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1.

図書

図書
editors, M.T. Swihart, M.D. Allendorf, M. Meyyappan
出版情報: Pennington, N.J. : Electrochemical Society, c2001  ix, 508 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2001-13
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2.

図書

図書
editor, T.A. Ramanarayanan ; co-editors, W.L. Worrell, M. Mogensen
出版情報: Pennington, N.J. : Electrochemical Society, c2002  x, 428 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2001-28
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3.

図書

図書
editor, S.C. Singhal ; sponsoring division, High Temperature Materials
出版情報: Pennington, N.J. : Electrochemical Society, c2002  ix, 284 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-5
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4.

図書

図書
editors, Mark D. Allendorf, Michael L. Hitchman
出版情報: Pennington, N.J. : Electrochemical Society, c2000  xi, 810 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2000-13
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目次情報: 続きを見る
Fundamental Chemistry and Mechanisms
Atomistic Modeling of Chemical Vapor Deposition: NO on the Si (001) (2x1) Reconstructed Surface / N. Tanpipat ; J. Andzelm ; B. Delley ; A. Korkin ; A. Demkov
Simulation of Surface Diffusion of Silicon and Hydrogen on Single Crystal Silicon Surfaces / S. Somasi ; B. Khomami ; R. Lovett
Activation Energy Study for the Nucleation and Growth Stages of Cu(TMVS)(HFAC) Sourced Copper CVD / D. Yang ; J. Hong ; D. Richards ; T. Cale
Development of Gas Phase and Surface Kinetic Schemes for the MOCVD of CdTe, ZnS and ZnSe / C. Cavallotti ; V. Bertani ; M. Masi ; S. Carra
Determination of Energy Transfer Effects for Molecular Decomposition / W. Tsang ; V. Mokrushin
Gas-Phase Chemistry in the CVD of Silicon Carbide: Theoretical Study of the Reactions SiH[subscript 2]+CH[subscript 4], SiH[subscript 2]+C[subscript 2]H[subscript 4], and SiH[subscript 2]+C[subscript 2]H[subscript 2] / C. Raffy ; M.D. Allendorf ; E. Blanquet ; C.F. Melius
SiH[subscript 4] Reaction Mechanism Research Using a Fast Wafer-Rotating Reactor / Y. Sato ; N. T. Tamaoki ; T. Ohmine
Modeling Particle Nucleation during Thermal CVD of Silicon from Silane using Kinetic Monte Carlo Simulation / X. Li ; M. Swihart
Measurement of the Kinetics of the High Temperature Oxidation of TiCl[subscript 4] / R. Raghavan ; D. Lee ; D. Conrad ; P. Morrison, Jr.
Influence of Carbon Precursor on the Gas-Phase Chemistry of the Ti-C-Cl-H System / S. de Persis ; F. Teyssandier ; A. McDaniel
Molecular Beam Mass Spectrometry Studies of the Thermal Decomposition of Tetrakis(Dimethylamino)Titanium / C.C. Amato-Wierda ; E.T. Norton, Jr.
Kinetic and Mechanistic Studies of the Chemical Vapor Deposition of Ti-Si-N Thin Films with Ti(NMe[subscript 2])[subscript 4](TDMAT), NH[subscript 3], and Si H[subscript 4] / E.T. Norton ; C. Amato-Wierda
Evaluation of Gas Phase Reaction Rate Constant by Deposition Profile Analysis for In Situ Counter Diffusion CVD / Y. Egashira ; H. Tanaka ; T. Mina ; N. Mori ; K. Ueyama
