Developments in semiconductor microlithography, June 1-3, 1976, San Jose, California

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Developments in semiconductor microlithography, June 1-3, 1976, San Jose, California / Donald E. Routh ... [et al.], editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid Microelectronics

資料種別:

図書

出版情報:

Palos Verdes Estates, Calif. : Society of Photo-optical Instrumentation Engineers, c1976

形態:

vi, 146 p. ; 28 cm

シリーズ名:

Proceedings of the Society of Photo-Optical Instrumentation Engineers ; v. 80 <BA0118856X>

著者名:

ISBN:

9780892521074 [0892521074]

書誌ID:

BA23913119

子書誌情報

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他の版・巻

書誌詳細

注記:	Includes bibliographical references and indexes
主題:	Microlithography--Congresses; Semiconductors--Congresses
言語:	英語

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