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1.

図書

図書
editors, R.L. Opila ... [et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c2001-2003  3 v. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2000-26, 2002-1, 2003-21
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2.

図書

図書
editors, P.J. Hesketh ... [et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c2000  viii, 258 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2000-19
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目次情報: 続きを見る
Preface
Micromachining
The Microfactory System using Electrochemical Machining / Masayuki Suda ; Kazuyoshi Furuta ; Toshihiko Sakuhara ; Tatsuaki Ataka
Electroplated Nanocrystalline Nickel-Iron Alloys as a New Powerful Material for Microstructured Molding Tools / A. Fath ; W. Leskopf ; K. Bade ; W. Bacher
Lateral Etch Study of Thin Films Using Hydrofluroric Acid Chemistries for MEMS Devices / G. Matamis ; Chuan-Che Wang ; B. Gogoi
Low Surface Tension Etching Solutions for Silicon Dioxide Removal in Microelectromechanical Systems / M. J. Parent ; L. Zazzera ; P. Rajtar ; F. E. Behr
Hybrid Micromachining and Surface Microstructuring of Alumina Ceramic / P. Mardilovich ; D. Routkevitch ; A. Govyadinov
Microfluidics
Micro Scale Purification Systems for Biological Sample Preparation / A. B. Frazier
Challenges and Solutions for Packaging MEMS and Microsystems / J. Neysmith ; D. F. Baldwin
Fabrication and Characterization of Plastic Microfluidic Devices Modified with Polyelectrolyte Multilayers / L. E. Loscascio ; S. L. R. Barker ; D. Ross ; Jay Xu ; S. Roberson ; M. Tarlov ; M. Gaitan
Bulk-Etched Integrated Mesoscopic Fluidic Interconnects for Fluidic Microdevices / J. A. Scalf ; D. Liepmann ; A. P. Pisano
Electro-Magnetically Actuated Diverting Valve Using LTCC Tapes / J. R. Gillman ; P. Espinoza-Vallejos ; L. Sola-Laguna ; J. J. Santiago-Aviles
Design of a MEMS Magnetic Bi-Stable Valve / D. Creyts IV ; P. J. Hesketh ; G. C. Frye-Mason
Room Temperature, Adhesive Bonding for Wafer Scale Packaging of Fluidic Microsystems / X. Ma ; B. Gierhart ; S. D. Collins ; R. L. Smith
Physical Sensors
Inertial Sensors: The Drive for Aspect Ratio / P. L. Bergstrom
Residual Stress Effect and Improvement Method on the Performance of Diaphragm-Based Piezoelectric Microphones / Mengnian Niu ; Sok Kim
A Post-Processing Method for Suppressing the Residual Mechanical Stress in CMOS Layers, for MEMS Applications / B. Ghodsian ; V. Milanovic
Chemical Sensors
Chemical Microsensors for Aerospace Applications / G. W. Hunter ; P. G. Neudeck ; G. Fralick ; C. C. Liu ; Q. H. Wu ; M. S. Sawayda ; Z. Jin ; J. Hammond ; D. Makel ; W. A. Rauch ; M. Liu ; G. Hall
A MEMS Based Hybrid Preconcentrator/Chemiresistor Chemical Sensor / R. C. Hughes ; S. V. Patel ; R. P. Manginell
Micro-Hotplate, an Useful Concept for Gas Sensing, Fluidics and Space Applications / D. Briand ; O. Guenat ; B. van der Schoot ; T. Hirata ; N. F. de Rooij
Detection of Trace Silver and Copper at an Array of Boron-Doped Diamond Microdisk Electrodes / C. Madore ; A. Duret ; W. Haenni ; A. Perret
FET Based pH and Nitrate Checkers for Acid-Rain Monitoring / S. Wakida ; M. Yamane ; S. Takeda ; Z. Siroma ; Y. Tsujimura ; J. Liu
Biosensors
Microfabricated PMMA Structure for DNA Preconcentration and Electrophoresis / Yu-Cheng Lin ; Chien-Kai Tseng ; Shao-Qin Hou
Soluble Sensors of Telephonic Signals / M. Garnett ; J. L. Remo
Selective Deposition of Octasubstituted Phthalocyanine Materials Based on Hydrophobic / Hydrophilic Surface Interactions / R. A. P. Zangmeister ; N. R. Armstrong
Nanomechanical Detection of Biomolecular Interactions / K. M. Hansen ; Guanghua Wu ; Hai-Feng Ji ; T. Thundat ; R. Datar ; R. Cote ; A. Majumdar
Ultra-Sensative Resonant Frequency Based Mass Detector / B. Ilic ; D. Czaplewski ; H. G. Craighead ; P. Neuzi ; C. Campagnolo ; C. Batt
Microfabrication Processes
Developing a [mu]-Fabrication Course: A Study in Multidisciplinary MEMS Curriculum Development / R. S. Evans
Microstructures for Monitoring Wafer Uniformity of Reactive Ion Etching / R. Leung ; D. W. Howard
Water Dispersible Silanes for Wettability Modification of Polysilicon / A. M. Almanza-Workman ; S. Raghavan ; P. Deymier ; D. J. Monk ; R. Roop
Correlation of Metal Film Grain Size to Optical Measurement Results / T. Robinson ; C. Narayan ; J. Sledziewski ; G. Ready ; S. Alie
Preface
Micromachining
The Microfactory System using Electrochemical Machining / Masayuki Suda ; Kazuyoshi Furuta ; Toshihiko Sakuhara ; Tatsuaki Ataka
3.

図書

図書
editors, R. Singh ... [et al.] ; [sponsord by] Dielectric Science and Technology and Electronics Divisions
出版情報: Pennington, N.J. : Electrochemical Society, c2000  viii, 226 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 99-7
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4.

図書

図書
editors, K.B. Sundaram ... [et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c2001  x, 286 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2001-7
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目次情報: 続きを見る
Preface
Organizers
Oxide Wear-Out, Reliability, Stress and Interfaces / I:
A Review of Oxide Wearout, Breakdown, and Reliability / D. Dumin
Surface And Interface Study Of Ion Beam Deposited Silicon oxide Thin films / Heinz D. Wazenboeck ; Emmerich Bertagnolli ; Bernhard Basnar ; Juergen Smoliner ; Martin Gritsch ; Herbert Hutter ; Josef Brenner ; C. Tomastik ; Herbert Storri
Study of Inversion Layer Hole Mobility In p-Mosfet During High-field Stressing / R. Jarawal ; D. Misra
Two Limiting Thinnesses Of The Ultrathin Gate Oxide / Samares Kar
SiO[subscript 2] Stress and Interfaces / II:
The Connection Between oxide leakage currents and Si/SiO[subscript 2] Interface Trap Generation / P. M. Lenahan
Charging Damage During Plasma Enhanced Dielectric Deposition / K. Cheung
Kinetics and Mechanisms of Organic Contaminant Interactions at Silicon Surfaces in High Temperature Processes / N. Rana ; P. Raghu ; F. Shadman
SiO[subscript 2] Films and Properties / III:
Remote Plasma Deposited Gate Dielectrics on Si and SiGe Mosfets / T. Ngai ; R. Sharma ; J. Fretwell ; X. Chen ; J. Chen ; W. Brookover ; S. Banerjee
Rapid Thermal Processes of High Permittivity Films on Silicon for ULSI Gate Dielectrics Applications / S. P. Tay ; R. Sharangpani ; Y. Z. Hu
Processing of Thick Thermal Gate Oxides in Trenchs / C. T. Wu ; R. Ridley ; G. Dolny ; T. Grebs ; J. Hao ; S. Suliman ; B. Venkataraman ; O. Awadelkarim ; R. Williams ; P. Roman ; J. Ruzyllo
Electrical Properties of SiO[subscript 2]-Films Prepared by VUV Chemical Vapor Deposition / Y. Motoyama ; J. Miyano ; K. Tosikawa ; Y. Yagi ; K. Kurosawa ; A. Yokotani ; W. Sasaki
SiO[subscript 2] Film Deposition on Different Substrate Materials by Photo- CVD Using Vacuum Ultraviolet Radiation / K. Toshikawa
Silicon Nitrides/ Oxynitrides / IV:
Low Energy Ion Irradiation of Silicon: Compound Formation and Segregation of Impurities / M. Petravic ; J. S. Williams ; P. N. K. Deenapanray
Characteristics of Silicon Oxynitrides Made By ECR Plasmas / J. A. Diniz ; P. J. Tatsch ; J. Swart
Radiation Hardening of Oxynitrides Formed By Low Nitrogen Implantation into Silicon Prior to Oxidation / J. Godoy Fo
Silicon Nitrides/ Oxynitrides II / V:
Material and Process Considerations of Ultra thin Silicon (Oxy) Nitride Films Grown on Silicon and SiO[subscript 2] Surfaces / C. P. D'Emic ; E. P. Gusev ; K. K. Chan ; T. Zabel ; M. Copel ; R. Murphy ; P. Kozolowski ; J. Newbury
Silicon OxyNitride: A Versatile Material for Integrated Optics Application / K. Worhoff ; A. Driessen ; P. V. Lambeck
Characterization of Silicon Oxynitride Thin Films Deposited By ECR-PECVD / C. Simionescu ; J. Wojcik ; H. K. Haugen ; J. A. Davies ; P. Mascher
Silicon Nitrides/ Oxynitrides III / VI:
Characterization of Low- Temperature Magnetoplasma- Grown Si Oxynitride and Si Oxide / H. Ikoma
Advances in Single Wafer Chemical Deposition of Oxide and Nitride films / W. Palmer ; Z. Gabric
High Integrity Direct Oxidation/Nitridation at Low Temperatures Using Radicals / T. Ohmi ; S. Sugawa ; M. Hirayama
Silicon Nitride
Thermally Induced Stress Changes in High Density Plasma Deposited Silicon Nitride Films / R. E. Shah ; H. Baumann ; D. Serries ; M. Mikulla ; R. Keiffer
Effect of Oxygen in Deposited Ultra Thin Silicon Nitride Film on Electrical Properties / K. Muraoka ; K. Kurihara
Influence of Low- energy argon Ion Bombardment and Vacuum Annealing on the Silicon Nitride Surface Properties / I. P. Petrenko ; V. A. Gritsenko ; L. M. Logvinsky ; H. Wong
Authors Index
Subject Index
Preface
Organizers
Oxide Wear-Out, Reliability, Stress and Interfaces / I:
5.