Integration of a Quadrupole Mass Spectrometer and a Quartz Crystal Microbalance for In Situ Characterization of Atomic Layer Deposition Processes in Flow Type Reactors / A. Rahtu ; M. Ritala
Nanostructures and Quantum Dots
Nanostructures by CVD Assisted Methods Using Inorganic Precursors / P. Doppelt ; R. Even ; F. Marchi ; V. Bouchiat ; H. Dallaporta ; S. Safarov ; D. Tonneau ; P. Hoffmann ; F. Cicoira ; I. Utke ; B. Dwir ; K. Leifer ; E. Kapon
Effect of Carbon Predeposition Nucleation of Quantum Dots / Q. Zhao ; D. Greve
Plasma-Enhanced MOCVD of Smooth Nanometersized Metal/Silicon Single- and Multilayerfilms / F. Hamelmann ; G. Haindl ; A. Aschentrup ; A. Klipp ; U. Kleineberg ; P. Jutzi ; U. Heinzmann
Modeling, Reactor Design, and Process Control
Multicomponent Transport and Mixed Convection Flows in CVD Reactors / A. Ern
A Benchmark Solution for Multi-Dimensional Thermal CVD Modeling with Detailed Chemistry / C.R. Kleijn
On the Occurrence of Non-Symmetric Flows in Axisymmetric CVD Reactors / H. van Santen ; H.E.A. van den Akker
The Dynamics of Thin Film Growth: A Modeling Study / M. Gallivan ; R. Murray ; D. Goodwin
Improvement of Temperature Uniformity in Rapid Thermal CVD Systems Using Multivariable Control / F. van Bilsen ; R. De Keyser
Systematic Approach to Controlling Abnormal Structures Growth in CVD - Simulation of Nodule Structure Evolution
A Two-Dimensional Simulation Model for Oxy-Acetylene Flame CVD of Diamond Films / M. Okkerse ; C. Kleijn ; H. van den Akker ; M.H.J.M. de Croon ; G.B. Marin
Silicon Films Morphology Design Through Multiscale CVD Modeling
Numerical Simulation of Silicon Carbide Deposition in a Cold Wall CVD Reactor / G. Chaix ; A. Dolle t ; M. Matecki ; Y. Wang
Effect of Gas Phase Nucleation on Silicon Carbide Chemical Vapor Deposition / A.N. Vorob'ev ; A.E. Komissarov ; M.V. Bogdanov ; S. Yu. Karpov ; A.A. Lovtsus ; Yu.N. Makarov ; S.A. Lowry
CVD of SiC from CH[subscript 3]SiCl[subscript 3] in a Hot-Wall-Reactor System: Transport Pheonomena and Kinetic Aspects / V.K. Wunder ; N. Popovska ; H. Gerhard ; G. Emig ; P. Kaufmann ; L. Kadinski ; F. Durst
Modeling and System Design for Atmospheric Pressure CVD of YSZ / T. Besmann ; V. Varanasi ; T. Starr ; T. Anderson
A Stagnation-Flow MOCVD Reactor for Intelligent Deposition of YBCO Thin Films / A. Tripathi ; D. Boyd ; H. Atwater ; L. R. Raja ; R. J. Kee ; J. Musolf
Metalorganic Chemical Vapor Deposition
New Liquid Precursors for CVD of Metal-Containing Materials / R. Gordon
Novel MOCVD Process for the Low Temperature Deposition of the Chromium Nitride Phases / F. Maury ; D. Duminica ; F. Senocq
MOCVD of WN[subscript x] Thin Films Using Novel Imido Precursors / S. Johnston ; C. Ortiz ; O. Bchir ; Y. Zhang
Vapor Phase Epitaxy of Magnesium Oxide on Silicon Using Methylmagnesium Alkoxides / S.S. Lee ; S.Y. Lee ; C. Kim ; Y. Kim
Use of Ti(dpm)[subscript 2](Opr[superscript i])[subscript 2] Precursor to Obtain TiO[subscript 2] Film / V. Krisyuk ; A.E. Turgambaeva ; I.K. Igumenov ; V.G. Bessergenev ; I.V. Khmelinskii ; R.J.F. Pereira
