochemical techniques / 3.13: |
Selected applications / 3.14: |
Bibliography |
Inductively coupled plasma-mass spectrometry / Lieve Balcaen4: |
Introduction and brief history / 4.1: |
Instrumentation and principle of operation / 4.2: |
Sample introduction system / 4.2.1: |
Inductively coupled plasma ion source / 4.2.2: |
Extraction system / 4.2.3: |
Mass spectrometer / 4.2.4: |
Alternative sample introduction systems / 4.2.5: |
Spectral interferences / 4.3: |
Types of interferences / 4.3.1: |
Methods to tackle the problem of spectral interferences / 4.3.2: |
Nonspectral interferences / 4.4: |
Description of nonspectral interferences / 4.4.1: |
Methods to tackle the problem of nonspectral interferences / 4.4.2: |
Analytical performance / 4.5: |
Hyphenated ICP-MS / 4.6: |
Examples of typical applications / 4.7: |
(Ultra-)trace element determination / 4.7.1: |
Isotopic analysis / 4.7.2: |
Speciation analysis by means of LC-ICP-MS / 4.7.3: |
Spatially resolved analysis by means of LA-ICP-MS / 4.7.4: |
X-ray fluorescence spectrometry / Michael W. Hinds5: |
Overview / 5.1: |
What is X-ray fluorescence (XRF) spectrometry? / 5.1.1: |
What distinguishes XRF from other atomic spectrometric techniques? / 5.1.2: |
Types: Wavelength Dispersive XRF and Energy Dispersive XRF / 5.1.3: |
Physics of X-rays / 5.2: |
Characteristic fluorescence lines / 5.2.1: |
Absorption and fluorescence / 5.2.3: |
Generation of X-rays within the X-ray tube / 5.2.4: |
Production of fluorescence X-rays within the sample / 5.2.5: |
Infinite thickness and analysis depth / 5.2.6: |
Fluorescence yield / 5.2.7: |
WDXRF spectrometer and components / 5.3: |
X-ray tube / 5.3.1: |
Primary beam fitters / 5.3.2: |
Atmosphere / 5.3.3: |
Sample cups and aperture / 5.3.4: |
Mask / 5.3.5: |
Collimators / 5.3.6: |
Crystals or analyzer crystals / 5.3.7: |
Goniometer / 5.3.8: |
Pulse height selection / 5.3.9: |
Auxiliary services / 5.3.11: |
Optimization of parameters / 5.3.12: |
EDXRF spectrometer and components / 5.4: |
X-ray sources / 5.4.1: |
Primary beam filters / 5.4.2: |
Multichannel analyzer / 5.4.4: |
Handheld EDXRF spectrometer / 5.4.7: |
Total reflection XRF / 5.4.9: |
Comparison between EDXRF and WDXRF / 5.4.10: |
Obtaining optimized net intensities and counting times / 5.5: |
Background corrected peaks WDXRF / 5.5.1: |
Background correction EDXRF / 5.5.2: |
Peak overlap corrections / 5.5.3: |
Measurement time / 5.5.4: |
Matrix effects specific to XRF / 5.6: |
Absorption / 5.6.1: |
Enhancement / 5.6.2: |
Particle size effects / 5.6.3: |
Mineralogical effects / 5.6.4: |
Chemical state effects / 5.6.5: |
Calibration and mathematical correction models / 5.7: |
Matrix correction algorithms / 5.7.1: |
Calibration / 5.7.3: |
Drift correction / 5.7.4: |
Universal calibration XRF analysis / 5.8: |
How it works / 5.8.1: |
Applications / 5.8.2: |
Advantages and disadvantages / 5.8.3: |
Sample preparation / 5.9: |
Air sample preparation / 5.9.1: |
Liquid sample preparation / 5.9.2: |
Solid sample preparation / 5.9.3: |
Examples applications / 5.10: |
EDXRF - determination of Ag, As and Zn in lead concentrate / 5.10.1: |
WDXRF - Determination of Ag, Cu, and P in Sterling Silver / 5.10.2: |
Different applications and current trends in XRF / 5.11: |
Combination WDXRF and EDXRF in one instrument / 5.11.1: |
Microfocusing optics and element concentration mapping / 5.11.2: |
Layer thickness / 5.11.3: |
Vendor method packages / 5.11.4: |
Advances in EDXRF / 5.11.5: |
Concluding remarks / 5.12: |
Appendix / 5.13: |
Appendix 1: Table of photon energies of the principle K and L X-ray spectral lines / 5.13.1: |
Appendix 2: Table of K, L, and M X-ray excitation potentials of the elements / 5.13.2: |
Appendix 3: Table of mass attenuation coefficients for K¿ line energies of selected elements / 5.13.3: |
Index |
Preface |
Introduction / 1: |
Analytical parameters / 1.1: |