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図書

図書
Hiroshi Ito, editor ... [et al.]
出版情報: Washington, DC : American Chemical Society, c1998  xii, 386 p. ; 24 cm
シリーズ名: ACS symposium series ; 706
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目次情報: 続きを見る
Preface
Novel Patterning Chemistry and Processing
Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist / Christopher Harrison ; Miri Park ; Paul M. Chaikin ; Richard A. Register ; Douglas H. Adamson1.:
Inorganic Nanostructures on Surfaces Using Micellar Diblock Copolymer Templates / Joachim P. Spatz ; Thomas Herzog ; Stefan Mossmer ; Paul Ziemann ; Martin Moller2.:
Synthesis of Stereoregular Polymers as Precursors to Highly Conducting Carbon for Use in Applications in Micro- and Nanolithography / C. B. Gorman ; R. W. Vest ; J. L. Snover ; T. L. Utz ; S. A. Serron3.:
Metallization on Poly(tetrafluoroethylene) Substrate by Excimer-Laser-Induced Surface Reaction and Chemical Plating / Hiroyuki Niino ; Akira Yabe4.:
An Inorganic Approach to Photolithography: The Photolithographic Deposition of Dielectric Metal Oxide Films / Ross H. Hill ; Sharon L. Blair5.:
Molding of Polymeric Microstructures / T. Hanemann ; V. Piotter ; R. Ruprecht ; J. H. Hausselt6.:
Microlithographic Chemistry and Processing
Acid Labile Cross-Linked Units: A Concept for Improved Positive Deep-UV Photoresists / H.-T. Schacht ; P. Falcigno ; N. Munzel ; R. Schulz ; A. Medina7.:
Chemistry of Ketal Resist System and Its Lithographic Performance / Wu-Song Huang ; Kim Y. Lee ; Rao Bantu ; Ranee Kwong ; Ahmad Katnani ; Mahmoud Khojasteh ; William Brunsvold ; Steven Holmes ; Ronald Nunes ; Tsuyoshi Shibata ; George Orsula ; James Cameron ; Dominic Yang ; Roger Sinta8.:
Photoacid Diffusion in Chemically Amplified DUV Resists / Toshiro Itani ; Hiroshi Yoshino ; Shuichi Hashimoto ; Mitsuharu Yamana ; Norihiko Samoto ; Kunihiko Kasama9.:
Highly Photosensitive Diazo Compounds as Photoacid Generators for Chemically Amplified Resists / Kieko Harada ; Masahito Kushida ; Kyoichi Saito ; Kazuyuki Sugita ; Hirotada Iida10.:
Exploration of Chemically Amplified Resist Mechanisms and Performance at Small Linewidths / James W. Taylor ; Paul M. Dentinger ; Steven J. Rhyner ; Geoffrey W. Reynolds11.:
The Preparation and Investigation of Macromolecular Architectures for Microlithography by "Living" Free Radical Polymerization / G. G. Barclay ; M. King ; A. Orellana ; P. R. L. Malenfant ; R. Sinta ; E. Malmstrom ; H. Ito ; C. J. Hawker12.:
Acid Proliferation Reactions and Their Application to Chemically Amplified Lithographic Imaging / Kunihiro Ichimura ; Koji Arimitsu ; Soh Noguchi ; Kazuaki Kudo13.:
Advanced Microlithographic Materials Chemistry and Processing
Deprotection Kinetics of Alicyclic Polymer Resist Systems Designed for ArF (193 nm) Lithography / Uzodinma Okoroanyanwu ; Jeffrey D. Byers ; Ti Cao ; Stephen E. Webber ; C. Grant Willson14.:
193 nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives: The Interplay of the Chemical Structure of Components and Lithographic Properties / F. M. Houlihan ; A. Timko ; R. Hutton ; R. Cirelli ; J. M. Kometani ; Elsa Reichmanis ; O. Nalamasu15.:
Synthesis and Evaluation of Alicyclic Backbone Polymers for 193 nm Lithography / Hiroshi Ito ; Norbert Seehof ; Rikiya Sato ; Tomonari Nakayama ; Mitsuru Ueda16.:
Progress in 193-nm Single Layer Resists: The Role of Photoacid Generator Structure on the Performance of Positive Resists / Robert D. Allen ; Juliann Opitz ; Carl E. Larson ; Thomas I. Wallow ; Richard A. DiPietro ; Gregory Breyta ; Ratnam Sooriyakumaran ; Donald C. Hofer17.:
Calixarene and Dendrimer as Novel Photoresist Materials / Osamu Haba ; Daisuke Takahashi ; Kohji Haga ; Yoshimasa Sakai18.:
Calixarene Resists for Nanolithography / Yoshitake Ohnishi ; Naoko Wamme ; Jun-ichi Fujita19.:
Design and Preliminary Studies of Environmentally Enhanced Water-Castable, Water-Developable Positive Tone Resists: Model and Feasibility Studies / Jennifer M. Havard ; Dario Pasini ; Jean M. J. Frechet ; David Medeiros ; Shintario Yamada20:
Molecular Design for New Positive Electron-Beam Resists / Yukio Nagasaki21.:
Lithographic Materials and Processes
The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: Adaption of the Probabilistic Approach / Christopher L. McAdams ; Wang Yueh ; Pavlos Tsiartas ; Dale Hsieh22.:
Photoacid Generating Polymers for Surface Modification Resists / Masamitsu Shirai ; Mitsuho Masuda ; Masahiro Tsunooka ; Masayuki Endo ; Takahiro Matsuo23.:
Material Design and Development for Aqueous Base Compatible High-Performance Deep UV Negative-Tone Resists / Pushkara Rao Varanasi ; Phil Brock ; William R. Brunsvold ; Ahmad D. Katnani24.:
Advanced Chemically Amplified Resist Process Using Non-Ammonia Generating Adhesion Promoter / M. Endo ; A. Katsuyama25.:
Post-Exposure Bake Kinetics in Epoxy Novolac-Based Chemically Amplified Resists / P. Argitis ; S. Boyatzis ; I. Raptis ; N. Glezos ; M. Hatzakis26.:
Alkali-Developable Positive-Photosensitive Polyimide Based on Diazonaphthoquinone Sensitizer / T. Ueno ; Y. Okabe ; T. Miwa ; Y. Maekawa ; G. Rames-Langlade27.:
Author Index
Subject Index
Preface
Novel Patterning Chemistry and Processing
Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist / Christopher Harrison ; Miri Park ; Paul M. Chaikin ; Richard A. Register ; Douglas H. Adamson1.:
2.