図書

図書
editors, M. Meyyappan, D.J. Economou, S.W. Butler ; [sponsored by] Dielectric Science and Technology and Electronics Divisions
出版情報: Pennington, NJ : Electrochemical Society, c1997  ix, 347 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 97-9
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6.

図書

図書
editors, Hazara S. Rathore ... [et al.]
出版情報: Pennington, NJ : Electrochemical Society, c1997  viii, 262 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 97-8
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7.

図書

図書
editors M. Jamal Deen ... [et al.] ; Dielectric Science and Technology and Electronics Divisions [of the Electrochemical Society]
出版情報: Pennington, New Jersey : Electrochemical Society, c1997  xiii, 588 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 97-10
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8.

図書

図書
editors, M. Cahay ... [et al.]
出版情報: Pennington, NJ : Electrochemical Society, c1997  x, 494 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 97-11
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9.

図書

図書
editors, Mark D. Allendorf, Claude Bernard
出版情報: Pennington, NJ : Electrochemical Society, c1997  xxii, 1652 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 97-25
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10.

図書

図書
editors, G.S. Mathad, M. Meyyappan, M. Engelhardt ; Dielectric Science & Technology, Electronics, and Electrodeposition Divisions
出版情報: Pennington, NJ : Electrochemical Society, c1998  ix, 370 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 97-30
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11.

図書

図書
editor, Hazara S. Rathore ... [et al.]
出版情報: Pennington, NJ : Electrochemical Society, c1998  viii, 276 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 97-31
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12.

図書

図書
edited by Sheng S. Li, H. C. Liu, M.Z. Tidrow
出版情報: Pennington, NJ : Electrochemical Society, c1997  vii, 280 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 97-33
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13.

図書

図書
editors, C.R. Abernathy ... [et al.] ; Dielectric Science & Technology, Electronics, and High Temperature Material[s] Divisions of the Electrochemical Society [and] European III-V Nitride Community
出版情報: Pennington, NJ : Electrochemical Society, c1998  viii, 294 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 97-34
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14.

図書

図書
editors W.D. Brown ... [et al.] ; Dielectric Science and Technology, and Electronics Divisions [of the Electrochemical Society]
出版情報: Pennington, NJ : Electrochemical Society, c1998  x, 366 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 98-3
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図書

図書
editor, G.S. Mathad ; [sponsored by] Dielectric Science & Technology and electronics Divisions
出版情報: Pennington, NJ : the Electrochemical Society, Inc., c1998  viii, 292 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 98-4
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16.

図書

図書
editors, S. Raghavan, R.L. Opila, L. Zhang ; Electronics and Dielectric Science and Technology Divisions [of the Electrochemical Society]
出版情報: Pennington, N. J. : Electrochemical Society, c1998  viii, 274 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 98-7
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17.

図書

図書
editors, P. C. Andricacos ...[et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c1999  viii, 274 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 98-6
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18.

図書

図書
editors, Peter J. Hesketh, Henry Hughes, Wayne E. Bailey
出版情報: Pennington, NJ : Electrochemical Society, c1998  viii, 270 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 98-14
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19.

図書

図書
editors, T. D. Moustakas, S. E. Mohney, S. J. Pearton ; [sponsored by] Dielectric Science and Technology, Electronics, and High Temperature Materials Divisions
出版情報: Pennington, NJ : Electrochemical Society, c1999  vii, 230 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 98-18
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20.

図書

図書
editors, M. Cahay ... [et al.]
出版情報: Pennington, NJ : Electrochemical Society, c1999  xi, 690 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 98-19
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21.

図書

図書
edited by S. S. Li ... [et al.]
出版情報: Pennington, NJ : Electrochemical Society, c1999  vii, 242 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 98-21
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22.

図書

図書
editor, Yue Kuo
出版情報: Pennington, NJ : Electrochemical Society, c1999  xi, 428 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; 98-22
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23.

図書

図書
editors, M. D. Allendorf ... [et al.]
出版情報: Pennington, NJ : Electrochemical Society, c1999  xi, 486 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 98-23
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24.

図書

図書
editors, I. Ali, S. Raghavan
出版情報: Pennington, NJ : Electrochemical Society, c1997  ix, 275 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 96-22
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25.

図書

図書
editors, Cor L. Claeys ... [et al.]
出版情報: Pennington, NJ : Electrochemical Society, c1997  ix, 402 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 97-2
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26.

図書

図書
editors, P.J. Hesketh, G. Barna, H. G. Hughes
出版情報: Pennington, NJ : Electrochemical Society, c1997  vii, 217 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 97-5
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27.

図書

図書
editors, J. L. Davidson ... [et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c1998  xii, 696 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 97-32
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28.

図書

図書
editors, M. Cahay ... [et al.] ; [sponsored by the Electrochemical Society] Dielectric Science and Technology, Electronics and Luminescence and Display Materilas Divisions
出版情報: Pennington, NJ : The Electrochemical Society, c1996  ix, 371 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 95-17
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29.

図書

図書
editors, D. J. Lockwood ... [et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c1996  ix, 495 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 95-25
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30.

図書

図書
editors, T. M. Besmann ... [et al.]
出版情報: Pennington, NJ : Electrochemical Society, c1996  xxii, 892 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 96-5
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31.

図書

図書
edited by V. Swaminathan...[et al.]
出版情報: Pennington, NJ : Electrochemical Society, c1995  ix, 378 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 95-6
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32.

図書

図書
editors, T.D. Moustakas, J.P. Dismukes, S.J. Pearton
出版情報: Pennington, NJ : Electrochemical Society, c1996  vii, 234 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 96-11
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33.

図書

図書
editors, G.S. Mathad, M. Meyyappan ; [sponsored by] Dielectric Science and Technology and electronics Divisions
出版情報: Pennington, NJ : the Electrochemical Society, Inc., c1996  xi, 720 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 96-12
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34.

図書

図書
editor, Yue Kuo
出版情報: Pennington, NJ : Electrochemical Society, c1997  xii, 404 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; 96-23
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35.

図書

図書
editors, H. U. Anderson, A. C. Khandkar, M. Liu
出版情報: Pennington, NJ : Electrochemical Society, c1997  viii, 336 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 95-24
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36.

図書

図書
edited by S. Srinivasan ... [et al.] ; [sponsored by] the Electrochemical Society. Energy Technology, Battery, Physical Electrochemistry, and High Temperature Materials Divisions
出版情報: Pennington, NJ : The Electrochemical Society, c1994  ix, 509 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 94-23
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37.

図書

図書
edited by F. Ren ... [et al.]
出版情報: Pennington, NJ : Electrochemical Society, c1995  xi, 510 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 95-21
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38.

図書

図書
edited by S. S. Li ... [et al.]
出版情報: Pennington, NJ : The Electrochemical Society, c1995  viii, 264 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 95-28
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39.

図書

図書
editors, D. Denton, P.J. Hesketh, H. Hughes
出版情報: Pennington, NJ : Electrochemical Society, c1995  ix, 362 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 95-27
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40.

図書

図書
edited by Hazara S. Rathore
出版情報: Pennington, NJ : Electrochemical Society, c1995  viii, 245 p. ; 23
シリーズ名: Proceedings / [Electrochemical Society] ; v. 95-3
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41.

図書

図書
editors, Cor L. Claeys ... [et al.]
出版情報: Pennington, NJ : Electrochemical Society, c1995  xi, 446 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 95-9
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42.

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図書
editors, K. V. Ravi, J. P. Dismukes ; co-organizers, K.E. Spear ... [et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c1995  xx, 731 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 95-4
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43.

図書

図書
edited by Kurt R. Hebert, George E. Thompson
出版情報: Pennington, NJ : Electrochemical Society, c1994  ix, 312 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 94-25
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44.

図書

図書
editors [sic], Yue Kuo
出版情報: Pennington, NJ : Electrochemical Society, c1995  x, 410 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; 94-35
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45.

図書

図書
edited by R.B. Comizzoli, R.P. Frankenthal, and J.D. Sinclair ; assistant editors, K.J. Hanson, R.L. Opila, K.M. Takahashi
出版情報: Pennington, NJ : Electrochemical Society, c1994  ix, 417 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 94-29
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46.

図書

図書
edited by Hazara S. Rathore, G.S. Mathad, Du B. Nguyen ; Dielectric Science & Technology and Electronics Divisions
出版情報: Pennington, NJ : Dielectric Science & Technology, and Electronics Divisions, Electrochemical Society, c1992  viii, 330 p.
シリーズ名: Proceedings / [Electrochemical Society] ; v. 92-4
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47.

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図書
edited by Wayne Greene, George J. Hefferon, L.K. White . edited by Terry O. Herndon, Andrew L. Wu
出版情報: Pennington, NJ : Electrochemical Society, c1992  x, 382 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 92-6
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48.

図書

図書
edited by Vaughn E. Akins, Hiroyuki Harada ; Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ : Electrochemical Society, c1992  ix, 283 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; 92-8
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49.

図書

図書
edited by Ulrich Gösele ... [et al. ; sponsored by the] Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ : Electrochemical Society, c1992  ix, 498 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 92-7
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50.

図書

図書
edited by H.H. Lee ... [et al.] ; Electronics and Dielectric Science and Technology divisions
出版情報: Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, c1991  viii, 365 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 91-1
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51.

図書

図書
edited by Vaughn E. Akins, Hiroyuki Harada ; assistant editors, Robert Miller, Mihir Parikh
出版情報: Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, c1991  vii, 413 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 91-5
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52.

