2001 6th International Symposium on Plasma- and Process-Induced Damage, May 13-15, 2001, Monterey, California, USA

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2001 6th International Symposium on Plasma- and Process-Induced Damage, May 13-15, 2001, Monterey, California, USA / Manfred Engelhardt, Terence Hook, and Calvin T. Gabriel, ; technical co-sponsors, American Vacuum Society, IEEE/Electron Devices Society, Japanese Society of Applied Physics

資料種別:

図書

出版情報:

Santa Clara, Calif. : American Vacuum Society - Northen California Chapter, c2001

形態:

i, 128 p. ; 28 cm

著者名:

International Symposium on Plasma Process-Induced Damage <DA13150844>

Engelhardt, Manfred

Hook, Terence

Gabriel, Calvin T. <DA10596199>

IEEE Electron Devices Society <DA01257512>

American Vacuum Society <DA03926125>

応用物理学会 <DA00633233>

さらに 2 件

ISBN:

9780965157759 [096515775X] (: soft.)

書誌ID:

BA52793939

子書誌情報

フルテキスト

所蔵情報

他の版・巻

書誌詳細

その他の標題:	01TH8538
注記:	"P2ID"-- on cover "IEEE Catalog Number (softbound) 01TH8583" -- T. p. verso Includes bibliographical references and index
著者名ヨミ:	オウヨウブツリガッカイ
主題:	Plasma etching--Congresses; Semiconductor wafers--Defects--Congresses; Semiconductors--Effect of radiation on--Congresses
言語:	英語

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