Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA | 東京工業大学附属図書館蔵書検索

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Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA / Alexander Starikov, Kenneth W. Tobin, Jr., chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering

資料種別:

図書

出版情報:

Bellingham, Wash. : SPIE, c2002

形態:

xv, 628 p. ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 4692 <BA0022700X>

著者名:

ISBN:

9780819444394 [0819444391]

書誌ID:

BA86010726

子書誌情報

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書誌詳細

注記:	Includes bibliographical references and index
主題:	Integrated circuits--Defects--Analysis--Congresses; Integrated circuits--Design and construction--Congresses; Microelectronics industry--Quality control--Congresses; Quality control--Congresses; Semiconductor wafers--Defects--Analysis--Congresses; Semiconductors--Characterization--Congresses
言語:	英語

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