図書

図書
edited by A.J. Purdes ... [et al.] ; Dielectric Science and Technology, Electronics, and High Temperature Materials Divisions
出版情報: Pennington, N.J. : Electrochemical Society, c1991  xv, 670 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 91-8
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53.

図書

図書
edited by W. Murray Bullis, Ulrich Gösele, Fumio Chimura ; assistant editors, W. Bergholz ... [et al.] ; Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, c1991  xi, 692 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 91-9
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54.

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図書
edited by D.N. Buckley, A.T. Macrander ; Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, c1991  ix, 305 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 91-13
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図書
edited by John M. Andrews, George K. Celler ; Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, N.J. : Electrochemical Society, c1991  xv, 924 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 91-11
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56.

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図書
edited by A. Katz ... [et al.] ; Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ : Electrochemical Society, c1992  ix, 201 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 92-19
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57.

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図書
edited by Jerzy Ruzyllo, Richard E. Novak ; [sponsored by the] Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ (10 South Main St., Pennington 08534-2896) : Electrochemical Society, c1992  xi, 502 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 92-12
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58.

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図書
edited by T.O. Herndon, H.S. Rathore ... [et al.] ; [sponsored by the] Dielectric Sicence and Technology and Electronics Divisions
出版情報: Pennington, NJ : Electrochemical Society, c1993  xiii, 494 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 93-25
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59.

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editors, J.P. Dismukes, K.V. Ravi ; co-editors, K.E. Spear, B. Lux, N. Setaka
出版情報: Pennington, N.J. : Electrochemical Society, c1993  xxxi, 1086 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 93-17
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60.

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図書
edited by D.N. Buckley ... [et al.] ; [sponsored by the] Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ : Electrochemical Society, c1993  ix, 295 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 93-10
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61.

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図書
edited by M. Cahay ... [et al.] ; [sponsored by] the Electrochemical Society. Dielectric Science and Technology, Electronics and Luminescence and Display Materilas Divisions
出版情報: Pennington, NJ : The Electrochemical Society, c1994  ix, 437 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 94-17
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editors, V.J. Kapoor, W.D. Brown ; Dielectric Science and Technology and Electronics Divisions
出版情報: Pennington, NJ : Electrochemical Society, c1994  xiii, 625 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 94-16
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63.

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図書
edited by Martin A. Schmidt ... [et al. ; sponsored by the] Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ : Electrochemical Society, c1993  x, 485 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 93-29
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64.

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edited by P.J. Hesketh ... [et al.] ; [sponsored by] the Electrochemical Society. Sensors, Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ : The Electrochemical Society, c1994  viii, 255 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 94-14
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65.

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図書
edited by H.J. Queisser ... [et al.] ; [sponsored by] the Electrochemical Society. Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ : The Electrochemical Society, c1994  viii, 319 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 94-1
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66.

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図書
edited by R. Novak ... [et al.] ; [sponsored by] the Electrochemical Society. Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ : The Electrochemical Society, c1994  ix, 353 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 94-3
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67.

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図書
edited by J. Ruzyllo ... [et al.] ; [sponsored by] the Electrochemical Society. Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ : The Electrochemical Society, c1994  xiii, 604 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 94-7
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68.

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図書
edited by S. Cristoloveanu ... [et al.] ; [sponsored by] the Electrochemical Society. Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, NJ : The Electrochemical Society, c1994  xi, 483 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 94-11
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69.

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edited by G.S. Mathad, D.W. Hess ; [sponsored by] Dielectric Science and Technology and electronics Divisions, the Electrochemical Society
出版情報: Pennington, NJ : the Electrochemical Society, Inc., c1994  xi, 606 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 94-20
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70.

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図書
edited by Dennis N. Schmidt, assistant editors, David Reedy, Alex Schwarz ; Electronics and Dielectric Science and Technology Divisions
出版情報: Pennington, N.J. : Electrochemical Society, c1992  x, 501 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 92-21
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71.

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edited by B.R. MacDougall, T.A. Ramanarayanan, R.S. Alwitt
出版情報: Pennington, NJ : Electrochemcial Society, c1992  x, 613 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 92-22
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72.

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図書
edited by G.S. Mathad, D.W. Hess
出版情報: Pennington, NJ : Electrochemical Society, c1992  xiii, 654 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; 92-18
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73.

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edited by D.N. Buckley, V. Swaminathan ; [sponsored by the] Electronics and Dielectric Science and Technology divisions
出版情報: Pennington, NJ : Electrochemical Society, c1992  ix, 301 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 92-20
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74.

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editors, P. C. Andricacos ...[et al.] ; sponsoring divisions, Electrodeposition, Dielectric Science and Technology, Electronics
出版情報: Pennington, N.J. : Electrochemical Society, c2002  viii, 258 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2000-8
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75.

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editors, M.T. Swihart, M.D. Allendorf, M. Meyyappan
出版情報: Pennington, N.J. : Electrochemical Society, c2001  ix, 508 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2001-13
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76.

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図書
editors, M. Cahay ...[et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c2001  ix, 398 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2001-19
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77.

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図書
editor, G.S. Mathad ; assistant editors, M. Engelhardt ...[et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c2001  viii, 216 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2001-24
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78.

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図書
editors, M.J. Deen, D. Misra, J. Ruzyllo ; sponsoring divisions, Electronics, Dielectric Science and Technology
出版情報: Pennington, N.J. : Electrochemical Society, c2002  viii, 436 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2001-28
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79.

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editors, P. Vanƴsek ... [et al.] ; sponsoring divisions, Electrodeposition, Dielectric Science and Technology, Physical Electrochemistry, and Corrosion
出版情報: Pennington, N.J. : Electrochemical Society, c2002  xii, 228 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; 2000-30
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80.

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editor, Y. Kuo ; sponsoring divisions, Electronics, Dielectric Science and Technology
出版情報: Pennington, N.J. : Electrochemical Society, c2003  ix, 306 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; 2002-23
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81.

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editors, E.J. Brandon ... [et al.] ; sponsoring divisions, Energy Technology, Battery, Dielectri Science and Technology, Electronics
出版情報: Pennington, N.J. : Electrochemical Society, c2003  vii, 228 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; 2002-25
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82.

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図書
editor, G.S. Mathad ; assistant editors, B.C. Baker ... [et al.] ; sponsoring divisions, Dielectric Science and Technology, Electronics, Electrodeposition
出版情報: Pennington, N.J. : Electrochemical Society, c2003  ix, 346 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-22
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83.

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editors, D. misra, K. Wörhoff, P. Mascher ; sponsoring divisions, Dielectric Science and Technology, Electronics
出版情報: Pennington, N.J. : Electrochemical Society, c2003  ix, 436 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2003-1
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目次情報: 続きを見る
Preface
Biosystems and Microsystems / I.:
Ion Track Nanostructuring of Dielectrics / K. Hjort ; E. Balanzat ; C. Trautmann ; M. Toulemonde ; A. Weidinger
Design, Integration and Performance Evaluation of Optical Detection Elements for Miniaturized Biochemical Devices / K.B. Mogensen ; A.M. Jorgensen ; N.J. Petersen ; O. Geschke ; J.P. Kutter
Silicon-Based Field-Effect Structures - From Dielectrics to Bioelectronics / M.J. Schoening
Neurotransistors for Biomedical Nanotechnology / A.J. Menezes ; V.J. Kapoor
Biosensors Based On Standard Dielectric Materials / J. Bausells ; A. Errachid ; N. Zine
Barrier Films on Paper and Cellulose using Fluorocarbon Plasmas / S. Vaswani ; J. Koskinen ; S. Zauscher ; D. Hess
Controlled Filling of Silicon Trenches with Doped Oxide for MEMS / A. Agarwal ; R. N.
Integrated Optics and Optical Applications / II.:
Optical and Electronic Properties of Nanostructured Silicon / D.J. Lockwood
MOCVD-Deposited Dielectric Films for Integrated Optical and Microelectronic Circuits / J. Mueller
Optical Characaterization of LPCVD SiOxNy Thin Films / M. Modreanu ; M. Gartner ; N. Tomozeiu
Material Consideration for Integrated Optics in Silica-on-Silicon Technology / L. Wosinski ; M. Dainese ; H. Fernando
Nanoscale characterization and local electromechanical properties of ferroelectric films for MEMS / A. Kholkin ; V. Shvartsman ; A. Emelyanov ; A. Safari
Optical MEMS devices based on wet anisotropic etching of silicon / M. Hoffmann ; D. Nusse ; E. Voges
Progress in the fabrication of complex optical coatings / D. Poitras
Silicon Nitride Coatings for Si Solar Cells: Control of Optical Reflection and Surface/Bulk Passivation / B. Sopori
Materials Processing / III.:
Temporal Pulse Shaping and Optimization in Ultrafast Laser Ablation of Materials / R. Stoian ; S. Winkler ; M. Hildebrand ; M. Boyle ; A. Thoss ; A. Rosenfeld ; I.V. Hertel
Development and Characterization of KOH Resistant PECVD Silicon Nitride for Microsystems Applications / F.E. Rasmussen ; B. Geilman ; M. Heschel ; O. Hansen
Ferroelectric properties of Pb-excess PZT thin films prepared by Zirconium oxyacetate-based sol-gel process / K. Nakano ; G. Sakai ; K. Shimanoe ; N. Yamazoe
Progress in Electronics / IV.:
Structural and Electronic Properties of Nanocrystalline Silicon / Silicon Dioxide Superlattices ; L. Tsybeskov ; B. V. Kamenev ; D. J. Lockwood
Properties of Gallium Nitride Nanorods by Hydride Vapor Phase Epitaxy / T.W. Kang ; H.-M. Kim
New Trends in Silicon Thin Films and Applications / J.-P. Kleider ; P. Roca i Cabarrocas ; C. Guedj
Novel Dielectric Thin Films for Frequency Agile Microwave Devices / M.W. Cole ; W. Nothwang ; C. Hubbard ; E. Ngo ; M. Ervin ; R.G. Geyer
Material Aspects in Emerging Nonvolatile Memories / T. Mikolajick ; C.U. Pinnow
Investigation of ru Thin Films Prepared by Chemical Vapor Deposition as Bottom Electrodes for Memory Applications / S.Y. Kang ; H.J. Lim ; C.S. Hwang ; H.J. Kim
Low-K and High-K Dielectrics / V.:
Characterization of Low-k to Extreme Low-k SiCOH Dielectrics / A. Grill ; D.A. Neumayer
High-Throughput Screening of Binary and Ternary Dielectric Oxides by Combinatorial Technology / H. Koinuma ; R. Takahashi ; H. Minami ; Y. Matsumoto ; K. Hasegawa ; Y. Yamamoto ; K. Itaka ; T. Chikyow
Progress in Novel Oxides for Gate Dielectrics And Surface Passivation of GaN/AlGaN Heterostructure Field Effect Transistors / C.R. Abernathy ; B.P. Gila ; A.H. Onstine ; S.J. Pearton ; J. Kim ; B. Luo ; R. Mehandru ; F. Ren ; J.K. Gillespie ; R.C. Fitch ; J. Sewell ; R. Dettmer ; G.D. Via ; A. Crespo ; T.J. Jenkins ; Y. Irokawa
Gas-Phase and Surface Reactions in Plasma Enhanced Chemical Etching of High-K Diectrics / L. Sha ; J. Chang
Investigation of Slow/Fast Interface States of Al2O3 / Si MOS System Using Deep Level Transient Spectroscopy / I.S. Jeon ; D. Eom ; M. Cho ; H.B. Park ; J. Park ; H. J. Kim
Characterization of a Potential Gate Dielectric: MOCVD-Grown Erbium Oxide on Silicon / M.P. Singh ; C.S. Thakur ; K. Shalini ; N. Bhat ; S.A. Shivashankar
HfO[subscript 2] Thin Films Deposited On SOI by Ion Beam Enhanced Deposition / K. Tao ; Y. Yu
Influence of the 5 A TaNx Interface Layer on Doped Metal Oxide High-k Dielectric Characterization / Y. Kuo ; J. Lu
Poster Session / VI.:
Potential Fluctuations in High-k Based Dielectric MOS Devices / J.-L. Autran ; D. Munteanu ; M. Houssa
Characterization of Thermally Evaporated ZrO2 / M. Bhaskaran ; P. K. Swain ; D. Misra
Synthesis and Characterization of Zinc Titanate Doped with Magnesium / Y.S. Chang ; Y.H. Chang ; I.G. Chen ; G.J. Chen
Investigation of High Dielectric Film on the Plastic Substrate by Novel Liquid-Phase Heterojunction Deposition / C.J. Huang ; W.R. Chen ; P.H. Chiu ; C.Z. Chen ; M.S. Lin ; S.L. Lee ; Z.Y. Lin
Thickness And Temperature Dependence Of The Ac Electrical Conductivity Of Porous Silicon Thin Films / M, Theodoropoulou ; P. Karahaliou ; S.N. Georga ; C.A. Krontiras ; N. Xanthopoulos ; M.N. Pisanias ; C. Tsamis ; A.G. Nassiopoulou
Author Index
Subject Index
Preface
Biosystems and Microsystems / I.:
Ion Track Nanostructuring of Dielectrics / K. Hjort ; E. Balanzat ; C. Trautmann ; M. Toulemonde ; A. Weidinger
84.

