Optical measurement of surface topography

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Optical measurement of surface topography / Richard Leach (Ed.)

資料種別:: 図書
出版情報:: Berlin ; Heidelberg : Springer, c2011
形態:: xiii, 323p. ; 25cm
著者名:: Leach, Richard
ISBN:: 9783642120114 [3642120113] (:hbk)
書誌ID:: BB0875277X

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主題:

Optical measurements

言語:

英語

目次情報:

Introduction to Surface Texture Measurement / Richard Leach1：

Surface Texture Measurement / 1.1：

Surface Profile and Areal Measurement / 1.2：

Areal Surface Texture Measurement / 1.3：

Surface Texture Standards and GPS / 1.4：

Profile Standards / 1.4.1：

Areal Specification Standards / 1.4.2：

Instrument Types in the ISO 25178 Series / 1.5：

The Stylus Instrument / 1.5.1：

Scanning Probe Microscopes / 1.5.2：

Scanning Electron Microscopes / 1.5.3：

Optical Instrument Types / 1.5.4：

Considerations When Choosing a Method / 1.6：

Acknowledgements

References

Some Common Terms and Definitions / 2：

Introduction / 2.1：

The Principal Aberrations / 2.2：

Objective Lenses / 2.3：

Magnification and Numerical Aperture / 2.4：

Spatial Resolution / 2.5：

Optical Spot Size / 2.6：

Field of View / 2.7：

Depth of Field and Depth of Focus / 2.8：

Interference Objectives / 2.9：

Limitations of Optical 3D Sensors / Gerd HÃ¤usler ; Svenja Ettl3：

Introduction: What Is This Chapter About? / 3.1：

The Canonical Sensor / 3.2：

Optically Rough and Smooth Surfaces / 3.3：

Type I Sensors: Triangulation / 3.4：

Type II and Type III Sensors: Interferometry / 3.5：

Type IV Sensors: Deflectometry / 3.6：

Only Four Sensor Principles? / 3.7：

Conclusion and Open Questions / 3.8：

Calibration of Optical Surface Topography Measuring Instruments / Claudiu Giusca4：

Introduction to Calibration and Traceability / 4.1：

Calibration of Surface Topography Measuring Instruments / 4.2：

Can an Optical Instrument Be Calibrated? / 4.3：

Types of Material Measure / 4.4：

Calibration of Instrument Scales / 4.5：

Noise / 4.5.1：

Residual Flatness / 4.5.2：

Amplification, Linearity and Squareness of the Scales / 4.5.3：

Resolution / 4.5.4：

Relationship between the Calibration, Adjustment and Measurement Uncertainty / 4.6：

