| 1.
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Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH Inc.
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| 2.
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図書
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Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH Inc.
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| 3.
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図書
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Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH Inc.
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| 4.
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Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering
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| 5.
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Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering
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| 6.
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図書
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6. Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan
Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan
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| 7.
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Brian J. Grenon, Giang T. Dao,chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering
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| 8.
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Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City
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| 9.
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9. Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan
Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering
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| 10.
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10. Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, Japan
Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering
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