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図書
editors, R.E. Sah ... [et al.] ; sponsoring divisions, Dielecric Scoeice and Technology, Electronics
出版情報: Pennington, N.J. : Electrochemical Society, c2003  xii, 636 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2003-2
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目次情報: 続きを見る
Preface
Interface Characterization / I.:
Electrical Characterization Techniques for Semiconductor-Silicon Dioxide Interface - A Review / M.J. Deen
Si-SiO[subscript 2] Interface Trap Properties and Dependence with Oxide Thickness and with Electrical Stress in MOSFET's with Oxides in the 1-2 nm Range / D. Bauza ; F. Rahmoune
EPR Studies of SiC/SiO[subscript 2] Interfaces in n-type 4H-and 6H- Oxidized Porous SIC / H.J. von Bardeleben ; J.L. Cantin ; M. Mynbaeva ; S.E. Saddow ; Y. Shishkin ; R.P. Devaty ; W.J. Choyke
Related Oxides / II.:
Novel Germanium Technology and Devices for High Performance MOSFETs and Integrated On-Chip Optical Clocking / K.C. Saraswat ; C.O. Chui ; P.C. McIntyre ; B.B. Triplett
Properties of Ultrathin High-k Dielectrics on Si Probed by Electron Spin Resonance-Active Defects: Interfaces and Interlayers / A. Stesmans ; V.V. Afanas'ev
Role of Ultra Thin Silicon Oxide Interfacial Layer in High Performance High Dielectric Constant Gate Dielectrics / R. Singh ; M. Fakhruddin ; K.F. Poole ; S.V. Kondapi ; A. Gupta ; J. Narayan ; S. Kar
Quantum Mechanical Modeling of Capacitance-Voltage and Current-Voltage Behavior for SiO[subscript 2] and High-k Dielectrics / L.F. Register ; Y.-Y. Fan ; S.P. Mudanai ; S.K. Banerjee
Thermally Driven Atomic Transport in Silicon Oxynitride and High-k Films on Silicon / I.J.R. Baumvol ; F.C. Stedile ; J. Morais ; C. Krug ; C. Radtke ; E.B.O da Rosa ; K.P. Bastos ; R.P. Pezzi ; L. Miotti ; G.V. Soares
Investigations of the Structure and Stability of Alternative Gate Dielectrics / S. Stemmer ; Z.Q. Chen ; P.S. Lysaght ; J.A. Gisby ; J.R. Taylor
Comparison of Contamination Effects in Silicon Oxide with that in Hafnium Oxide and Zirconium Oxide Gate Dielectrics / F. Shadman ; P. Raghu ; N. Rana ; C. Yim ; E. Shero
Characteristics of Metal Gate MOS Capacitor with Hafnium Oxynitride Thin Film / K.-J. Choi ; S.-G. Yoon
Charge Trapping in High-Dose Ge-Implanted and Si-Implanted Silicon-Dioxide Thin Films / A.N. Nazarov ; I.N. Osiyuk ; I.P. Tyagulskii ; V.S. Lysenko ; T. Gebel ; W. Skorupa
Film Application / Device Characterization / Reliability / III.:
What Can Low-frequency Noise Learn us About the Quality of Thin-gate Dielectrics? / E. Simoen ; A. Mercha ; C. Claeys
Analysis of Short-channel MOSFET Behavior after Gate Oxide Breakdown and its Impact on Digital Circuit Reliability / G. Groeseneken ; B. Kaczer ; R. Degraeve
Cyanide Treatment to Improve Electrical Characteristics of Si-based MOS Diodes with an Ultrathin Oxide Layer / H. Kobayashi ; T. Kobayashi ; A. Asano ; O. Maida ; M. Takahashi
Process Dependence of Negative Bias Temperature Instability in PMOSFETS / S. Prasad ; E. Li ; L. Duong
Silicon Dioxide Insulating Films for Silicon-Germanium Technology / A. Vijh ; V.J. Kapoor ; R.L. Patterson ; J.E. Dickman
New Reliability Issues of CMOS Transistors with 1.3nm Thick Gate Oxide / M.F. Li ; B.J. Cho ; G. Chen ; W.Y. Loh ; D.L. Kwong
Improved Performance With Low Temperature Silicon Nitride Spacer Process / C.M. Reddy ; S.G.H. Anderson
Interface Studies / Defects / IV.:
Growth of SiO[subscript 2] at the Sc[subscript 2]O[subscript 3]/Si(100) Interface During Annealing / G.A. Botton ; E. Romain ; D. Landheer ; X. Wu ; M.-Y. Wu ; M. Lee ; Z.-H. Lu
A Review of Defect Generation in the SiO[subscript 2] and at Its Interface with Si / J.F. Zhang
Dipoles in SiO[subscript 2]: Border Traps or Not? / D.M. Fleetwood ; S.N. Rashkeev ; Z.Y. Lu ; C.J. Nicklaw ; J.A. Felix ; R.D. Schrimpf ; S.T. Pantelides
Stabilities and Electronic States of Incorporated Nitrogen Atoms at the Interface of SiO[subscript 2]/Si(001) / T. Yamasaki ; C. Kaneta
Electrical Properties and the Reliability of Silicon Nitride Gate Dielectrics Formed by Various Processes and Annealing Treatments / K.-S. Chang-Liao ; J.Y Pan ; C.L. Cheng ; T.K. Wang
Electronically Active Defects in Utra-thin Oxynitride Gate Dielectrics / D.A. Buchanan
Nitrogen Content and Interface Trap Reduction in SiO[subscript 2]/4H-SiC / K. McDonald ; R.A. Weller ; L.C. Feldman ; G.Y Chung ; C.C. Tin ; J.R. Williams
Cathodoluminescence of Thin Films of Silicon Oxide on Silicon / M.V. Zamoryanskaya ; V.I. Sokolov ; I.M. Kotina ; C.G. Konnikov
Predictive Simulation of Void Formation during the Deposition of Silicon Nitride and Silicon Dioxide Films / C. Heitzinger ; A. Sheikholeslami ; H. Puchner ; S. Selberherr
Film Preparation and Characterization I / V.:
Direct-Write Deposition of Silicon Oxide - The Express Lane towards patterned thin Films / H.D. Wanzenboeck ; S. Harasek ; E. Bertagnolli ; M. Gritsch ; H. Hutter ; J. Brenner ; H. Stoeri ; U. Grabner ; G. Hammer ; P. Pongratz
Comprehensive Optical and Compositional Characterization of Silicon-based Thin Films for Photonics / J. Wojcik ; E.A. Irving ; J.A. Davies ; W.N. Lennard ; P. Mascher
Hydrogenated Amorphous Silicon Nitride Deposited by Dc Magnetron Sputtering / K. Mokeddem ; M. Sayhi ; M. Aoucher ; A.C. Chami ; M. Abdessalem
Properties of Annealed Silicon Oxynitride Layers for Optical Applications / K. Worhoff ; G.M. Hussein ; C.G.H. Roeloffzen ; L.T.H. Hilderink
Optimum Structure of Deposited Ultra Thin Silicon Oxynitride Film to Minimize Leakage Current / K. Muraoka ; K. Kurihara ; N. Yasuda ; H. Satake
Plasma Damage in Ultra-thin Gate Oxide Induced by Dielectric Deposition Processes: An Overview on Main Mechanisms and Characterization Techniques / J.-P. Carrere ; J.-C. Oberlin ; S. Bruyere ; P. Ferreira
Electrical Characterization of Thin Oxide Layers by Impedance Spectroscopy Using Silicon/Oxide/Electrolyte (SOE) Structures / M. Chemla ; V. Bertagna ; R. Erre ; F. Rouelle ; S. Petitdidier ; D. Levy
Scaling / Film Preparation and Characterization II / VI.:
Ultrathin Silicon Oxynitride Gate Dielectrics / E.P. Gusev ; C.P. D'Emic ; T.H. Zabel ; M. Copel
Scaling Issues for Advanced SOI Devices: Gate Oxide Tunneling, Thin Buried Oxide, and Ultra-Thin Films / J. Pretet ; A. Ohata ; F. Dieudonne ; F. Allibert ; N. Bresson ; T. Matsumoto ; T. Poiroux ; J. Jomaah ; S. Cristoloveanu
The Effect of the Oxide Network Structure on the Irradiation Behavior of SiO[subscript 2] Films on Silicon / A.G. Revesz ; H.L. Hughes
Atomistic Characterization of Radical Nitridation Process on Si(100) Surfaces / Y. Yasuda ; A. Sakai ; S. Zaima
Atomic, Electronic Structure and Charge Transport Mechanism in Silicon Nitride and Oxynitride / V.A. Gritsenko ; K.A. Nasyrov
Decoupled Plasma Nitridation of Ultra-Thin Gate Oxides for 60-90 nm Technologies / M. Bidaud ; F. Boeuf ; C. Dachs ; C. Parthasarathy ; F. Guyader
A Neutron Reflectivity Study of Silicon Oxide Thin Films / A. Menelle ; M.-L Saboungi
Rapid Thermal and Anodic Oxidations of LPCVD Silicon Nitride Films / Y.-P. Lin ; J.-G. Hwu
MOSFET Degradation with Reverse Biased Source and Drain During High-Field Injection through Thin Gate Oxide / B. Patel ; R.K. Jarwal ; D. Misra
Modeling / Optimization / Characterization / VII.:
Modeling and Electrical Characterization of MOS Structures with Ultra-Thin Gate Oxide / R. Clerc ; G. Ghibaudo
Conduction Modeling of Thick Double-Layer Nitride/Oxide Dielectrics / S. Evseev
Contribution of Individual Process Steps on Particle Contamination during Plasma CVD Operation / H. Setyawan ; M. Shimada ; Y. Imajo ; K. Okuyama
Plasma Nitridation Optimization for Sub-15A Gate Dielectrics / F.N. Cubaynes ; J. Schmitz ; C. van der Marel ; J.H.M. Snijders ; A. Veloso ; A. Rothschild ; C. Olsen ; L. Date
Recovery and Reversibility of Electrical Instabilities in Double-Layer Dielectric Films / A. Cacciato
Low-Temperature Oxidation for Gate Dielectrics of Poly-Si TFTs using High-Density Surface Wave Plasma / K. Azuma ; M. Goto ; T. Okamoto ; Y. Nakata
Characterization of MIS Tunnel Junctions by Inelastic Electron Tunneling Spectroscopy (IETS) / C. Petit ; G. Salace ; D. Vuillaume
Authors Index
Subject Index
Preface
Interface Characterization / I.:
Electrical Characterization Techniques for Semiconductor-Silicon Dioxide Interface - A Review / M.J. Deen
85.