図書

図書
Martin R. Tant, editor, Anita J. Hill, editor
出版情報: Washington, DC : American Chemical Society, 1998  x, 470 p. ; 24 cm
シリーズ名: ACS symposium series ; 710
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目次情報: 続きを見る
Preface
The Structure and Properties of Glassy Polymers / t Anita J. Hill ; Martin R. Tant
An Overview
Physics of Glassy Polymers
The Use of Configurational Entropy to Derive the Kinetic Properties of Polymer Glasses / t Edmund A. DiMarzio2:
Entropy, Landscapes, and Fragility in Liquids and Polymers, and the DetlaCp Problem / t C. A. Angell3:
Dynamic Properties of Polymer Melts above the Glass Transition: Monte Simulation Carlo Results / Jorg Baschnagel4:
The Thermal Glass Transition beyond the Time Trap / K.-P. Bohn ; J. K. Kruger5:
Dynamic Monte Carlo Simulation and Dielectric Measurements of the Effect of Pore Size on Glass Transition Temperature and the State of the Glass / N. Haralampus et al6:
Temperature-Modulated Calorimetry of the Frequency Dependence of the Glass Transition of Poly(ethylene terephthalate) and PolystyreneMolecular Mobility and Relaxations in the Glassy State / Bernhard Wunderlich ; Iwao Okazaki7:
Polymer Glasses: Thermodynamic and Relaxational Aspects / Robert Simha8:
Structural Relaxation and Fragility of Glass-Forming Miscible Blends Composed of Atactic Polystyrene and Poly(2,6-dimethyl-1,4-phenylene oxide) / Christopher G. Robertson ; Garth L. Wilkes9:
Dielectric Spectroscopy of Bisphenol-A Polycarbonate and Some of Its Blends / G. J. Pratt ; M. J. A. Smith10:
Physical Aging near the Beta Transition of a Poly(amide-imide) / George J. Dallas et al11:
Low-Temperature Relaxation of Polymers Probed by Photochemical Hole BurningPhysical Aging / Shinjiro Machida et al12:
Fitting Differential Scanning Calorimetry Heating Curves for Polyetherimide Using a Model of Structural Recovery / Sindee L. Simon13:
The Physics of Glassy Polycarbonate: Superposability and Volume Recovery / Paul A. O'Connell ; Carl R. Schultheisz ; Gregory B. McKenna14:
Polymer-Polymer Miscibility Investigated by Temperature Modulated Differential Scanning Calorimetry / G. O. R. Alberda van Ekenstein ; G. ten Brinke ; T. S. Ellis15:
Physical Ageing in PMMA Investigated Using Positron Annihilation, Dielectric Relaxation, and Dynamic Mechanical Thermal AnalysisMechanical Properties / William J. Davis ; Richard A. Pethrick16:
Craze Initiation and Failure in Glassy Poly(ethylene Terephthalate) the Effects of Physical Aging with and without Exposure to Chemical Environments / Martin R. Tant et al17:
Transitions, Properties, and Molecular Mobility during Cure of Thermosetting Resins / Jakob Lange et al18:
A Dynamic Probe of Tribological Processes at Metal-Polymer Interfaces: Transient Current Generation / J. T. Dickinson ; L. Scudiero ; S. C. Langford19:
The Effect of Orientation by Solid State Processes on the Amorphous Regions in Poly(vinyl alcohol) and High Density Poly(ethylene)Transport Properties / Anita J. Hill ; T. J. Bastow ; R. M. Hodge20:
Free Volume and Transport Properties of Barrier and Membrane Polymers / B. D. Freeman21:
The Segmental Motion and Gas Permeability of Glassy Polymer Poly1-(trimethylsilyl-1-propyne) Membranes / T. Nakagawa ; T. Watanabe ; K. Nagai22:
Vacancy Spectroscopy of Polymers Using Positronium / Yasuo Ito23:
Subnanometer Hole Properties of Cellulose Studied by Positron Annihilation Lifetime Spectroscopy / H. Cao et al24:
Ionic Conductivity in Glassy PVOH-Lithium Salt Systems / M. Forsyth et al25:
Oxygen Transport through Electronically Conductive Polyanilines / Yong Soo Kang et al26:
Xenon-129 NMR as a Probe of Polymer Sorption Sites: a New View of Structure and Transport / J. M. Koons et al27:
Dissolution Mechanism of Glassy Polymers: a Molecular Analysis / B. Narasimhan ; N. A. Peppas28:
Gas Barrier and Thermal Properties of (Alkylsulfonyl)methyl-Substituted Poly(oxyalkylene) / Jong-Chan Lee ; Morton H. Litt ; Charles E. Rogers29:
Indexes
Author Index
Subject Index
Preface
The Structure and Properties of Glassy Polymers / t Anita J. Hill ; Martin R. Tant
An Overview
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