| 1.
図書 |
|
Eric G. Johnson, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SolidState Technology, [and] Sandia National Laboratories (USA)
|
||||||
| 2.
図書 |
図書
|
Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering
|
||||||
| 3.
図書 |
図書
|
Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering
|
||||||
| 4.
図書 |
図書
|
4. Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan
Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan
|
||||||
| 5.
図書 |
図書
|
Suning Tang, Yao Li, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering
|
||||||
| 6.
図書 |
図書
|
Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City
|
||||||
| 7.
図書 |
図書
|
7. Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan
Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering
|
||||||
| 8.
図書 |
|
Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering
|
||||||
| 9.
図書 |
図書
|
Khan M. Iftekharuddin, Abdul Ahad S. Awwal, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering
|
||||||
| 10.
図書 |
図書
|
Khan M. Iftekharuddin, Abdul Ahad S. Awwal, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, the Boeing Company
|
