| 1.
図書 |
図書
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1. Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan
Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan
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| 2.
図書 |
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Elizabeth A. Dobisz, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
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