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図書
editors, M.D. Allendorf, F. Maury, F. Teyssandier ; sponsoring divisions, High Temperature Materials, Electronics, Dielectric Science and Technology
出版情報: Pennington, NJ : Electrochemical Society, c2003  2 v. (xxviii, 1570 p.) ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2003-8
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86.

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図書
editors, M. Cahay ... [et al.] ; sponsoring divisions, Dielectric Science and Technology, Electronics, and Luminescene an Display Materials
出版情報: Pennington, NJ : Electrochemical Society, Inc., c2002  viii, 218 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-9
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図書
editors, P.J. Timans ... [et al.] ; sponsoring deivisions, Electronics, Dielectric Science and Technology, and High Temperature Materials
出版情報: Pennington, NJ : Electrochemical Society, c2002  xiii, 478 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-11
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88.

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図書
editor, L. Mendicino ; sponsoring divisions, Dielectric Science and Technology and Electroncis
出版情報: Pennington, N.J. : Electrochemical Society, c2002  viii, 262 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-15
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Process Emissions Characterization and Treatment / A.:
Emissions Characterization of Advanced CVD Processes and Abatement Performance / V. Vartanian ; B. Goolsby ; C. Reddy ; V. Arunachalam ; L. Mendicino
Effective Management of Process Exhaust from Low-K CVD Processes / S. Carss ; A. Seeley ; J. Van Gompel
Development and Evaluation of the ATMI CDO 865 for Abatement of Low-K Process Effluent / B. Flippo ; R. Vermeulen
Managing Fluorine Emissions at Semiconductor Fabrication Facilities / M. Smylie
Characterization of Plasma-Etched RuO[subscript 2] Substrates / S. Samavedam ; L Mendicino ; J.J. Lee ; T. Guenther ; S. Dakshina-Murthy ; C. Sparks
Evaluation of Ozone Emissions Destruction Units for SACVD Process Tools / C. Nauert ; R. Camacho ; B. Day ; R. Lathrop ; H. Kwong ; J. Fox
Potential Cost of Ownership Reduction for a Nitride Furnace Point of Use Abatement Device / B. Davis ; M. Rossow
Electrochemical Removal of Hydrogen Sulfide from Geothermal Brines / B.G. Ateya ; F.M. AlKharafi
PFC Emissions Reduction / B.:
The Evaluation of Hexafluoro-1,3-Butadiene as an Environmentally Benign Dielectric Etch Chemistry in a Medium Density Etch Chamber / R. Chatterjee ; R. Reif ; T. Sparks
Post-Pump PFC Abatement by Atmospheric Microwave Plasmas: Completion of Metal Etch Beta Test / J.C. Rostaing ; D. Guerin ; C. Larquet ; A. El-Krid ; C.H. Ly ; J. Bruat ; E. Coffre ; M. Moisan ; H. Dulphy ; P. Moine ; J. Wiechers
Characterization of NF[subscript 3] Chamber Cleans on Multiple CVD Platforms / J. Rivers ; J. Vires ; A. Soyemi ; S.P. Sun ; M. Turner ; C. Esber
Reduction of PFC Emissions Through Process Advances in CVD Chamber Cleaning / S. Hsu ; C. Allgood ; M. Mocella
PFC Emissions Reduction and Process Improvements with Remote Plasma CVD Chamber Cleans / P.T. Brown ; S. Filipiak ; H. Estep ; M. Fletcher
Thermal Reductive Destruction of Perfluorocarbons into Safe Products Through In-situ Generation of Alkali Metals in Heated Solid Mixtures / M.C. Lee ; W. Choi
Alternative Cleans Technologies and Emerging Issues / C.:
Post Oxide Etching Cleaning Process Using Integrated Ashing and HF Vapor Process / O. Kwon ; H. Sawin
Fluorocarbon Film and Residue Removal Using Supercritical CO[subscript 2] Mixtures / S. Myneni ; D. Hess
A Summary of Recent Motorola Water Conservation Efforts from Source Reduction of Process Equipment / B. Raley ; T. Dietrich
Partnerships to Address EHS Aspects of Chemical Management in the Semiconductor Industry: Lessons from the PFAS Experience / M. Bowden ; L. Beu ; S. Pawsat
PFAS: Treatment Options and Sampling Methods / K. Barbee ; L. Lovejoy
EHS Risk Assessment and Management / D.:
Concepts and Application of Risk Management of Address Business Needs / S. Trammell ; J. Heironimus
Emergency Preparedness and Response for Semiconductor Manufacturing / S. Harris
Environmental Health and Safety (EHS) Investigation of CVD Exhaust System: Identification and Mitigation of Potential Release of Process Gases and By-products / L. Chandna ; A. Reynoso ; K. Hendricksen
Point of Use Abatement Unit By-Pass for NF[subscript 3]-Based CVD Chamber Clean Applications / D. Babbitt
Process Emissions Characterization and Treatment / A.:
Emissions Characterization of Advanced CVD Processes and Abatement Performance / V. Vartanian ; B. Goolsby ; C. Reddy ; V. Arunachalam ; L. Mendicino
Effective Management of Process Exhaust from Low-K CVD Processes / S. Carss ; A. Seeley ; J. Van Gompel
89.