Monitoring of MOCVD Fabrication of LaF[subscript 3] Films Using the Novel La(hfac)[subscript 3] - Diglyme Adducts and In Situ Synthesized La(hfac)[subscript 3] Anhydrous Precursor / G.G. Condorelli ; I.L. Fragala
Ceramics, Composites, and Hard Materials
Chemical Vapor Deposition of Aluminum on Silicon Carbide for the Investigation of the Interfacial Microstructure in Discontinuously Reinforced Aluminum / P. Oritz ; D. Oquab ; C. Vahlas ; I. Hall
Development of CVD Mullite Coatings / S.N. Basu ; V.K. Sarin
Evaluation of Various Hypotheses on the Influence of Nitrogen on Diamond Growth in an Oxy-Acetylene Torch Reactor
MOCVD of Aluminosilicate Corrosion Protection Coatings / S.M. Zemskova ; J.A. Haynes ; T.M. Besmann
Chemical Vapor Deposition of MoS[subscript 2] on and in TiN Coatings / H. Keune ; G. Wahl ; W. Lacom
Measurement of the Retarding Effect of HCl on the Rate of CVD of Titaniumdiboride / Ch.-Ho Yu ; E. Zimmermann ; D. Neuschutz
Factors Affecting the Amount of Carbon in Titanium Carbide Films Made by CVD / C. C. Amato-Wierda ; K. E. Versprille ; P. Ramsey
Characterization of Ti-W-C Thin Films Deposited by CVD / C.C Amato-Wierda ; H. X. Ji
MOCVD of Chromium Carbide from Bis-Ethyl-Benzene-Chromium / M. Satschko
Effect of H[subscript 2]S on the Microstructure and Deposition Characteristics of Chemically Vapor Deposited Al[subscript 2]O[subscript 3] / S. Ruppi ; A. Larsson
Cosmo-Mimetic Carbon Micro-Coils / D. Motojima ; X. Chen ; W. In-Hwang ; T. Kuzuya ; M. Kohda ; Y. Hishikawa
Morphology of Carbon Micro-coils Grown by Catalytic Decomposition of Hydrocarbons / W.-In Hwang ; S. Motojima
Silicon and Silicon Germanium Materials
Chemical Vapor Deposition of Low Trap Density SiGe Quantum Well Layers on Silicon / S. Kar ; P. Zaumseil
Loading Effects during Non-Selective Epitaxial Growth of Si and SiGe / J. Pejnefors ; S.-L. Zhang ; J.V. Grahn ; M. Ostling
Thermodynamic Analysis of Selective Epitaxial Growth of Silicon / W.-S. Cheong ; J.H. Joung ; J.W. Park ; D.J. Ahn
Nanocrystals Formation and Microstructure Evolution of Amorphous Si and Si[subscript 0].7Ge[subscript 0.3] by Using Low Pressure Chemical Vapor Deposition / T.-S. Yoon ; D.-H. Lee ; J.-Y Koon ; K.B. Kim
The Profile Control of n-type Doping in Low and High Temperature Si Epitaxy for High Frequency Bipolar Transistors / H.H. Radamson ; B. Mohadjeri ; B.G. Malm ; G. Landgren
CVD-Epitaxial Growth on Porous Si for ELTRAN SOI-Epi Wafers / N. Sato ; S. Ishii ; T. Yonehara
Dislocation Generation in Selective and Non Selective SiGe Epitaxy / C. Fellous ; F. Romagna ; D. Dutartre
MOSFET Evaluation of Ultraclean-CVD Si and SiGe Grown at 550[degree]C on SIMOX / K. Fujinaga
Global Model of Silicon Chemical Vapor Deposition in Centura Reactors / A.S. Segal ; A.V. Kondratyev ; A.O. Galyukov ; S.Yu. Karpov ; W. Siebert ; P. Storck ; S. Lowry
A Comparison of Commonalities and Differences of Silicon-Based Thin Films CVD Processes for ULSI Device Technologies / V. Vassiliev
Metals, Metallization, and Diffusion Barriers
Selective Nucleation and Area Selective OMCVD of Gold on Patterned Self-Assembled Organic Monolayers: A Comparison of OMCVD and PVD / R.A. Fischer ; C. Winter ; U. Weckenmann ; J. Klashammer ; V. Scheumann ; S. Mittler
