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1.

図書

図書
edited by Yanchun Zhang, Amjad Umar, Ee-Peng Lim, and Ming-Chien Shan ; sponsored by IEEE Computer Society
出版情報: Los Alamitos, Calif. : IEEE Computer Society, c2002  xi, 175 p. ; 28 cm
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目次情報: 続きを見る
Preface
Message from the General Chair
Organizing Committee
Program Committee
Additional Reviewers
Keynote Speakers
E-Business Solution and Technologies / Umeshar Dayal
The Curious Road to E(veryday)-Business / Michael Brodie
ebXML: Status, Research Issues, and Obstacles / Birgit Hofreiter ; Christian Huemer ; Wolfgang Klas
Catalog Management / Session 1:
Adaptive Evaluation Techniques for Querying XML-Based E-Catalogs / G. Lausen ; P. J. Marron
Catalog Integration for Electronic Commerce through Category-Hierarchy Merging Technique / D. Kim ; J. Kim ; S. Lee
Enhancive Index for Structured Document Retrieval / X.-L. Wang ; J.-R. Wen ; W.-Y. Liu ; Y.-S. Dong
Data Management / Session 2:
Extensible Data Management in the Middle-Tier / B. F. Cooper ; N. Sample ; M. J. Franklin ; J. Olshansky ; M. Shadmon ; L. Cohen
TranSquid: Transcoding and Caching Proxy for Heterogenous E-Commerce Environments / A. Maheshwari ; A. Sharma ; K. Ramamritham ; P. Shenoy
Efficiently Maintaining Stock Portfolios Up-to-Date on the Web / M. Bhide
B2B and Agents / Session 3:
Modeling and Executing Semantic B2B Integration / C. Bussler
An Architecture for Assembling Agents that Participate in Alternative Heterogeneous Auctions / M. Dumas ; G. Governatori ; A. ter Hofstede ; N. Russell
An Agent-Based System for Trading Partner Management in B2B E-Commerce / C. McGregor ; S. Kumaran
Workflow and Transaction Management / Session 4:
A Framework for Dynamic Workflow Interoperation Using Multi-Subprocess Task / M. Kwak ; D. Han ; J. Shim
Efficient Processing of Wireless Read-Only Transactions in Data Broadcast / M. Kitsuregawa ; C.-S. Hwang
Downloadable Service Contracts for Disconnected Transactions / S. Choudhury ; A. Dan
E-Services / Session 5:
Tackling the Challenges of Service Composition in E-Marketplaces / J. Yang ; M. P. Papazoglou ; W.-J. van den Heuvel
A Scheme for Integrating E-Services in Establishing Virtual Enterprises / A. Berfield ; P. K. Chrysanthis ; I. Tsamardinos ; M. E. Pollack ; S. Banerjee
Experiences and Issues in the Realization of E-Government Services / F. Arcieri ; G. Melideo ; E. Nardelli ; M. Talamo
Privacy, Security, and Web Mining / Session 6:
Privacy Preserving Association Rule Mining / Y. Saygin ; V. S. Verykios ; A. K. Elmagarmid
Building a Consumer Scalable Anonymity Payment Protocol for Internet Purchases / H. Wang ; J. Cao ; Y. Kambayashi
Real Time Web Usage Mining with a Distributed Navigation Analysis / F. Masseglia ; M. Teisseire ; P. Poncelet
Author Index
Preface
Message from the General Chair
Organizing Committee
2.

図書

図書
edited by Béla S. Buslig and John A. Manthey
出版情報: New York : Kluwer Academic/Plenum Publishers, c2002  viii, 209 p., [1] leaf of plates ; 26 cm
シリーズ名: Advances in experimental medicine and biology ; v. 505
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3.