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図書
editor, G.S. Mathad ; assistant editors, M.D. Allendorf, R.E. Sah, M. Yang ; sponsoring divisions, Dielectric Science and Technology and Electronics
出版情報: Pennington, N.J. : Electrochemical Society, c2002  ix, 324 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-17
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Preface
Plasma Enhanced Deposition
Process and Material Properties of PECVD Boron-doped Amorphous Silicon Films / H. Nominanda ; Y. Kuo
Properties of Boron-doped Amorphous Silicon Films Obtained with a Low Frequency Plasma / A. Heredia-J ; A. Torres-J ; A. Jaramillo-N ; F.J. De la Hidalga-W ; C. Zuniga-I ; A. Munguia-C
Si Epitaxial Growth on Atomic-Order Nitrided Si (100) using an ECR Plasma / M. Mori ; T. Seino ; D. Muto ; M. Sakuraba ; J. Murota
Optimizing Pulse Protocols in Plasma-Enhanced Atomic Layer Deposition / V. Prasad ; M.K. Gobbert ; T.S. Cale
High Density Plasma Deposited Silicon Nitride Films for Coating InGaAlAs High-Power Lasers / R.E. Sah ; F. Rinner ; R. Keifer ; M. Mikulla ; G. Weimann
High Productivity 300 mm HDP-CVD for Next-Generation Gap Fill Processes / B. Geoffrion ; N. Dubey ; P. Krishnaraj
Modeling & Mechanisms
Plasma Hydrogenation of a Buried Trap Layer in Silicon: Formation of a Platelet Layer / A.Y. Usenko ; W.N. Carr ; B. Chen
Integrated Modeling Investigation of Plasma Dielectric Etching Processes / D. Zhang ; S. Rauf ; T.G. Sparks ; P.L.G. Ventzek
Plasma-Surface Kinetics and Feature Profile Evolution in Cl[subscript 2] + HBr Etching of Poly-silicon / W. Jin ; S.A. Vitale ; H.H. Sawin
Surface Treatment of SiC using NF[subscript 3]/O[subscript 2] Plasmas / T. Kai ; W. Shimizu ; A. Hibi ; T. Iwase ; T. Abe ; M. Inaba ; Z. Ogumi ; T. Tojo ; A. Taska
Quantitative Analysis and Comparison of Endpoint Detection Based on Multiple Wavelength Analysis - Part I: Multi-Wavelength Method / B.E. Goodlin ; D.S. Boning
Quantitative Analysis and Comparison of Endpoint Detection Based on Multiple Wavelength Analysis - Part II: Noise Analysis of Multi-Wavelength OES
Equipment / Plasma Etching II:
Investigations of 300 mm Wafer Tool Set Progress and Performance / K. Mautz
Simultaneous Fault Detection and Classification for Semiconductor Manufacturing Tools / B.M. Wise
Effects of Showerhead Face Chemistry on Capacitively Coupled Plasma Discharges / B. Devulapalli ; G.I. Font
Gate Dielectrics and Silicon / Plasma Etching III:
Differential Surface Charging of the Dielectric during Plasma Etching and Surface Charge Leakage Kinetic / M.K. Abatchev ; B.J. Howard ; D.S. Becker ; R.L. Stocks ; J. Chapman
Thickness Scaling of Gate Dielectric on Plasma Charging Damage in MOS Devices / K-S. Chang-Liao ; P-J. Tzeng
Gate Oxide Integrity and Micro-loading Characterization of 300 mm Process Tools
Measurement of Device Charging Damage in a Dielectric Etch 300 mm Chamber with a Bias Voltage Diagnostic Cathode / M.C. Kutney ; S. Ma ; K. Horioka ; R. Lindley ; S. Kats ; T. Kropewnicki ; K. Doan ; H. Shan
Etching of High-k Gate Dielectrics and Gate Metal Candidates / S.K. Han ; I. Kim ; H. Zhong ; G.P. Heuss ; J.H. Lee ; D. Wicaksana ; J.P. Maria ; V. Misra ; C.M. Osburn
Etching High Aspect Ratio Silicon Trenches / S. Panda ; R. Ranade ; G.S. Mathad
Inverse Micro-loading Effect in Reactive Ion Etching of Silicon / S. Jensen ; O. Hansen
Plasma Etched Micro-machined Silicon Stampers for Plastic Bio-Technology Applications / D. Weston ; W.J. Dauksher ; D. Rhine ; T. Smekal ; P.J. Stout
Silicon Dioxide / Plasma Etching IV:
Radical Control in a Hole to Break an Etch-Stop Barrier in Highly Selective HAC Etching / N. Negishi ; K. Yokogawa ; T. Yoshida ; M. Izawa
Etching vs Deposition: The Effect on Profiles and Etching Yield Curves for Oxide Etching / O. Kwon
Dual Damascene, Low-k / Plasma Etching V:
Effect of Oxygen and Nitrogen Additions on Silicon Nitride Reactive Ion Etching in Fluorine Containing Plasmas / C. Reyes-Betanzo ; S.A. Moshkalyov ; A.C.S. Ramos ; M.A. Cotta ; J.W. Swart
A Novel Approach to Reduce Via Corner Faceting in the Via-First, No Middle Stop Layer Dual Damascene Trench Etch / Y-S. Kim ; K.L. Doan ; C. Bjorkman ; A. Paterson ; Z. Sui
Patterning 180 nm Copper Oxide Dual Damascene Baseline with 193 nm Resists / V. Bakshi ; G. Smith
Copper Fine Patterns Etched with HBr Plasma Based Processes / S. Lee
Intellectual Property Creation from Semiconductor Process and Equipment Development
Author Index
Subject Index
Preface
Plasma Enhanced Deposition
Process and Material Properties of PECVD Boron-doped Amorphous Silicon Films / H. Nominanda ; Y. Kuo
90.

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図書
editors, M. Cahay ... [et. al] ; sponsoring divisions, Dielectric Science and Technology, Electronics, and Luminescence and Display Materials
出版情報: Pennington, N.J. : Electrochemical Society, c2002  viii, 416 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-18
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Preface
Carbon Nanotubes
Quantum Interference Effects in the Nanotriode / S. Johnson ; A. Blackburn ; A. Driskill-Smith ; D. Hasko ; H. Ahmed
Microgated In-Situ Grown Carbon Nanotube Field Emitter Arrays / D. Hsu ; J. Shaw
A Micromachined On-chip Vacuum Microtriode Using a Carbon Nanotube Cold Cathode / W. Zhu ; L.H. Chen ; C. Bower ; D. Shalom ; D. Lopez
Electron Emission Microscopy Measurements of Nitrogen and Sulfer Doped Carbon Films / F. Koeck ; S. Gupta ; B.R. Weiner ; G. Morell ; J.M. Garguilo ; B. Brown ; R.J. Nemanich
Carbon Nanotubes for Future Field Electron Emission Devices / O. Groning ; R. Clergeraux ; L. Nilsson ; P. Ruffieux ; L. Schlapbach ; P. Groning
Saturated Emmision from Carbon Nanotubes
Fabrication and Characterization of Field Emission Devices Based on Single Vertically Aligned Carbon Nanofibers / M.A. Guillorn ; V.I. Merkulov ; A.V. Melechko ; E.D. Ellis ; L.R. Baylor ; D.K. Hensley ; R.J. Kasica ; T.R. Subich ; D. Lowndes ; M.L. Simpson
Atom-by-atom Analysis of Field Emission Sources by the Scanning Atom Probe / O. Nishikawa ; T. Yagyu ; T. Murakami ; M. Watanabe ; M. Taniguchi ; T. Kuzumaki ; S. Kondo
Field Emitter Arrays
Microfabricated Field Emitter Performance Enhancement by High Current Processing / P.R. Schwoebel ; C.A. Spindt ; C.E. Holland
Study of Emitter Materials for use in Hostile Environments / W.A. Mackie ; C. Dandeneau ; L.A. Southall ; F.M. Charbonnier
Intelligent Silicon Field Emission Arrays / C.Y. Hong ; A.I. Akinwande
Field Emission Array Cathode Material Selection for Compatibility with Electric Propulsion Applications / C.M. Marrese-Reading ; J. Polk ; B. Koel ; M. Quinlan
Field Induced Thickening of Au-coated Nanosize Si-tip and Field Emission from PR-coated Si-tip / S.S. Choi ; M.Y. Jung ; D.W. Kim ; M.S. Joo
Field Emission Study of Ti-Silicide Array / S.B. Kim ; H.T. Jeon
Theory and Simulation
Emissive and Cooling Properties of Carbon Based Materials for Microelectronics / N.M Miskovsky ; P.H. Cutler ; A. Mayer ; P.B. Lerner
Modeling Device Performance and Feature Variation in Microtip Field Emitters / J. Zuber ; K.L. Jensen
Simulations of Transport and Field-Emission Properties of Multi-wall Carbon Nanotubes / N.M. Miskovsky
Equilibrium Theory of Nanotips / G. Bilbro
An Analysis of FEA Noise Mechanisms / M. Cahay
Sub-Poissonian and Super-Poissonian Shot Noise in Planar Cold Cathodes / R. Krishnan
Electrostatic Factors Affecting Emission From Discrete Isolated Diamond Nanodots / D.L. Jaeger ; T. Tyler ; A.K. Kvit ; J.J. Hren ; V.V. Zhirnov
Current Density Evaluation At The Barrier Maximum / P. O'Shea ; D. Feldman
Tunnel Charcateristics of the Metal Tip-Cathodes with the Superthin Diamond Coatings Using Non-Local Considerations / L. Il'chenko ; V. Il'chenko ; R.M. Novosad ; Y.V. Kryuchenko
About Theoretical Calculation of Semiconductor's Surface Images for Closely Spaced Semiconductor and Metal in STM
Thin films and Nanostructures
Emission from GaN p-n Junction Cold Cathodes / R. Treece ; D. Patel ; C. Menoni ; J. Smith ; J. Pankove
Effect of Film Thickness on Low-Energy Electron Transmission in Thin CVD Diamond Films / J. Yater ; A. Shih ; J. Butler ; P. Pehrsson
Growth and Characterization of LaS and NdS Thin Films on Si, GaAs, and InP Substrates / Y. Modukuru ; J. Thachery ; P. Boolchand ; J. Grant
Surface-Emitting Ballistic Cold Cathodes Based on Nanocrystalline Silicon Diodes / N. Koshida ; K. Kojima ; Y. Nakajima ; T. Ichihara ; Y. Watabe ; T. Komoda
Microwave-Tube Experiments Utilizing Ferroelectric Electron-Gun / M. Einat ; E. Jerby ; G. Rosenman
Author Index
Subject Index
Preface
Carbon Nanotubes
Quantum Interference Effects in the Nanotriode / S. Johnson ; A. Blackburn ; A. Driskill-Smith ; D. Hasko ; H. Ahmed
91.

