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Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA / John L. Sturtevant, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering, AZ Electronic Materials (USA), Rohm and Haas Electronic Materials (USA) ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering.

資料種別:
図書
出版情報:
Bellingham, Wash. : SPIE, c2005
形態:
2 v. (xliii, 1216 p.) ; 28 cm
シリーズ名:
Proceedings / SPIE -- the International Society for Optical Engineering ; v. 5753 <BA0022700X>
著者名:
Advances in resist technology and processing
Sturtevant, John L.
Society of Photo-optical Instrumentation Engineers <DA00848546>
AZ Electronic Materials (USA)
Rohm & Haas Company <DA11382827>
International SEMATECH
さらに 1 件
ISBN:
9780819457332 [0819457337] (pt. 1)
9780819457332 [0819457337] (pt. 2)
書誌ID:
BA85951627
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