Surface Analysis of Al Film Prepared from Dimethyl-Aluminum-Hydride / M. Sugiyama ; H. Ogawa ; H. Itoh ; J. Aoyama ; Y. Horiike ; H. Komiyama ; Y. Shimogaki
Chemical Vapor Deposition of Titanium Nitride and Titanium Silicon Nitride Thin Films from Tetrakis-(dimethylamido) Titanium and Hydrazine as a Co-Reactant / D.A. Wierda
Chemical Vapor Deposition of Copper Using hfacCu[superscript (1)]DMB(3,3-dimethyl-1-butene) Liquid Precursor / K.- K. Choi ; S.-W. Rhee
Reaction of Bis-(2,4-Pentanedionato) M(II) (M= Ni, Cu) Under Low Pressure CVD Conditions / C.R. Vestal ; H.M. Sturgill ; T.C. DeVore
Metalorganic Chemical Vapor Deposition of Nickel Films: Investigation of a New Precursor, [Ni(tmen)([mu]-tfa) subscript 2]([mu]H[subscript 2]O) / J.-K. Kuang ; A. Gleizes
Platinum Thin Films Obtained via MOCVD on Quartz and CaF[subscript 2] Windows as Electrode Surfaces for In Situ Spectroelectrochemistry / S. Santi ; G. Carta ; S. Garon ; L. Rizzo ; G. Rossetto ; P. Zanella ; D. Barreca ; E. Tondello
Surface Adsorption of WF[subscript 6] on Si and SiO[subscript 2] in Selective W-CVD / Y. Yamamoto ; T. Matsuura ; J. Murota
CVD Tungsten Via Void Minimization for Sub 0.25 [mu]m Technology / A.M. Haider ; D.J. Rose ; J.R.D. Debord ; S.P. Zuhoski
Three-Dimensional Computer Simulation of WSi[subscript x] CVD VLSI Processing-Effect of Outlet Position / K. Sugawara ; M. Kunishige ; T. Muranushi ; Y.K. Chae
Processing of Tungsten Single Crystals by Chemical Vapor Deposition / R. Zee ; Z. Xiao ; H.S. Gale ; B.A. Chin ; L.L. Begg
Simplified CMP Planarization Process Module for Shallow Trench Isolation Applications / K. Kapkin ; M. Mogaard ; T. Curtis ; J. deRuiter
Dielectric Materials
Reactor Scale Simulation of Metal Oxide Deposition from an Inorganic Precursor / J.V. Cole ; A. Nangia ; T. Mihopoulas ; R. Hegde
Atomic Layer Deposition of High-k Oxides / K. Kukli ; M. Vehkamaki ; T. Hanninen ; T. Hatanpaa ; P.I. Raisanen ; M. Leskela
Quality Improvement of SiO[subscript 2]-Films by Adding Foreign Gases in Photo-Chemical Vapor Deposition / Y. Motoyama ; J.-i. Miyano ; T. Yokoyama ; K. Toshikawa ; T. Mori ; H. Mutou ; K. Kurosawa ; A. Yokotani ; W. Sasaki
SiO[subscript 2] Deposition Mechanism in Photo-Chemical Vapor Deposition Using Vacuum Ultraviolet Excimer Lamp / J. Miyano
Kinetic Growth of Al[subscript 2]O[subscript 3] Thin Films Using Aluminium Dimethylisopropoxide as Precursor / G. A. Battison ; R. Gerbasi
Atomic Layer Deposition of Metal Oxide Films by using Metal Alkoxides as an Oxygen Source
Optimization of LPCVD Nitride Deposition Conditions for Non-Volatile Memory Inter Poly Dielectric Applications / M.J. Teepen ; M.A.A.M. van Wijck ; H. Sprey
Ultra Thin TiO[subscript 2] Films Deposited by Atomic Layer Chemical Vapor Deposition / M. Schuisky ; A. Aidla ; J. Aarik ; M. Ludvigsson ; A. Harsta
Characterization of Ta[subscript 2]O[subscript 5] Films Prepared by ALCVD / K. Forsgren ; J. Sundqvist
In-Situ Preparation of Ti-Containing Ta[subscript 2]O[subscript 5] Films by Halide CVD
