1996 1st International Symposium on Plasma Process-Induced Damage, 13-14 May 1996, Santa Clara, California, USA

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1996 1st International Symposium on Plasma Process-Induced Damage, 13-14 May 1996, Santa Clara, California, USA / Kim P. Cheung, Moritaka Nakamura, and Calvin T. Gabriel, editors ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics

資料種別:

図書

出版情報:

Sunnyvale, CA : Northern California Chapter of the American Vacuum Society, c1996

形態:

237 p. ; 28 cm

著者名:

International Symposium on Plasma Process-Induced Damage

Cheung, Kin P.

Nakamura, Moritaka

Gabriel, Calvin T. <DA10596199>

IEEE Electron Devices Society <DA01257512>

American Vacuum Society <DA03926125>

応用物理学会 <DA00633233>

さらに 2 件

ISBN:

9780965157704 [0965157709] (:soft)
9780780330610 [0780330617] (:micro)

書誌ID:

BA30279308

子書誌情報

フルテキスト

所蔵情報

他の版・巻

書誌詳細

その他の標題:	96TH8142
注記:	"IEEE catalog no. 96TH8142"--T.p. verso Includes bibliographical references and index
著者名ヨミ:	オウヨウブツリガッカイ
主題:	Plasma radiation--Congresses; Semiconductor wafers--Congresses; Semiconductors--Effect of radiation on--Congresses

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