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1.

図書
図書
1. State-of-the-art program on compound semiconductors XXXVII (SOTAPOCS XXXVII) and narrow bandgap optoelectronic materials and devices : proceedings of the international symposia
editors, P.C. Chang ... [et al.] ; sponsoring division, Electronics
出版情報: Pennington, N.J. : Electrochemical Society, c2002  ix, 326 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-14
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2.

図書
図書
2. Electrochemical processing in ULSI fabrication III : proceedings of the international symposium
editors, P. C. Andricacos ...[et al.] ; sponsoring divisions, Electrodeposition, Dielectric Science and Technology, Electronics
出版情報: Pennington, N.J. : Electrochemical Society, c2002  viii, 258 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2000-8
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3.

図書
図書
3. Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium
editors, J. Ruzyllo ... [et al.]
出版情報: Pennington, N.J. : Electrochemical Society, c2002  x, 374 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2001-26
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4.

図書
図書
4. State-of-the-art program on compound semiconductors XXXVI and wide bandgap semiconductors for photonic and electronic devices and sensors II : proceedings of the international symposia
editors, R.K. Kopf ... [et al.] ; sponsoring divisions, Electronics, Sensor
出版情報: Pennington, N.J. : Electrochemical Society, c2002  ix, 362 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-3
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5.

図書
図書
5. Integrated optoelectronics : proceedings of the first international symposium
editors, M.J. Deen, D. Misra, J. Ruzyllo ; sponsoring divisions, Electronics, Dielectric Science and Technology
出版情報: Pennington, N.J. : Electrochemical Society, c2002  viii, 436 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2001-28
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6.

図書
図書
6. High purity silicon VII : proceedings of the international symposium
editors C.L. Claeys ... [et al.] ; sponsoring division: Electronics
出版情報: Pennington, N.J. : Electrochemical Society, c2002  xiii, 406 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-20
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7.

図書
図書
7. Microelectronics technology and devices : SBMICRO 2002 : proceedings of the seventeenth international symposium
editors, Nilton I. Morimoto, Renato P. Ribas, Patrick Verdonck
出版情報: Pennington, N.J. : Electrochemical Society, c2002  x, 488 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-8
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8.

図書
図書
8. Advanced luminescent materials and quantum confinement II : proceedings of the international symposium
editors, M. Cahay ... [et al.] ; sponsoring divisions, Dielectric Science and Technology, Electronics, and Luminescene an Display Materials
出版情報: Pennington, NJ : Electrochemical Society, Inc., c2002  viii, 218 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-9
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9.

図書
図書
9. Rapid thermal and other short-time processing technologies III : proceedings of the international symposium
editors, P.J. Timans ... [et al.] ; sponsoring deivisions, Electronics, Dielectric Science and Technology, and High Temperature Materials
出版情報: Pennington, NJ : Electrochemical Society, c2002  xiii, 478 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-11
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10.

図書
図書
10. Environmental issues with materials and processes for the electronics and semiconductor industries V : proceedings of the international symposium
editor, L. Mendicino ; sponsoring divisions, Dielectric Science and Technology and Electroncis
出版情報: Pennington, N.J. : Electrochemical Society, c2002  viii, 262 p. ; 24 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 2002-15
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目次情報: 続きを見る
Process Emissions Characterization and Treatment / A.：
Emissions Characterization of Advanced CVD Processes and Abatement Performance / V. Vartanian ; B. Goolsby ; C. Reddy ; V. Arunachalam ; L. Mendicino
Effective Management of Process Exhaust from Low-K CVD Processes / S. Carss ; A. Seeley ; J. Van Gompel
Development and Evaluation of the ATMI CDO 865 for Abatement of Low-K Process Effluent / B. Flippo ; R. Vermeulen
Managing Fluorine Emissions at Semiconductor Fabrication Facilities / M. Smylie
Characterization of Plasma-Etched RuO[subscript 2] Substrates / S. Samavedam ; L Mendicino ; J.J. Lee ; T. Guenther ; S. Dakshina-Murthy ; C. Sparks
Evaluation of Ozone Emissions Destruction Units for SACVD Process Tools / C. Nauert ; R. Camacho ; B. Day ; R. Lathrop ; H. Kwong ; J. Fox
Potential Cost of Ownership Reduction for a Nitride Furnace Point of Use Abatement Device / B. Davis ; M. Rossow
Electrochemical Removal of Hydrogen Sulfide from Geothermal Brines / B.G. Ateya ; F.M. AlKharafi
PFC Emissions Reduction / B.：
The Evaluation of Hexafluoro-1,3-Butadiene as an Environmentally Benign Dielectric Etch Chemistry in a Medium Density Etch Chamber / R. Chatterjee ; R. Reif ; T. Sparks
Post-Pump PFC Abatement by Atmospheric Microwave Plasmas: Completion of Metal Etch Beta Test / J.C. Rostaing ; D. Guerin ; C. Larquet ; A. El-Krid ; C.H. Ly ; J. Bruat ; E. Coffre ; M. Moisan ; H. Dulphy ; P. Moine ; J. Wiechers
Characterization of NF[subscript 3] Chamber Cleans on Multiple CVD Platforms / J. Rivers ; J. Vires ; A. Soyemi ; S.P. Sun ; M. Turner ; C. Esber
Reduction of PFC Emissions Through Process Advances in CVD Chamber Cleaning / S. Hsu ; C. Allgood ; M. Mocella
PFC Emissions Reduction and Process Improvements with Remote Plasma CVD Chamber Cleans / P.T. Brown ; S. Filipiak ; H. Estep ; M. Fletcher
Thermal Reductive Destruction of Perfluorocarbons into Safe Products Through In-situ Generation of Alkali Metals in Heated Solid Mixtures / M.C. Lee ; W. Choi
Alternative Cleans Technologies and Emerging Issues / C.：
Post Oxide Etching Cleaning Process Using Integrated Ashing and HF Vapor Process / O. Kwon ; H. Sawin
Fluorocarbon Film and Residue Removal Using Supercritical CO[subscript 2] Mixtures / S. Myneni ; D. Hess
A Summary of Recent Motorola Water Conservation Efforts from Source Reduction of Process Equipment / B. Raley ; T. Dietrich
Partnerships to Address EHS Aspects of Chemical Management in the Semiconductor Industry: Lessons from the PFAS Experience / M. Bowden ; L. Beu ; S. Pawsat
PFAS: Treatment Options and Sampling Methods / K. Barbee ; L. Lovejoy
EHS Risk Assessment and Management / D.：
Concepts and Application of Risk Management of Address Business Needs / S. Trammell ; J. Heironimus
Emergency Preparedness and Response for Semiconductor Manufacturing / S. Harris
Environmental Health and Safety (EHS) Investigation of CVD Exhaust System: Identification and Mitigation of Potential Release of Process Gases and By-products / L. Chandna ; A. Reynoso ; K. Hendricksen
Point of Use Abatement Unit By-Pass for NF[subscript 3]-Based CVD Chamber Clean Applications / D. Babbitt
Process Emissions Characterization and Treatment / A.：
Emissions Characterization of Advanced CVD Processes and Abatement Performance / V. Vartanian ; B. Goolsby ; C. Reddy ; V. Arunachalam ; L. Mendicino
Effective Management of Process Exhaust from Low-K CVD Processes / S. Carss ; A. Seeley ; J. Van Gompel
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