CVD of Zr-Sn-Ti-O for Capacitor Applications / Y. Senzaki ; G. Alers ; A. Hochberg ; D. Roberts ; J. Norman ; R. Fleming ; H. Krautter
Gallium Nitride and Other III-V Materials
Investigations of Chemical Vapor Deposition of GaN Using Synchrotron Radiation / C. Thompson ; G.B. Stephenson ; J.A. Eastman ; A. Munkholm ; O. Auciello ; M.V. Ramana Murty ; P. Fini ; S.P. DenBaars ; J.S. Speck
Reaction-Transport Models of the Metalorganic Vapor Phase Epitaxy of Gallium Nitride / R.P. Pawlowski ; C. Theodoropoulos ; A.G. Salinger ; H.K. Moffat ; T.J. Mountziaris ; J.N. Shadid ; E.J. Thrush
Growth of Hexagonal GaN Films by MOCVD Using Novel Single Precursors / C.G. Kim ; S.H. Yoo ; J.H. Lee ; Y.K. Lee ; M.M. Sung
In Situ Measurement of the Decomposition on GaN OMVPE Precursors by Raman Spectroscopy / C. Park ; S. Lee ; J. Seo ; M. Huang ; T.J. Anderson
Growth Kinetics and Mechanistic Studies of GaN Thin Films Grown by OMVPE Using (N[subscript 3])[subscript 2]Ga[(CH[subscript 2])[subscript 3]NMe subscript 2] as Single Source Precursor / A. Wohlfart ; A. Devi ; W. Rogge ; J. Schafer ; J. Wolfrum
Experimental and Numerical Study of InGaAsP Materials Growth Kinetics and Composition / O. Feron ; Y. Nakano
Ruthenium Doped Indium Phosphide Growth by Low Pressure Hydride Vapor Phase Epitaxy / D. Soderstrom ; S. Lourdudoss ; M. Wallnas ; A. Dadgar ; O. Stenzel ; D. Bimberg ; H. Schumann
Quasi-Thermodynamic Models of Surface Chemistry: Application to MOVPE of III-V Ternary Compounds / E.V. Yakovlev ; R.A. Talalaev ; Yu.A. Shopolyanskiy ; Y.N. Makarov
Electronic, Optical, and Magnetic Materials
Chemical Vapor Deposition and Magnetoresistance of Granular Cu-Co Films / I.S. Chuprakov ; K.-H. Dahmen
Diagnostics of Metalorganic Chemical Vapor Deposition of (Ba, Sr)TiO[subscript 3] Films by Microdischarge Optical Emission Spectroscopy / S. Momose ; T. Nakamura ; K. Tachibana
Bismuth Titanate Thin Films Deposited by Halide Chemical Vapor Deposition / S. Khartsev ; A. Grishin
LPCVD of Optical Interference Coatings for Micro-Optical Applications / M. George ; D.Z. Rogers
Evaluation of Precursors for the Chemical Vapour Deposition of Tin Oxide / A.M.B. van Mol ; G.R. Alcott ; C.I.M.A. Spee ; J.C. Schouten
Characteristics of Silicon Oxy-Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition / C. Simionescu ; F. Bounasri ; S.G. Wallace ; H.K. Haugen ; J.A. Davies ; P. Mascher
CVD of Molecule-based Conductors and Magnets / L. Valade ; D. deCaro ; H. Casellas ; M. Basso-Bert ; C. Faulmann ; J.-P. Legros ; P. Cassoux ; L. Aries
Stability of RuO[subscript 2] Bottom Electrode and Its Effect on the Ba-Sr-Ti Oxide Film Quality / Y.-J. Oh ; S.H. Moon ; C.-H. Chung
Multilayers for the Growth of HTc Superconducting Tape: A Full MOCVD Approach / R. Lo Nigro ; G. Malandrino
Fundamental Chemistry and Mechanisms
Atomistic Modeling of Chemical Vapor Deposition: NO on the Si (001) (2x1) Reconstructed Surface / N. Tanpipat ; J. Andzelm ; B. Delley ; A. Korkin ; A. Demkov
Simulation of Surface Diffusion of Silicon and Hydrogen on Single Crystal Silicon Surfaces / S. Somasi ; B. Khomami ; R. Lovett
5.