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図書
editors, G.M. Swain ... [et al.] ; sponsoring divisions, Dielectric Science and Technology, High Temperature Materials, and Electronics
出版情報: Pennington, N.J. : Electrochemical Society, c2002  ix, 290 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2001-25
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92.

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図書
editor, G.S. Mathad ; assistant editors, T. S. Cale ...[et al.] ; sponsoring divisions, Dielectric Science and Technology, Electronics
出版情報: Pennington, N.J. : Electrochemical Society, c2003  x, 424 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2003-13
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Preface
Plasma Processing for the 100 nm Node / Part I:
Plasma Processes
Kinetic Modeling for Multi-Component Thin Film Growth in Plasma-Enhanced Atomic Layer Deposition / J-H. Kim ; J-Y. Kim ; P-K. Park ; S-W. Kang
Incidence of Deposition Parameters on the Structural Properties of Y[subscript 2]O[subscript 3] Grown by Pulsed Injection PE-MOCVD / C. Durand ; C. Vallee ; O. Salicio ; V. Loup ; M. Bonavalot ; O. Joubert ; C. Dubourdieu
Copper-Barrier and Hard-Mask Elaboration by Plasma-Enhanced Chemical Vapor Deposition Using Organosilane Precursors / B. Remiat ; F. Fusalba ; P. Maury ; V. Jousseaume ; C. Lecornec ; F. Gaillard ; J. Durand
Gas-Phase and Surface Reactions in Plasma Enhanced Chemical Etching of High-k Dielectrics / L. Sha ; J.P. Chang
A Comparative Study of the Etching Behavior of Thin AlN and Al[subscript 2]O[subscript 3] Films / M. Engelhardt
Etching of Low-k Interconnect Materials for Next Generation Devices / T. Chevolleau ; N. Posseme ; L. Vallier ; I. Thomas-Boutherin
Resist Transformation during Etching Steps Involved in Patterning Low-k Dielectric Materials: Impact on Process Control / E. Pargon
Adhesion of Copper and Sulfur-Modified SiLK / D.-L. Bae ; J.J. Senkevich ; C. Kezewski ; Y. Kwon ; T.S. Cale
Porous SiOCH Modification Studies Induced by Ashing Processes / Thomas-Boutherin
Modeling Investigation of Plasma Clean Processes / D. Zhang ; D. Denning
Copper Interconnects with Low-k Inter Level Dielectric Films / Part II:
Copper Deposition
Preparation of Cu Films on Polymer Substrate by ECR-MOCVD Coupled with DC Bias at Room Temperature / J-K. Lee ; B-W. Cho
Effect of Novel Plasma Treatment on Superfilling Behavior in Chemically Enhanced CVD (CECVD) Cu Process / S-G. Pyo ; W-S, Min ; D-W. Lee ; S. Kim ; J-G. Lee
A Model of Copper Deposition for the Damascene Process / C. Gabrielli ; J. Kittel ; P. Mocoteguy ; H. Perrot ; A. Zdunek ; P. Bouard ; M. Haddix ; L. Doyen ; M.C. Clech
AFM Observation of Microstructural Evolution at Room Temperature in Electrodeposited Copper Metallization / S. Ahmed ; D.N. Buckley ; A. Arshak ; A.M. O'Connell ; L.D. Burke
"Seedless" Electrochemical Deposition of Copper on Liner-Materials for ULSI Devices / D.J. Duquette ; S.J. Kim ; M.J. Shaw
Electroless Metallization of Hydrogen-Terminated Si[left angle bracket]100[right angle bracket] Surface Functionalized by Viologen / W.H. Yu ; E.T. Kang ; K.G. Neoh
Barrier and Low-k Films
TiZrN as a Copper Barrier for 0.13 [mu]m and 0.09 [mu]mTechnology Nodes / L. Swedberg ; C. Prindle
Nanostructured Ta-Si-N Thin Films as Diffusion Barriers between Cu and SiO[subscript 2] / L.W. Lai ; C.C. Chang ; J.S. Chen ; Y.K. Lin
Selectivity Studies on Tantalum Barrier Layer for Copper Chemical Mechanical Planarization / A. Vijayakumar ; T. Du ; K.B. Sundaram ; V. Desai
Investigation of Barrier Layers for Cu-Ultra Low-k Porous Polymer Integration / L.Y. Yang ; D.H. Zhang ; C.Y. Li ; P.D. Foo ; K. Prasad ; C.M. Tan
Atomic Layer Deposition of Ruthenium Glue Layer for Copper Damascene Interconnect / O-K. Kwon
Introducing Advanced ULK Dielectric Mateials in Interconnects: Performance and Integration Challenges / C. Le Cornec ; K. Haxaire ; T. Mourier ; P.H. Haumesser ; S. Maitrejean ; J. Simon ; A. Chabli ; G. Passemard
Surface Modification of Porous Low-k Dielectrics / Q.T. Le ; C.M. Whelan ; H. Struyf ; S.H. Brongersma ; T. Conard ; W. Boullart ; S. Vanhaelemeersch ; K. Maex
Structural and Electrical Characteristics of Low Dielectric Constant Porous Hydrogen Silsesquioxane for Cu Metallization / J.H. Wang ; P.T. Liu ; T.C. Chang ; W.J. Chen ; S.L. Cheng ; J.Y. Lin ; L.J. Chen
Nanoporous Low-k Polyimide Films Prepared from Poly(Amic Acid) with Grafted Poly(Acrylic Acid)/Poly (Ethylene Glycol) Side Chains / W.C. Wang ; C.K. Ong ; L.F. Chen
X-Ray Photoelectron Spectroscopic Study of Surface Modification of SiLK under UV-Irradiation / Y. Uchida ; T. Fukuda ; H. Yanazawa
Characteristics of Low-k Methyl-Silsesquiazane (MSZ) for CMP Process Using Oxygen Plasma Treatment / T.M. Tsai ; S.T. Yan ; Y.C. Chang ; H. Aoki ; T.Y. Tseng
Copper CMP and Reliability
Electrochemical Planarization of Copper
A Multiscale Mechanical CMP Model for Patterned Wafers / J. Seok ; C.P. Sukam ; A.T. Kim ; J.A. Tichy
The Roles of Complexing Agents on Copper CMP / G. Lim ; T.E. Kim ; J.-H. Lee ; J. Kim ; H.-W. Lee
The Effect of Inhibitor and Complexing Agents on Cu CMP / Y. Luo
Role of Oxidizer and Inhibitor on Chemical Mechanical Planarization of Copper / S.C. Kuiry ; S. Seal
Effect of Abrasive Particles on Chemical Mechanical Polishing Performance / D. Tamboli ; G. Banerjee ; S. Chang ; M. Waddell ; I. Butcher ; Q. Arefeen ; S. Hymes
Chemical Mechanical Planarization of Ruthenium for Capacitor Bottom Electrode in DRAM Technology / S-H. Lee ; Y-J. Kang ; J-G. Park ; S-I. Lee
Industry Challenges in Post-Etch Cleaning Chemistries for Advanced Copper/Low-k Applications / M.A. Fury
Cleaning of Copper Surface Using Vapor-Phase Organic Acids / T. Yagishita ; K. Ishikawa ; M. Nakamura
Time-Zero Failure Current Measurement for Early Monitoring of Defective Cu Lines at Wafer Level / J-H. Park ; B-T. Ahn
Annealing Characteristics of Copper Films for Power Device Applications / L. Castoldi ; S. Morin ; G. Visalli ; T. Fukada ; M. Ouaknine ; E.H. Roh ; W.S. Yoo
The Stability of Carbon-Doped Silicon Oxide Low Dielectric Constant Thin Films / Y.H. Wang ; R. Kumar
Nickel Silicide Formation Using a Stacked Hotplate-Based Low Temperature Annealing System / T. Murakami ; B. Froment ; V. Carron ; W-S. Yoo
3-D Interconnects
3-D Electromigration Modeling and Simulation in Aluminum-Silicon Dioxide and Copper-Low-k Multilevel Interconnects / V. Sukharev ; R. Choudhary ; C.W. Park
Transient Thermal and Mechanical Modeling of 3D-IC Structures / J. Zhang ; J.-Q. Lu ; R.J. Gutmann
3D System-on-a-Chip Using Dielectric Glue Bonding and Cu Damascene Inter-Wafer Interconnects / A. Jindal ; J.J. McMahon ; K.-W. Lee ; R.P. Craft ; B. Altemus ; D. Cheng ; E. Eisenbraum
The Impact of Wafer-Level Layer Transfer on High Performance Devices and Circuits for 3D IC Fabrication / K.W. Guarini ; A.W. Topol ; M. Ieong ; K. Bernstein ; K. Xiu ; R.V. Joshi ; R. Yu ; L. Shi ; M.R. Newport ; D.V. Singh ; G.M. Cohen ; H.B. Pogge ; S. Purushothaman ; W.E. Haensch
Wafer Bonding and Thinning Integrity for 3D-IC Fabrication
Author Index
Subject Index
Preface
Plasma Processing for the 100 nm Node / Part I:
Plasma Processes
93.

