| 1.
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Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City
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| 2.
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2. Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan
Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering
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| 3.
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sponsored by the Japan Society of Applied Physics ... [et al.]
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| 4.
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Manfred Engelhardt, Terence Hook, and Calvin T. Gabriel, ; technical co-sponsors, American Vacuum Society, IEEE/Electron Devices Society, Japanese Society of Applied Physics
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| 5.
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sponsored by the Japan Society of Applied Physics, IEEE Lasers and Electro-Optics Society, and IEEE Electron Devices Society ; in cooperation with the Institute of Electronics, Information and Communication Engineers, Optoelectronic Industry and Technology Development Association and the Research and Development Association for Future Electron Devices
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| 6.
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[sponsored by IEEE Electron Devices Society, IEEE Components Packaging and Manufacturing Technology Society, Semiconductor Equipment & Materials International (SEMI), and Society of Applied Physics of Japan]
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| 7.
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sponsored by the Japan Society of Applied Physics ; technical cosponsored by IEEE Electron Devices Society ; in cooperation with the Institute of Electronics, Information and Communication Engineers ... [et al.]
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| 8.
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Sponsored by the Institute of Electrical Engineers of Japan ; co-sponsored by the IEEE Electron Devices Society ; in cooperation with the Institute of Electronics Information and Communication Engineers of Japan and the Japan Society of Applied Physics
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| 9.
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9. 2001 6th International Workshop on Statistical Methodology : IWSM, June 10, 2001, Kyoto (: soft.)
technical co-sponsored by IEEE Electron Devices Society ; co-sponsored by VLSI Symposium, the Japan Society of Applied Physics, IEEE ED Tokyo Chapter ; in cooperation with the Institute of Electronics, Information and Communication Engineers
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| 10.
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the Japan Society of Applied Physics, the IEEE Electron Devices Society
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