図書

図書
editors, E.D. Wachsman ... [et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c2001  x, 530 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2000-32
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目次情報: 続きを見る
Cation Transport in Solids
Lithium Ion Polymer Batteries / B. Scrosati
Negative Electrode Strategies for Lithium Systems / R. Huggins
Relationship between Structure and Electrochemistry in Disordered LiCoO[subscript 2] Cathode Materials / C. Julien
Nano-Dispersed Li-Storage Alloys as Anode Materials for Li-Ion-Cells / J. Besenhard ; M. Wachtler ; M. Wagner ; M. Winter
Electrochromism by Polarisation of Ionic and Mixed Conducting Solids / W. Chu ; A. Foteinopoulou ; M. Klingler ; S. Stramare ; K. Thoma ; W. Weppner
Frequency Dispersion of the Ionic Conductivity of RbAg[subscript 4]I[subscript 5] at Low Temperatures / E. Buchareski ; R. Potzschke ; W. Lorenz ; W. Wiesbeck ; G. Staikov
Distribution of Activation Energies Treatment of Fast Ion Motions in Glass / S. Martin ; F. Borsa ; I. Svare
Preliminary Investigations on the Influence of a Glassy Phase on Ionic Conduction of Beta-Alumina / J. Tulliani ; L. Dessemond ; L. Montanaro ; P. Fabry
On Electrochemical Decomposition of the Solid Electrolyte RbCu[subscript 4]CI[subscript 3]I[subscript 2] / G. Ostapenko
Kinetics of Electrode Process at C/RbCu[subscript 4]CI[subscript 3]I[subscript 2] Interface
Proton Transport in Solids
Ionic Devices Using Proton Conducting Ceramics / H. Iwahara
Ionic Conduction in Sintered Barium Carbonate at High Temperature / N. Oishi
Synthesis and Characterization of Two-Phase Mixed Ionic Electronic Conducting Membranes for Hydrogen Separation / B. Krishnamurty ; K. Choi ; E. Wachsman
Protonic-Electronic Conducting Barium Cerate Membranes for Hydrogen Separation / J. Rhodes
A New Nanocomposite Model for Hydrous RuO[subscript 2] / K. Swider-Lyons ; K. Bussmann ; D. Griscom ; C. Love ; D. Rolison ; W. Dmowski ; T. Egami
Anion Transport in Solids
Impedance Studies of Oxygen Exchange on a Highly Oriented Thin Film Electrode of La[subscript 0.5]Sr[subscript 0.5]CoO[subscript 3-[delta] / Y. Yang ; C. Chen ; G. Luo ; D. Ross ; C. Chu ; A. Jacobson
Transport and Permeation Properties of La[subscript 2]NiO[subscript 4+[delta] / R. Tichy ; K. Huang ; J. Goodenough
A Computational Investigation of Migration Enthalpies and Electronic Structure in SrFeO[subscript 3-[delta] / A. Predith ; G. Ceder
Mixed Conductivity in Nanocrystalline Undoped and Doped Cerium Oxide / T. Suzuki ; I. Kosacki ; H. Anderson
Synthesis of Ion Conducting Solids
From Molecules to Ceramics: Can We Monitor the Process? / S. Licoccia ; M. Di Vona
Synthesis and Characterization of Novel Ionoconductor Gels for Biomedical Applications in Space / P. Romagnoli ; L. Narici ; W. Sannita ; E. Traversa
Preparation of Y[subscript 2]O[subscript 3]ZrO[subscript 3] Nanoparticles by Gas-Phase Reaction and Wet Doping / B. Xia ; Y. Xie ; K. Okuyama
Solid State Fuel Cells
Increasing Power Density of Solid Oxide Fuel Cells Based on Thick-Film LSGM Electrolyte / J. Wan
The Influence of Electrode Configuration on the Performance of Electrode-Supported Solid Oxide Fuel Cells / B. Chung ; A. Pham ; J. Haslam ; R. Glass
Anode Microstructure Optimization for Solid Oxide Fuel Cells
Natural-Gas-Assisted Steam Electrolyzer for Distributed Hydrogen Production / H. Wallman
Solid State Sensors-Multicomponent Response