Summary / 4.7：

Chromatic Confocal Microscopy / FranÃ§ois Blateyron5：

Basic Theory / 5.1：

Confocal Setting / 5.1.1：

Axial Chromatic Dispersion / 5.1.2：

Spectral Decoding / 5.1.3：

Height Detection / 5.1.4：

Metrological Characteristics / 5.1.5：

Spot Size / 5.1.5.1：

Instrumentation / 5.2：

Lateral Scanning Configurations / 5.2.1：

Profile Measurement / 5.2.1.1：

Areal Measurement / 5.2.1.2：

Optoelectronic Controller / 5.2.2：

Optical Head / 5.2.3：

Light Source / 5.2.4：

Chromatic Objective / 5.2.5：

Spectrometer / 5.2.6：

Optical Fibre Cord / 5.2.7：

Instrument Use and Good Practice / 5.3：

Calibration / 5.3.1：

Calibration of Dark Level / 5.3.1.1：

Linearisation of the Response Curve / 5.3.1.2：

Calibration of the Height Amplification Coefficient / 5.3.1.3：

Calibration of the Lateral Amplification Coefficient / 5.3.1.4：

Calibration of the Hysteresis in Bi-directional Measurement / 5.3.1.5：

Preparation for Measurement / 5.3.2：

Pre-processing / 5.3.3：

Limitations of the Technique / 5.4：

Local Slopes / 5.4.1：

Scanning Speed / 5.4.2：

Light Intensity / 5.4.3：

Non-measured Points / 5.4.4：

Outliers / 5.4.5：

Interference / 5.4.6：

Ghost Foci / 5.4.7：

Extensions of the Basic Principles / 5.5：

Thickness Measurement / 5.5.1：

Line and Field Sensors / 5.5.2：

Absolute Reference / 5.5.3：

Case Studies / 5.6：

Point Autofocus Instruments / Katsuhiro Miura ; Atsuko Nose6：

Comparison with Roughness Material Measures / 6.1：

Three-Dimensional Measurement of Grinding Wheel Surface Topography / 6.3.2：

Limitations of PAI / 6.4：

Lateral Resolution / 6.4.1：

Vertical Resolution / 6.4.2：

The Maximum Acceptable Local Surface Slope / 6.4.3：

Conclusion / 6.5：

Focus Variation Instruments / Franz Helmli7：

How Does It Work? / 7.1：

Acquisition of Image Data / 7.2.2：

Measurement of 3D Information / 7.2.3：

Post-processing / 7.2.4：

Handling of Invalid Points / 7.2.5：

Difference to Other Techniques / 7.3：

Difference to Imaging Confocal Microscopy / 7.3.1：

Difference to Point Auto Focusing Techniques / 7.3.2：

Optical System / 7.4：

CCD Sensor / 7.4.2：

Microscope Objective / 7.4.3：

Driving Unit / 7.4.5：

Practical Instrument Realisation / 7.4.6：

Limitations of the Technology / 7.5：

Translucent Materials / 7.6.1：

Measurable Surfaces / 7.6.2：

Repeatability Information / 7.7：

High Radiometric Data Acquisition / 7.7.2：

2D Alignment / 7.7.3：

3D Alignment / 7.7.4：

Surface Texture Measurement of Worn Metal Parts / 7.8：

Form Measurement of Complex Tap Parameters / 7.8.2：

Phase Shifting Interferometry / Peter de Groot7.9：

Concept and Overview / 8.1：

Principles of Surface Measurement Interferometry / 8.2：

Phase Shifting Method / 8.3：

Phase Unwrapping / 8.4：

Phase Shifting Error Analysis / 8.5：

Interferometer Design / 8.6：

Focus / 8.7：

Light Sources / 8.9：

Examples of PSI Measurement / 8.10：

Coherence Scanning Interferometry / 9：

Terminology / 9.1：

Typical Configurations of CSI / 9.3：

Signal Formation / 9.4：

Signal Processing / 9.5：

Foundation Metrics and Height Calibration for CSI / 9.6：

Dissimilar Materials / 9.7：

Vibrational Sensitivity / 9.8：

Transparent Films / 9.9：

Examples / 9.10：

Digital Holographic Microscopy / Tristan Colomb ; Jonas KÃ¼hn9.11：

Acquisition / 10.1：

Reconstruction / 10.2.2：

Digital Camera / 10.3：

Optical Path Retarder / 10.3.3：

Digital Focusing / 10.4：

DHM Parameters / 10.4.2：

Automatic Working Distance in Reflection DHM / 10.4.3：

Sample Preparation and Immersion Liquids / 10.4.4：

Limitations of DHM / 10.5：

Parasitic Interferences and Statistical Noise / 10.5.1：

Height Measurement Range / 10.5.2：

