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1.

図書

図書
Mark B. Shiflett, Aaron M. Scurto, editor[s] ; sponsored by the ACS Division of Industrial and Engineering Chemistry
出版情報: Washington, DC : American Chemical Society , [Oxford] : Distributed in print by Oxford University Press, c2017  xi, 313 p. ; 24 cm
シリーズ名: ACS symposium series ; 1250
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2.

図書

図書
G. Scott Barney, editor, James D. Navratil, editor, Wallace W. Schulz, editor
出版情報: Washington, D.C. : American Chemical Society, 1984  ix, 413 p. ; 24 cm
シリーズ名: ACS symposium series ; 246
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3.

図書

図書
K.C. Chao, editor, Robert L. Robinson, Jr., editor
出版情報: Washington, D.C. : American Chemical Society, c1986  ix, 597 p. ; 24 cm
シリーズ名: ACS symposium series ; 300
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4.

図書

図書
H. Scott Fogler, editor
出版情報: Washington, D.C. : American Chemical Society, 1981  ix, 396 p. ; 24 cm
シリーズ名: ACS symposium series ; 168
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5.

図書

図書
Dinesh O. Shah, editor
出版情報: Washington, D.C. : American Chemical Society, 1985  x, 502 p. ; 24 cm
シリーズ名: ACS symposium series ; 272
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6.

図書

図書
Arnold H. Pelofsky, editor
出版情報: Washington : American Chemical Society, 1979  xiii, 257 p. ; 24 cm
シリーズ名: ACS symposium series ; 110
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7.

図書

図書
sponsored by the Division of Industrial and Engineering Chemistry of the American Chemical Society, University of California--Davis, March 26-27, 1984 ; Pieter Stroeve, editor
出版情報: Washington, D.C. : American Chemical Society, 1985  ix, 348 p. ; 24 cm
シリーズ名: ACS symposium series ; 290
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目次情報: 続きを見る
The Manufacture of Integrated
Circuits Application of Three Fundamental Conservation Laws Silicon
Oxidation Zone Refining of Low Prandtl Number Liquid Metals
Research Opportunities in Resist Technology
Modifications of Photoresists
Developer Concentration Effects Molecular-Beam
Epitaxy for Device Applications Ion-Implanted
Integrated Circuits Plasma-Assisted Processing Oxides and Nitrides of Germanium Group III-IV
Compound Optoelectronic Devices Advanced Device Isolation for VLSI Ternary Group III-V
Semiconductor Materials Device-Quality
Strained-Layer Superlattices Wafer Design and Characterization
The Manufacture of Integrated
Circuits Application of Three Fundamental Conservation Laws Silicon
Oxidation Zone Refining of Low Prandtl Number Liquid Metals
8.

図書

図書
Thaddeus E. Whyte, Jr., editor ... [et al.]
出版情報: Washington, D.C. : American Chemical Society, 1984  x, 465 p. ; 24 cm
シリーズ名: ACS symposium series ; 248
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9.

図書

図書
Milorad P. Duduković, editor ; Patrick L. Mills, editor
出版情報: Washington, D.C. : American Chemical Society, 1984  ix, 426 p. ; 24 cm
シリーズ名: ACS symposium series ; 237
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10.

図書

図書
Lawrence A. Casper, editor ; developed from a symposium sponsored by the Division of Industrial and Engineering Chemistry of the American Chemimcal Society
出版情報: Washington, DC : American Chemical Society, 1986  x, 443 p
シリーズ名: ACS symposium series ; 295
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目次情報: 続きを見る
Analytical Approaches and Expert Systems in the Characterization of Microelectronic
Devices Electrical Characterization of Semiconductor
Materials and Devices Dopant Profiles by the Spreading Resistance Technique
SEM Techniques for Characterization of Semiconductor Materials
Semiconductor Materials Defect Diagnostics for Submicron VLSI
Technology Applications of Secondary Ion Mass Spectroscopy to Characterization of Microelectronic
Materials Applications of Auger Electron Spectroscopy in Microelectronics
X-Ray Photoelectron Spectroscopy Applied to Microelectronic Materials
Application of Neutron Depth Profiling to Microelectronic Materials
Processing Thermal-Wave Measurement of Thin Film
Thickness Characterization of Materials, Thin Films, and Interfaces by Optical Reflectance and Ellipsometric Techniques
Measurement of the Oxygen and Carbon
Content of Silicon Wafers by Fourier Transform
Spectrophotometry Application of the Raman Microprobe to Analytical Problems of Microelectronics
Characterization of GaAs by Magneto-Optical Photoluminescent Spectroscopy
Thermal-Wave Imaging in a Scanning Electron Microscope Fourier
Transform Mass Spectrometry in the Microelectronics
Service Laboratory Materials Characterization
Using Elemental and Isotope Analysis by Inductively
Coupled Plasma Mass Spectrometry (ICP-MS)
Activation Analysis of Electronics Materials
Trace Element Survey Analyses by Spark Source Mass Spectrography (SSMS)
Characterization of Components in Plasma Phosphorus
Doped Oxides Process Control of Vacuum-Deposited
Nickel-Chromium for the Fabrication of Reproducible
Thin Film Resistors Characterization of Spin-On Glass
Films as a Planarizing Dielectric Effects of Various
Chemistries on Silicon Wafer Cleaning
Monitoring of Particles in Gases
Using a Laser Counter Microelectronics Processing Problem Solving
The Synergism of Complementary Techniques
Analytical Approaches and Expert Systems in the Characterization of Microelectronic
Devices Electrical Characterization of Semiconductor
Materials and Devices Dopant Profiles by the Spreading Resistance Technique
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