図書

図書
editors, S.A. Campbell ... [et al.]
出版情報: Warrendale, PA : Materials Research Society, c2002  1 v. (various pagings) ; 24 cm
シリーズ名: Materials Research Society symposium proceedings ; v. 670
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目次情報: 続きを見る
Preface
Materials Research Society Symposium proceedings
High-k Materials
Materials and Physical Properties of Novel High-k and Medium-k Gate Dielectrics / Ran Liu ; Stefan Zollner ; Peter Fejes ; Rich Gregory ; Shifeng Lu ; Kim Reid ; David Gilmer ; Bich-Yen Nguyen ; Zhiyi Yu ; Ravi Droopad ; Jay Curless ; Alex Demkov ; Jeff Finder ; Kurt Eisenbeiser
Ultra-Thin Zirconium Oxide Films Deposited by Rapid Thermal Chemical Vapor Deposition (RT-CVD) as Alternative Gate Dielectric / Jane P. Chang ; You-Sheng Lin
Processing of High-k Gate Dielectrics
Challenges in Integrating the High-k Gate Dielectric Film to the Conventional CMOS Process Flow / Avinash Agarwal ; Michael Freiler ; Pat Lysaght ; Loyd Perrymore ; Renate Bergmann ; Chris Sparks ; Bill Bowers ; Joel Barnett ; Deborah Riley ; Yudong Kim ; Billy Nguyen ; Gennadi Bersuker ; Eric Shero ; Jae E. Lim ; Steven Lin ; Jerry Chen ; Robert W. Murto ; Howard R. Huff
Engineered Tantalum Aluminate and Hafnium Aluminate ALD Films for Ultrathin Dielectric Films With Improved Electrical and Thermal Properties / Robert B. Clark-Phelps ; Anuranjan Srivastava ; Lance Cleveland ; Thomas E. Seidel ; Ofer Sneh
High Permittivity Oxide Gate Stacks on Silicon Incorporating UHV Silicon Nitride Interfacial Layers / Mark A. Shriver ; Ann M. Gabrys ; T.K. Higman ; S.A. Campbell
Alternating Layer Chemical Vapor Deposition (ALD) of Metal Silicates and Oxides for Gate Insulators / Roy G. Gordon ; Jill Becker ; Dennis Hausmann ; Seigi Suh
Characterization of TiO[subscript 2] Films Grown at Low Temperatures for Alternative Gate Dielectric Application / Jun-Ying Zhang ; Ian W. Boyd
Gate Stack and Silicide Issues In Si Processing II
Promising Gate Stacks With Ru and RuO[subscript 2] Gate Electrodes and Y-Silicate Dielectrics / Huicai Zhong ; Greg Heuss ; You-Seok Suh ; Shin-Nam Hong ; Veena Misra ; Jason Kelly ; Gregory Parsons
Preliminary First Principles Study of Hf and Zr Aluminates as Replacement High-k Dielectrics / Michael Haverty ; Atsushi Kawamoto ; Gyuchang Jun ; Kyeongjae Cho ; Robert Dutton
Development of Polycide Application and Control of Process Conditions on DCS Based WSi[subscript x] / Young-Kyou Park ; Jaihyung Won ; Ju-Hwan Park ; Jung-Ho Park
Effect of Pre-Cooling Treatment on the Formation of C54 Phase Titanium Silicide / Lin Zhang ; Yong Keun Lee
Electrical Performance of Novel Gate Dielectrics
Chemical Vapor Deposition of Titania/Silica and Zirconia Films / Wayne L. Gladfelter ; Ryan C. Smith ; David Burleson ; Charles J. Taylor ; Jeffrey T. Roberts ; Stephen A. Campbell ; Noel Hoilien ; Mike Tiner ; Rama Hegde ; Christopher Hobbs
Transistors Built With ZrO[subscript 2] and HfO[subscript 2] Deposited From Nitratos / Tiezhong Ma ; Fang Chen ; Ryan Smith ; Wayne Gladfelter
Electrical Characteristics of TaO[subscript x]N[subscript y]/ZrSi[subscript x]O[subscript y] Stack Gate Dielectric for MOS Device Applications / Hyungsuk Jung ; Hyundoek Yang ; Kiju Im ; Hyunsang Hwang
Electrical and Structural Characteristics of Ultra-Thin TiO[subscript 2]/Ti-Si-O Stacked Gate Insulator Formed by RF Sputtering Technique / M. Koyama ; A. Kaneko ; M. Koike ; I. Fujiwara ; M. Yabuki ; M. Yoshiki ; A. Nishiyama
Investigation on the Thermal and Electrical Properties of Ti-Si-O Film Formed by the Composite Sputtering Deposition / Akira Nishiyama ; Akio Kaneko ; Masato Koyama ; Yoshiki Kamata ; Ikuo Fujiwara ; Masahiro Koike ; Masahiko Yoshiki ; Mitsuo Koike
Comparison of Conductance and Capacitance Techniques for Measurement of Interface States in Thin Oxides
Novel Gate Structures
Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion / Igor Polishchuk ; Pushkar Ranade ; Tsu-Jae King ; Chenming Hu
Molybdenum Gate Electrode Technology for Deep Sub-Micron CMOS Generations / Ronald Lin ; Qiang Lu ; Yee-Chia Yeo ; Hideki Takeuchi
Reduction of Whisker-Originated Short Between W Polymetal and Contact Plug / Yasushi Akasaka ; Hiroshi Suzuki ; Yuji Yokoyama ; Nobuaki Yasutake ; Hitomi Yasutake ; Susumu Yoshikawa ; Yusuke Kohyama ; Yoshio Ozawa ; Katsuhiko Hieda ; Kyoichi Suguro ; Toshihiro Nakanishi
Annealing Behavior of WSi[subscript x] Films Prepared by CVD / M. Katiyar ; G.S. Samal ; R.K. Gupta ; Deepak ; P.K. Sahoo ; V.N. Kulkarni ; O. Adetutu
The Electrical Characteristics of the MOSCAP Structures With W/WN[subscript x]/poly Si[subscript 1-X]Ge[subscript X] Gates Stack / S.-K. Kang ; J.J. Kim ; D.-H. Ko ; T.H. Ahn ; I.S. Yeo ; T.W. Lee ; Y.H. Lee
A Study on the Polycrystalline Silicon Germanium Gate Electrode Fabrication Technology for Cobalt Silicide Process / Hidekazu Sato ; Takae Sukegawa ; Toshifumi Mori ; Kousuke Suzuki ; Haruhisa Mori
X-ray Techniques for Silicides / Douglas J. Tweet ; Jer-shen Maa ; Sheng Teng Hsu
Effects of a Ta Interlayer on the Titanium Silicide Reaction: C40 Formation and Higher Scalability of the TiSi[subscript 2] Process / F. La Via ; S. Privitera ; F. Mammoliti ; M.G. Grimaldi
Direct Formation of C54 Phase on the Basis of C40 TiSi[subscript 2] and Its Applications in Deep Sub-Micron Technology / S.Y. Chen ; Z.X. Shen ; S.Y. Xu ; A.K. See ; L.H. Chan ; W.S. Li
Increased Thermal Stability of Co-Silicide Using Co-Ta Alloy Films / Min-Joo Kim ; Hyo-Jick Choi ; Dae-Hong Ko ; Ja-Hum Ku ; Siyoung Choi ; Kazuyuki Fujihara ; Ho-Kyu Kang ; Hoo-Jeung Lee
A Comparative Study of Nickel Silicide Formation Using a Titanium Cap Layer and a Titanium Interlayer / W.L. Tan ; K.L. Pey ; Simon Y.M. Chooi ; J.H. Ye
The Influence of Ti and TiN on the Thermal Stability of CoSi[subscript 2] / C. Detavernier ; Guo-Ping Ru ; R.L. Van Meirhaeghe ; K. Maex
Stability Improvement of Nickel Silicide With Co Interlayer on Si, Polysilicon and SiGe / Jer-Shen Maa ; Yoshi Ono ; Lisa Stecker
Silicide Formation for Ni and Pd Bilayers on Si(100) Substrates / Xin-Ping Qu ; F. Cardon
Shallow Junctions and Integration Issues in Feol
Electrical Performance and Scalability of Ni-Monosilicide Towards sub 0.13 [mu]m Technologies / Anne Lauwers ; Muriel de Potter ; Richard Lindsay ; An Steegen ; Nico Roelandts ; Fred Loosen ; Christa Vrancken ; Karen Maex
A Study on Solid Phase Reactions of Ni and Pt on Si-Ge Alloys as Contacts to Ultra-Shallow P[superscript +]N Junctions for CMOS Technology Nodes Beyond 70 nm / Jing Liu ; Hongxiang Mo ; Mehmet C. Ozturk
CoSi[subscript 2] Formation Using a Ti Capping Layer--The Influence of Processing Conditions on CoSi[subscript 2] Nucleation
Thin-Film-Edge-Induced Stresses in Substrates / S.P. Wong ; H.J. Peng ; Shounan Zhao
Detecting Impurities in the Ultra Thin Silicon Oxide Layer by Hg-Schottky Capacitance-Voltage (CV) Method / D. Liu ; Q. Wang ; H. Paravi ; V. Drobny ; J. Moquin
Electrical and Structural Properties of Catalytic-Nitrided SiO[subscript 2] Films / Akira Izumi ; Hideki Matsumura
Atomic Scale Nitridation of Silicon Oxide Surfaces by Remote-Plasma-Excited Nitrogen / Yoji Saito ; Koichi Tokuda
Author Index
Subject Index
Preface
Materials Research Society Symposium proceedings
High-k Materials
4.

