| 1.
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図書
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Symposium on VLSI Technology ; IEEE Electron Devices Society ; 応用物理学会
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| 2.
図書 |
図書
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Symposium on VLSI Technology ; IEEE Electron Devices Society ; 応用物理学会
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| 3.
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図書
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3. 1984 Symposium on VLSI Technology : digest of technical papers : September 10-12, 1984, San Diego
Symposium on VLSI Technology ; 応用物理学会 ; IEEE Electron Devices Society
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| 4.
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図書
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Symposium on VLSI Technology ; 応用物理学会 ; IEEE Electron Devices Society
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| 5.
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図書
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the IEEE Electron Devices Society, the Japan Society of Applied Physics
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| 6.
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図書
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sponsored by the Japan Society of Applied Physics ; in cooperation with the Institute of Electronics, Information and Communication Engineers of Japan ... [et al.]
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| 7.
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7. Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan
Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan
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| 8.
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図書
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Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City
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| 9.
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図書
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9. Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan
Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering
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| 10.
図書 |
図書
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10. Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan
Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering
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