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Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA / Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering

資料種別:
図書
出版情報:
Bellingham, Wash. : SPIE, c2005
形態:
xxxiii, 260 p. ; 28 cm
シリーズ名:
Proceedings / SPIE -- the International Society for Optical Engineering ; v. 5755 <BA0022700X>
著者名:
Data Analysis and Modeling for Process Control (Conference)
Emami, Iraj
Ausschnitt, Christopher P.
Tobin, Kenneth W.
Society of Photo-optical Instrumentation Engineers <DA00848546>
International SEMATECH
さらに 1 件
ISBN:
9780819457356 [0819457353]
書誌ID:
BA86005442
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