図書

図書
editors, Horst W. Hahn ... [et al.]
出版情報: Warrendale, Pa. : Materials Research Society, c2002  1 v. ; 24 cm
シリーズ名: Materials Research Society symposium proceedings ; v. 676
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5.

図書

図書
chairs/editors, Terril Hurst, Seiji Kobayashi
出版情報: Bellingham, Wash. : SPIE, c2002  xiii, 612 p. ; 28 cm
シリーズ名: Proceedings / SPIE -- the International Society for Optical Engineering ; v. 4342
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6.

図書

図書
IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ; Institute of Electrical and Electronics Engineers ; Semiconductor Equipment and Materials International
出版情報: Piscataway, NJ : IEEE Service Center, c2002  v, 430 p. ; 28 cm
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7.

図書

図書
IEEE Power Engineering Society
出版情報: Piscataway, N.J. : IEEE Operations Center, c2002  2 v. (xxvi, 1526 p.) ; 28 cm
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8.

図書

図書
sponsored by IEEE and the Robotics and Automation Society
出版情報: Piscataway, N.J. : IEEE Operations Center, c2002  xliii, 737 p. ; 28 cm
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9.

図書

図書
sponsored by IEEE Region 3 ...[et al.]
出版情報: Piscataway, N.J. : IEEE Service Center, c2002  xviii, 482 p. ; 28 cm
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10.

図書

図書
sponsored by IEEE, Aerospace & Electronic Systems Society
出版情報: Piscataway, NJ : IEEE Order Dept., c2002  366 p. ; 28 cm
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