Sample Limitation / 10.5.3：

Extensions of the Basic DHM Principles / 10.6：

Multi-wavelength DHM / 10.6.1：

Extended Measurement Range / 10.6.1.1：

Mapping / 10.6.1.2：

Stroboscopic Measurement / 10.6.2：

DHM Reflectometry / 10.6.3：

Infinite Focus / 10.6.4：

Applications of DHM / 10.6.5：

Topography and Defect Detection / 10.6.5.1：

Roughness / 10.6.5.2：

Micro-optics Characterization / 10.6.5.3：

MEMS and MOEMS / 10.6.5.4：

Semi-transparent Micro-structures / 10.6.5.5：

Conclusions / 10.7：

Imaging Confocal Microscopy / Roger Artigas11：

Introduction to Imaging Confocal Microscopes / 11.1：

Working Principle of an Imaging Confocal Microscope / 11.1.2：

Metrological Algorithm / 11.1.3：

Image Formation of a Confocal Microscope / 11.1.4：

General Description of a Scanning Microscope / 11.1.4.1：

Point Spread Function for the Limiting Case of an Infinitesimally Small Pinhole / 11.1.4.2：

Pinhole Size Effect / 11.1.4.3：

Types of Confocal Microscopes / 11.2：

Laser Scanning Confocal Microscope Configuration / 11.2.1.1：

Disc Scanning Confocal Microscope Configuration / 11.2.1.2：

Programmable Array Scanning Confocal Microscope Configuration / 11.2.1.3：

Objectives for Confocal Microscopy / 11.2.2：

Vertical Scanning / 11.2.3：

Motorised Stages with Optical Linear Encoders / 11.2.3.1：

Piezoelectric Stages / 11.2.3.2：

Comparison between Motorised and Piezoelectric Scanning Stages / 11.2.3.3：

Location of an Imaging Confocal Microscope / 11.3：

Setting Up the Sample / 11.3.2：

Setting the Right Scanning Parameters / 11.3.3：

Simultaneous Detection of Confocal and Bright Field Images / 11.3.4：

Sampling / 11.3.5：

Low Magnification against Stitching / 11.3.6：

Limitations of Imaging Confocal Microscopy / 11.4：

Maximum Detectable Slope on Smooth Surfaces / 11.4.1：

Noise and Resolution in Imaging Confocal Microscopes / 11.4.2：

Errors in Imaging Confocal Microscopes / 11.4.3：

Objective Flatness Error / 11.4.3.1：

Calibration of the Flatness Error / 11.4.3.2：

Measurements on Thin Transparent Materials / 11.4.3.3：

Measurement of Thin and Thick Film with Imaging Confocal Microscopy / 11.4.4：

Thick Films / 11.5.1：

Thin Films / 11.5.3：

Case Study: Roughness Prediction on Steel Plates / 11.6：

Light Scattering Methods / Theodore V. Vorburger ; Richard Silver ; Rainer Brodmann ; Boris Brodmann ; JÃ¶rg Seewig12：

Instrumentation and Case Studies / 12.1：

Early Developments / 12.3.1：

Recent Developments in Instrumentation for Mechanical Engineering Manufacture / 12.3.2：

Recent Developments in Instrumentation for Semiconductor Manufacture (Optical Critical Dimension) / 12.3.3：

SEMI MF 1048-1109 (2009) Test Method for Measuring the Effective Surface Roughness of Optical Components by Total Integrated Scattering / 12.4：

SEMI ME1392-1109 (2009) Guide for Angle-Resolved Optical Scatter Measurements on Specular or Diffuse Surfaces / 12.4.2：

ISO10110-8: 2010 Optics and Photonics - Preparation of Drawings for Optical Elements and Systems - Part 8: Surface Texture / 12.4.3：

Standards for Gloss Measurement / 12.4.4：

VDA Guideline 2009, Geometrische Produktspezifikation OberflÃ¤chenbeschaffenheit WinkelaufgelÃ¶ste Streulichtmesstech-nik Definition, KenngrÃ¶Ben und Anwendung (Light Scattering Measurement Technique) / 12.4.5：

Index / 12.5：

Introduction to Surface Texture Measurement / Richard Leach1：

Surface Texture Measurement / 1.1：

Surface Profile and Areal Measurement / 1.2：

Areal Surface Texture Measurement / 1.3：

Surface Texture Standards and GPS / 1.4：

Profile Standards / 1.4.1：

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