Sensing of Multicomponent Gases by Advanced Potentiometric and Kinetic Principles / E. Tsagarakis ; T. Metzing
Study of the Response of O[subscript 2] Sensors Based on ZrO[subscript 2]
Selective Detection of NO[subscript x] by Differential Electrode Equilibria / P. Jayaweera
Modeling the Response of Mixed Potential Electrochemical Sensors / F. Garzon ; R. Mukundan ; E. Brosha
Zironia-Based Mixed Potential CO/HC Sensors with LaMnO[subscript 3] and Tb-Doped YSZ Electrodes / D. Brown ; J. Visser ; D. Thompson ; D. Schonberg ; E. Logothetis
Hydrocarbon Sensors for Exhaust Gas Monitoring / S. Ejakov
Solid State Sensors-Alkaline Electrolyte/Electrode
Solid-State CO[subscript 2] Sensor with Lithium Ion Conductor and Li-Transition Metal Complex Oxide as Solid Reference Electrode / Y. Zhang ; M. Kaneko ; K. Uchida ; J. Mizusaki ; H. Tagawa
Determination of the Hole Conductivity of Sodium-Beta-Alumina by Potentiometric Measurements / H. Nafe ; S. Gollhofer ; F. Aldinger
Experimental Observations of a Thoria Oxygen Sensor in a Molten Salt System / S. Li ; S. Herrmann ; G. Knighton
Solid Electrolyte Sensors for NO[subscript 2] Detection Without Using a Reference Atmosphere / M. Grilli ; E. Di Bartolomeo ; H. Aono ; Y. Sadaoka ; E. Billi
Two Case Studies of Thick Film Sensing Devices: Some Critical Steps in the Processing of Screen Printed Sensors
Development of a Screen-Printed Planar Sensor for Environmental Monitoring / N. Kaabbuathong
Solid State Sensors-Nano to Meso Electrode Structures
Automotive Pollution Monitoring by an Array of Thick Film Gas Sensors from Nanosized Semiconducting Oxides / M. Carotta ; L. Crema ; G. Martinelli
Investigations Into Catalytic Properties of Nanostructured Surfaces Using In-Situ Drifts / X. Lu ; P. Faguy ; C. Xia ; M. Liu
Fabrication of a Highly Selective Sensor Using a Zeolite Semi-Permeable Membrane / W. Rauch ; G. Hunter
Mesoporous SnO[subscript 2] for CO[subscript 2] Sensors / F. Chen
NO[subscript x] Sensors Based on Interfacing Nano-Sized LaFeO[subscript 3] Perovskite-Type Oxide and Ionic Conductors / J. Yoon
Solid State Sensors-Novel
Field Effect Transistor Type Gas Sensor Coated with NaNO[subscript 2] for NO[subscript 2] Detection / K. Shimanoe ; S. Nakata ; N. Miura ; N. Yamazoe
Metal Oxide Stabilized Palladium Sensor for Hydrogen Detection / P. Liu ; S. Lee ; C. Tracy ; J. Pitts ; R. Smith
Solid State Sensors-Semiconducting
Solid State Chemical Sensors for CO / A. Azad
Surface Characterization of La[subscript 2]CuO[subscript 4]-CuO Composite Treated with H[subscript 2]S at PPM Level
Temperature Independent Resistance Response for Mixed Conducting SrFe[subscript y]Co[subscript z]O[subscript x] Thin Films / J. Tunney ; M. Post ; X. Du ; D. Yang
Gas Sensing Properties of Titanium Doped MoO[subscript 3] Thin Films Deposited by Reactive Sputtering / E. Comini ; G. Sberveglieri ; L. Casarotto ; M. Ferroni ; V. Guidi
Ti-W-O and Mo-W-O Thin Films Deposited by Reactive Sputtering as Gas Sensors / G. Benussi
Role of Transition Metal Oxides in the Development of Voltage Sensing Characteristics in Zinc Oxide Ceramics / A. Banerjee ; G. Banerjee ; T. Ramamohon ; M. Patni
Non-Ohmic Current-Voltage and Impedance Characteristics of Electroadsorptive Zn[subscript 2]SnO[subscript 4] / J. Yu ; G. Choi
Cation Transport in Solids
Lithium Ion Polymer Batteries / B. Scrosati
Negative Electrode Strategies for Lithium Systems / R. Huggins
6.