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図書
editor, L. Mendicino ; assistant editor, L. Simpson
出版情報: Pennington, NJ : Electrochemical Society, c1999  viii, 246 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 99-8
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図書
editors, K. B. Sundaram ... [et al.] ; Dielectric Science and Technology and Electronics Divisions, and High Temperature Materials Divisions [of the Electrochemical Society]
出版情報: Pennington, New Jersey : Electrochemical Society, c1999  xi, 284 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 99-6
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図書
editors, P. C. Andricacos ...[et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c1999  ix, 400 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 99-9
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目次情報: 続きを見る
Superconformal Electrodeposition of Copper / T.P. Moffat ; J.E. Bonevich ; W.H. Huber ; A. Stanishevshky ; D.R. Kelly ; G.R. Stafford ; D. Josell
Magnetic Nanowire Arrays Obtained by Electrodeposition In Ordered Alumina Templates / K. Nielsch ; F. Muller ; G. Liu ; R.B. Wehrspohn ; U. Gosele ; S.F. Fischer ; H. Kronmuller
Mapping Alloy Electrodeposition Conditions Onto Deposit Characteristics for Microelectrode Arrays / Jason Thomas ; Daniel A. Buttry ; John Pope ; Donald Montgomery
Experimental Conditions for CdSe Layer - by - Layer Growth / F. Loglio ; M. Innocenti ; G. Pezzatini ; F. Forni ; M.L. Foresti
Potential Dependence of InAs Formation by ECALE at Room Temperature / Raman Vaidyanathan ; Travis L. Wade ; Uwe Happek ; John L. Stickney
A Study of Electrochemically Deposited Copper on PVD Copper and TiN Using a Cu-EDTA Complexed Bath / Lyndon Graham ; Christoph Steinbruchel ; David J. Duquette
Analysis of Copper Plating Baths - New Developments / Edward Kaiser ; Beverly Newton ; Robert Joyce ; Jeffrey Rohrer ; Kshama B. Jirage ; Chin Chang Cheng ; Richard Hurtubise
Role of Damascene Via Filling Additives - Morphology Evolution / Kazuo Kondo ; Katsuhiko Hayashi ; Zennosuke Tanaka ; Norihiro Yamakawa
Copper Electrodeposition for On - Chip Interconnection - The Role Of Different Additives / P.L. Cavallotti ; R. Vallauri ; A. Vicenzo
Monitoring of SPS - Based Additives in Cu Plating / Jean Horkans ; John Dukovic
Trends in Properties of Electroplated Cu with Plating Conditions and Chemistry / Cyril Cabral, Jr. ; Kenneth P. Rodbell ; Christopher Parks ; Michael A. Gribelyuk ; Sandra Malhotra ; Panayotis C. Andricacos
Contact Resistance in Copper Plating on Wafers - Analysis and Design Criteria / Yezdi Dordi ; Uziel Landau ; Jayant Lakshmikanthan ; Joe Stevens ; Peter Hey ; Andrew Lipin
Shape Evolution of Copper Electrodeposition: Numerical and Experimental Investigation / M. Georgiadou ; D. Papapanayiotou ; D. Veyret ; R.L. Sani ; R.C. Alkire
Model of Superfilling in Damascene Electroplating: Comparison of Experimental Feature Filling with Model Predictions / H. Deligianni ; J. Horkans ; K. Kwietniak ; J.O. Dukovic ; P.C. Andricacos ; S. Boettcher ; S.-C. Seo ; P. Locke ; A. Simon ; S. Seymour ; S. Malhotra
Feature Scale Simulation of Copper Deposition for IC Interconnection / Bang-Hao Wu ; Yung-Yun Wang ; Chi-Chao Wan
The Electrochemistry of the Active State of Copper / L.D. Burke ; J.A. Collins ; M.A. Murphy ; A.M. O'Connell
The Effects of Process Conditions on the Residual Stress and Composition of Electroless Nickel Films for MEMS / Seung Hwan Yi ; F.J. Von Preissig ; Euk Sok Kim
Novel Porous Silicon Formation Technology Using Internal Current Generation / A. Splinter ; J. Sturmann ; W. Benecke
Surface in Fluoride Solution Studied by Attenyated Total Reflection Fourier Transform Infrared and X-Ray Photoelectron Spectroscopy / Shen Ye ; Taro Ishihara ; Kohei Uosaki
Cathodic Reactions in Copper Chemical Mechanical Polishing: The Cu/Fe[superscript 3+] and Cu/H[subscript 2]O[subscript 2] Systems / Ashraf T. Al-Hinai ; Kwadwo Osseo-Asare
Novel STI CMP Process Using Highly Selective Ceria Slurry with Thin Nitride Stopper / Jung-Yup Kim ; Jung Hun Park ; Bo Un Yoon ; Sangrok Hah ; Joo-Tae Moon
Oxidation and Dissolution Characteristics of Tungsten: Application To Chemical Mechanical Polishing / M. Anik ; K. Osseo-Asare
Electrodeposition of Copper Onto Silicon Surfaces from Copper Sulfate Solutions / Chunxin Ji ; Gerko Oskam ; Peter C. Searson
Author Index
Subject Index
Superconformal Electrodeposition of Copper / T.P. Moffat ; J.E. Bonevich ; W.H. Huber ; A. Stanishevshky ; D.R. Kelly ; G.R. Stafford ; D. Josell
Magnetic Nanowire Arrays Obtained by Electrodeposition In Ordered Alumina Templates / K. Nielsch ; F. Muller ; G. Liu ; R.B. Wehrspohn ; U. Gosele ; S.F. Fischer ; H. Kronmuller
Mapping Alloy Electrodeposition Conditions Onto Deposit Characteristics for Microelectrode Arrays / Jason Thomas ; Daniel A. Buttry ; John Pope ; Donald Montgomery
96.

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図書
edited by R.B. Comizzoli, R.P. Frankenthal, J.D. Sinclair
出版情報: Pennington, NJ : Electrochemical Society, c1999  viii, 292 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 99-29
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97.

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図書
editors, G.S. Mathad ...[et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c2000  ix, 340 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 99-31
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98.

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図書
editors, J.L. Davidson ... [et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c2000  xiv, 532 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 99-32
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99.

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図書
editors, R.L. Opila ... [et al.]
出版情報: Pennington, N. J. : Electrochemical Society, c2000  xii, 644 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 99-37
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100.

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図書
editor, Laura Mendicino
出版情報: Pennington, NJ : Electrochemical Society, c2000  viii, 230 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2000-7
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目次情報: 続きを見る
PFC Emissions Reduction / A.:
An Efficient, Highly Reliable Plasma Tool for PFC Abatement / X. Chen ; W. Holber ; M. Peter
Litmas Plasma Abatement Long-Term Reliability Test / V. Vartanian ; L. Beu ; T. Stephens ; J. Rivers ; B. Perez ; M. Kiehlbauch ; E. Tonnisand D. Graves
Optimization of a C[subscript 2]F[subscript 6] Clean for an Applied Materials' TEOS PECVD Process: Reduced PFC Emissions and Faster Clean Times / A. D. Johnson ; W. R. Entley ; R. N. Vrtis ; J. Langan ; P. Maroulis ; C. M. Chen ; C. T. Chen ; Y. C. Chang ; O. H. Yam
Chamber Clean Optimization for Silicon Carbide Films Using C[subscript 3]F[subscript 8] in a Novellus Concept One PECVD System / C. Beatty ; K. Sonti ; J. Williams ; L. Zazzera ; L. Tousignant ; S. Kesari
Evaluation of the Applied Materials Remote Clean Technology for Lamp Heated CVD Chambers for Perfluorocompound (PFC) Emissions Reduction / L. Mendicino ; C. Nauert ; J. Flood ; P. T. Brown ; A. Atherton ; T. Nowak ; D. Silvetti
Process Emissions Characterization / B.:
High Pressure Sampling Mass Spectrometry of Semiconductor Tool Process Emissions / B. Baker ; J. Arnold ; S. Quarmby ; M. Platt
Air Monitoring and Odor Elimination in a Semiconductor Photolithography Area / M. Villars ; A. Sevier ; D. Kaczmarik
Continuous Real-Time Detection of Molecular Fluorine (F2) Emitted as a By-Product Of CVD and Etch Processes / C. Laush
Point of Use Abatement for CVD Precursors and Reaction Products / P. Brown ; K. Reid ; J. Van Gompel
FTIR Analysis of a New High K Gate Material for MOCVD Applications / V. Cole
Alternative Clean Processes and Water Usage Reduction / C.:
Manufacturing Qualification of an All Dry DeVeil Plasma Process / D. Dopp ; L. Mikus ; A. Horn ; R. Bersin ; H. Xu ; M. Boumerzoug
EHS Concerns with Ozonated Water Spray Processing / K. McCormack ; K. Barbee
An Environmentally Benign BEOL Clean / K. Shrinivasan ; K. Reinhardt ; A. Shimanovich ; P. Sadkowski
Reduction of De-ionized Water Usage in Photoresist Stripping Processes / T. Kamal ; D. W. Hess
Microbial Control in Ultra-pure Water During Ultra-low Flow Conditions / B. Hoyt ; J. Molloy
General Technologies / D.:
Addressing the Environment, Safety and Health Challenges of the 1999 International Technology Roadmap for Semiconductors / S. Gibson
Risk-Based Evaluation of Bulk Anhydrous Hydrogen Chloride Delivery Alternatives Used in the Semiconductor Industry / P. T. Brow
Copper Removal from Chemical Mechanical Polishing Effluent / C. Riley ; J. Filson
The Environmental Value Systems (ENV-S) Analysis: Application to CMP Effluent Treatment Options / N. Krishnan ; S. Thurwachter ; P. Sheng ; T. Francis
Development and Implementation of an ISO Modeled Environmental, Health and Safety Management System / T. Nasi ; T. McCay ; R. Reblin
Safety and Environmental Concerns of CVD Copper Precursors / B. Zorich ; J. Norman ; M. Majors
Treatability of Chemical Mechanical Planarization (CMP) Wastewater / B. J. Davis ; S. Sue
PFC Emissions Reduction / A.:
An Efficient, Highly Reliable Plasma Tool for PFC Abatement / X. Chen ; W. Holber ; M. Peter
Litmas Plasma Abatement Long-Term Reliability Test / V. Vartanian ; L. Beu ; T. Stephens ; J. Rivers ; B. Perez ; M. Kiehlbauch ; E. Tonnisand D. Graves
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