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1.

図書

図書
edited by Wilhelm Jost, Douglas Henderson and H. Eyring
出版情報: New York : Academic Press, 1970  xix, 780 p. ; 24 cm
シリーズ名: Physical chemistry : an advanced treatise ; v. 10
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2.

図書

図書
by David L. Greenaway and Günther Harbeke
出版情報: Oxford ; New York : Pergamon Press, [1968]  xi, 159 p. ; 23 cm
シリーズ名: International series of monographs in the science of the solid state ; v. 1
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3.

図書

図書
[by] Marvin M. Cohen
出版情報: New York : Gordon and Breach, [1972]  ix, 299 p. ; 24 cm
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4.

図書

図書
[by] Y. Okamoto and Walter Brenner
出版情報: New York : Reinhold Pub. Corp, c1964  vi, 184 p. ; 24 cm
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5.

図書

図書
Dieter K. Schroder
出版情報: New York : Wiley, c1990  xv, 599 p. ; 25 cm
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目次情報: 続きを見る
Preface to Third Edition
Resistivity / 1:
Introduction / 1.1:
Two-Point Versus Four-Point Probe / 1.2:
Wafer Mapping / 1.3:
Resistivity Profiling / 1.4:
Contactless Methods / 1.5:
Conductivity Type / 1.6:
Strengths and Weaknesses / 1.7:
Resistivity as a Function of Doping Density / Appendix 1.1:
Intrinsic Carrier Density / Appendix 1.2:
References
Problems
Review Questions
Carrier and Doping Density / 2:
Capacitance-Voltage (C-V) / 2.1:
Current-Voltage (I-V) / 2.3:
Measurement Errors and Precautions / 2.4:
Hall Effect / 2.5:
Optical Techniques / 2.6:
Secondary Ion Mass Spectrometry (SIMS) / 2.7:
Rutherford Backscattering (RBS) / 2.8:
Lateral Profiling / 2.9:
Parallel or Series Connection? / 2.10:
Circuit Conversion / Appendix 2.2:
Contact Resistance and Schottky Barriers / 3:
Metal-Semiconductor Contacts / 3.1:
Contact Resistance / 3.3:
Measurement Techniques / 3.4:
Schottky Barrier Height / 3.5:
Comparison of Methods / 3.6:
Effect of Parasitic Resistance / 3.7:
Alloys for Contacts to Semiconductors / Appendix 3.2:
Series Resistance, Channel Length and Width, and Threshold Voltage / 4:
PN Junction Diodes / 4.1:
Schottky Barrier Diodes / 4.3:
Solar Cells / 4.4:
Bipolar Junction Transistors / 4.5:
MOSFETS / 4.6:
MESFETS and MODFETS / 4.7:
Threshold Voltage / 4.8:
Pseudo MOSFET / 4.9:
Schottky Diode Current-Voltage Equation / 4.10:
Defects / 5:
Generation-Recombination Statistics / 5.1:
Capacitance Measurements / 5.3:
Current Measurements / 5.4:
Charge Measurements / 5.5:
Deep-Level Transient Spectroscopy (DLTS) / 5.6:
Thermally Stimulated Capacitance and Current / 5.7:
Positron Annihilation Spectroscopy (PAS) / 5.8:
Activation Energy and Capture Cross-Section / 5.9:
Time Constant Extraction / Appendix 5.2:
Si and GaAs Data / Appendix 5.3:
Oxide and Interface Trapped Charges, Oxide Thickness / 6:
Fixed, Oxide Trapped, and Mobile Oxide Charge / 6.1:
Interface Trapped Charge / 6.3:
Oxide Thickness / 6.4:
Capacitance Measurement Techniques / 6.5:
Effect of Chuck Capacitance and Leakage Current / Appendix 6.2:
Carrier Lifetimes / 7:
Recombination Lifetime/Surface Recombination Velocity / 7.1:
Generation Lifetime/Surface Generation Velocity / 7.3:
Recombination Lifetime-Optical Measurements / 7.4:
Recombination Lifetime-Electrical Measurements / 7.5:
Generation Lifetime-Electrical Measurements / 7.6:
Optical Excitation / 7.7:
Electrical Excitation / Appendix 7.2:
Mobility / 8:
Conductivity Mobility / 8.1:
Hall Effect and Mobility / 8.3:
Magnetoresistance Mobility / 8.4:
Time-of-Flight Drift Mobility / 8.5:
MOSFET Mobility / 8.6:
Contactless Mobility / 8.7:
Semiconductor Bulk Mobilities / 8.8:
Semiconductor Surface Mobilities / Appendix 8.2:
Effect of Channel Frequency Response / Appendix 8.3:
Effect of Interface Trapped Charge / Appendix 8.4:
Charge-based and Probe Characterization / 9:
Background / 9.1:
Surface Charging / 9.3:
The Kelvin Probe / 9.4:
Applications / 9.5:
Scanning Probe Microscopy (SPM / 9.6:
Optical Characterization / 9.7:
Optical Microscopy / 10.1:
Ellipsometry / 10.3:
Transmission / 10.4:
Reflection / 10.5:
Light Scattering / 10.6:
Modulation Spectroscopy / 10.7:
Line Width / 10.8:
Photoluminescence (PL / 10.9:
Raman Spectroscopy / 10.10:
Transmission Equations / 10.11:
Absorption Coefficients and Refractive Indices for SelectedSemiconductors / Appendix 10.2:
Chemical and Physical Characterization / 11:
Electron Beam Techniques / 11.1:
Ion Beam Techniques / 11.3:
X-Ray and Gamma-Ray Techniques / 11.4:
Selected Features of Some Analytical Techniques / 11.5:
Reliability and Failure Analysis / 12:
Failure Times and Acceleration Factors / 12.1:
Distribution Functions / 12.3:
Reliability Concerns / 12.4:
Failure Analysis Characterization Techniques / 12.5:
Gate Currents / 12.6:
List of Symbols / Appendix 1:
Abbreviations and Acronyms / Appendix 2:
Index
Preface to Third Edition
Resistivity / 1:
Introduction / 1.1:
6.

図書

図書
by Otfried Madelung ; translated by Dietrich Meyerhofer
出版情報: New York : John Wiley & Sons, c1964  xiv, 409 p. ; 24 cm
シリーズ名: Wiley series on the science and technology of materials
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7.

図書

図書
edited by M. J. Howes, D. V. Morgan
出版情報: London ; New York : Wiley, c1976  402 p. ; 24 cm
シリーズ名: The Wiley series in solid state devices and circuits
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8.

図書

図書
by Daniel R. Frankl
出版情報: Oxford ; New York : Pergamon Press, [1967]  xv, 310 p. ; 23 cm
シリーズ名: International series of monographs on semiconductors ; v. 7
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9.

図書

図書
by Heinz K. Henisch
出版情報: Oxford [Oxfordshire] : Clarendon Press , New York : Oxford University Press, 1984  xxi, 377 p. ; 24 cm
シリーズ名: The international series of monographs on physics ; 70
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目次情報: 続きを見る
Introductory Survey / 1:
Single Carrier Systems / 2:
Two-Carrier Systems / 3:
Reactive and Frequency-Dependent Contact Properties / 4:
Metal-Semiconductor Contacts Under Illumination / 5:
Special Topics and Problems / 6:
Introductory Survey / 1:
Single Carrier Systems / 2:
Two-Carrier Systems / 3:
10.

図書

図書
edited by N.B. Hannay
出版情報: Tokyo : Maruzen, 1960  xxiii, 767 p. ; 22 cm
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