図書

図書
editors, P.C. Trulove ... [et al.]
出版情報: Pennington, N.J. : The Electrochemical Society, c2000  xiv, 758 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 99-41
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7.

図書

図書
editors, K.B. Sundaram ... [et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c2001  x, 286 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2001-7
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目次情報: 続きを見る
Preface
Organizers
Oxide Wear-Out, Reliability, Stress and Interfaces / I:
A Review of Oxide Wearout, Breakdown, and Reliability / D. Dumin
Surface And Interface Study Of Ion Beam Deposited Silicon oxide Thin films / Heinz D. Wazenboeck ; Emmerich Bertagnolli ; Bernhard Basnar ; Juergen Smoliner ; Martin Gritsch ; Herbert Hutter ; Josef Brenner ; C. Tomastik ; Herbert Storri
Study of Inversion Layer Hole Mobility In p-Mosfet During High-field Stressing / R. Jarawal ; D. Misra
Two Limiting Thinnesses Of The Ultrathin Gate Oxide / Samares Kar
SiO[subscript 2] Stress and Interfaces / II:
The Connection Between oxide leakage currents and Si/SiO[subscript 2] Interface Trap Generation / P. M. Lenahan
Charging Damage During Plasma Enhanced Dielectric Deposition / K. Cheung
Kinetics and Mechanisms of Organic Contaminant Interactions at Silicon Surfaces in High Temperature Processes / N. Rana ; P. Raghu ; F. Shadman
SiO[subscript 2] Films and Properties / III:
Remote Plasma Deposited Gate Dielectrics on Si and SiGe Mosfets / T. Ngai ; R. Sharma ; J. Fretwell ; X. Chen ; J. Chen ; W. Brookover ; S. Banerjee
Rapid Thermal Processes of High Permittivity Films on Silicon for ULSI Gate Dielectrics Applications / S. P. Tay ; R. Sharangpani ; Y. Z. Hu
Processing of Thick Thermal Gate Oxides in Trenchs / C. T. Wu ; R. Ridley ; G. Dolny ; T. Grebs ; J. Hao ; S. Suliman ; B. Venkataraman ; O. Awadelkarim ; R. Williams ; P. Roman ; J. Ruzyllo
Electrical Properties of SiO[subscript 2]-Films Prepared by VUV Chemical Vapor Deposition / Y. Motoyama ; J. Miyano ; K. Tosikawa ; Y. Yagi ; K. Kurosawa ; A. Yokotani ; W. Sasaki
SiO[subscript 2] Film Deposition on Different Substrate Materials by Photo- CVD Using Vacuum Ultraviolet Radiation / K. Toshikawa
Silicon Nitrides/ Oxynitrides / IV:
Low Energy Ion Irradiation of Silicon: Compound Formation and Segregation of Impurities / M. Petravic ; J. S. Williams ; P. N. K. Deenapanray
Characteristics of Silicon Oxynitrides Made By ECR Plasmas / J. A. Diniz ; P. J. Tatsch ; J. Swart
Radiation Hardening of Oxynitrides Formed By Low Nitrogen Implantation into Silicon Prior to Oxidation / J. Godoy Fo
Silicon Nitrides/ Oxynitrides II / V:
Material and Process Considerations of Ultra thin Silicon (Oxy) Nitride Films Grown on Silicon and SiO[subscript 2] Surfaces / C. P. D'Emic ; E. P. Gusev ; K. K. Chan ; T. Zabel ; M. Copel ; R. Murphy ; P. Kozolowski ; J. Newbury
Silicon OxyNitride: A Versatile Material for Integrated Optics Application / K. Worhoff ; A. Driessen ; P. V. Lambeck
Characterization of Silicon Oxynitride Thin Films Deposited By ECR-PECVD / C. Simionescu ; J. Wojcik ; H. K. Haugen ; J. A. Davies ; P. Mascher
Silicon Nitrides/ Oxynitrides III / VI:
Characterization of Low- Temperature Magnetoplasma- Grown Si Oxynitride and Si Oxide / H. Ikoma
Advances in Single Wafer Chemical Deposition of Oxide and Nitride films / W. Palmer ; Z. Gabric
High Integrity Direct Oxidation/Nitridation at Low Temperatures Using Radicals / T. Ohmi ; S. Sugawa ; M. Hirayama
Silicon Nitride
Thermally Induced Stress Changes in High Density Plasma Deposited Silicon Nitride Films / R. E. Shah ; H. Baumann ; D. Serries ; M. Mikulla ; R. Keiffer
Effect of Oxygen in Deposited Ultra Thin Silicon Nitride Film on Electrical Properties / K. Muraoka ; K. Kurihara
Influence of Low- energy argon Ion Bombardment and Vacuum Annealing on the Silicon Nitride Surface Properties / I. P. Petrenko ; V. A. Gritsenko ; L. M. Logvinsky ; H. Wong
Authors Index
Subject Index
Preface
Organizers
Oxide Wear-Out, Reliability, Stress and Interfaces / I:
8.

図書

図書
editors, Evgeni P. Gusev ... [et al.] ; sponsoring divisions, Electronics, Dielectric Science and Technology, and High Temperature Materials
出版情報: Pennington, NJ : Electrochemical Society, c2005  xv, 634 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2005-05
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9.

図書

図書
editors, S. C. Singhal, J. Mizusaki ; sponsoring divisions, High Temperature Materials, Battery, and Energy Technology
出版情報: Pennington, NJ : Electrochemical Society, c2005  2 v. (xxix, 1992 p.) ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2005-07
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目次情報:
v. 1. Cells, stacks, and systems
v. 2. Materials
v. 1. Cells, stacks, and systems
v. 2. Materials
10.

図書

図書
editors, Anjana Devi ... [et al.] ; sponsoring divisions, High Temperature Materials, Dielectric Science and Technology, and Electronics and Photonics
出版情報: Pennington, NJ : Electrochemical Society, c2005  xviii, 1106 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2005-09
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