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1.

電子ブック

EB
Gary S. May, Costas J. Spanos
出版情報: Wiley Online Library - AutoHoldings Books , Hoboken : John Wiley & Sons, Inc., 2006
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Preface
Acknowledgments
Introduction to Semiconductor Manufacturing / 1:
Objectives
Introduction
Historical Evolution / 1.1:
Modern Semiconductor Manufacturing / 1.2:
Goals of Manufacturing / 1.3:
Manufacturing Systems / 1.4:
Outline for Remainder of the Book / 1.5:
Summary
Problems
References
Technology Overview / 2:
Unit Processes / 2.1:
Process Integration / 2.2:
Process Monitoring / 3:
Process Flow and Key Measurement Points / 3.1:
Wafer State Measurements / 3.2:
Equipment State Measurements / 3.3:
Statistical Fundamentals / 4:
Probability Distributions / 4.1:
Sampling from a Normal Distribution / 4.2:
Estimation / 4.3:
Hypothesis Testing / 4.4:
Reference
Yield Modeling / 5:
Definitions of Yield Components / 5.1:
Functional Yield Models / 5.2:
Functional Yield Model Components / 5.3:
Parametric Yield / 5.4:
Yield Simulation / 5.5:
Design Centering / 5.6:
Process Introduction and Time-to-Yield / 5.7:
Statistical Process Control / 6:
Control Chart Basics / 6.1:
Patterns in Control Charts / 6.2:
Control Charts for Attributes / 6.3:
Control Charts for Variables / 6.4:
Multivariate Control / 6.5:
SPC with Correlated Process Data / 6.6:
Statistical Experimental Design / 7:
Comparing Distributions / 7.1:
Analysis of Variance / 7.2:
Factorial Designs / 7.3:
Taguchi Method / 7.4:
Process Modeling / 8:
Regression Modeling / 8.1:
Response Surface Methods / 8.2:
Evolutionary Operation / 8.3:
Principal-Component Analysis / 8.4:
Intelligent Modeling Techniques / 8.5:
Process Optimization / 8.6:
Advanced Process Control / 9:
Run-by-Run Control with Constant Term Adaptation / 9.1:
Multivariate Control with Complete Model Adaptation / 9.2:
Supervisory Control / 9.3:
Process and Equipment Diagnosis / 10:
Algorithmic Methods / 10.11:
Expert Systems / 10.l2:
Neural Network Approaches / 10.l3:
Hybrid Methods / 10.l4:
Some Properties of the Error Function / Appendix A:
Cumulative Standard Normal Distribution / Appendix B:
Percentage Points of the C2 Distribution / Appendix C:
Percentage Points of the t Distribution / Appendix D:
Percentage Points of the F Distribution / Appendix E:
Factors for Constructing Variables Control Charts / Appendix F:
Index
Preface
Acknowledgments
Introduction to Semiconductor Manufacturing / 1:
2.

電子ブック

EB
Julianna E. Lin, Abdul A.S Awwal, Jason Porter
出版情報: Wiley Online Library - AutoHoldings Books , Hoboken : John Wiley & Sons, Inc., 2006
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Foreword
Acknowledgments
Contributors
Introduction / Part One:
Development of Adaptive Optics in Vision Science and Ophthalmology / David R. Williams ; Jason Porter1:
Brief History of Aberration Correction in the Human Eye / 1.1:
Applications of Ocular Adaptive Optics / 1.2:
Wavefront Measurement and Correction / Part Two:
Aberration Structure of the Human Eye / Pablo Artal ; Juan M. Bueno ; Antonio Guirao ; Pedro M. Prieto2:
Location of Monochromatic Aberrations Within the Eye / 2.1:
Temporal Properties of Aberrations: Accommodation and Aging / 2.3:
Chromatic Aberrations / 2.4:
Off-Axis Aberrations / 2.5:
Statistics of Aberrations in Normal Populations / 2.6:
Effects of Polarization and Scatter / 2.7:
Wavefront Sensing and Diagnostic Uses / Geunyoung Yoon3:
Wavefront Sensors for the Eye / 3.1:
Optimizing a Shack-Hartmann Wavefront Sensor / 3.2:
Calibration of a Wavefront Sensor / 3.3:
Summary / 3.4:
Wavefront Correctors for Vision Science / Nathan Doble ; Donald T. Miller4:
Principal Components of an AO System / 4.1:
Wavefront Correctors / 4.3:
Wavefront Correctors Used in Vision Science / 4.4:
Performance Predictions for Various Types of Wavefront Correctors / 4.5:
Summary and Conclusion / 4.6:
Control Algorithms / Li Chen5:
Confi guration of Lenslets and Actuators / 5.1:
Infl uence Function Measurement / 5.3:
Spatial Control Command of the Wavefront Corrector / 5.4:
Temporal Control Command of the Wavefront Corrector / 5.5:
Adaptive Optics Software for Vision Research / Ben Singer6:
Measuring Wavefront Slope / 6.1:
Aberration Recovery / 6.4:
Correcting Aberrations / 6.5:
Application-Dependent Considerations / 6.6:
Conclusion / 6.7:
Adaptive Optics System Assembly and Integration / Brian J. Bauman ; Stephen K. Eisenbies7:
First-Order Optics of the AO System / 7.1:
Optical Alignment / 7.3:
AO System Integration / 7.4:
System Performance Characterization / Marcos A. van Dam8:
Strehl Ratio / 8.1:
Calibration Error / 8.3:
Fitting Error / 8.4:
Measurement and Bandwidth Error / 8.5:
Addition of Wavefront Error Terms / 8.6:
Retinal Imaging Applications / Part Three:
Fundamental Properties of the Retina / Ann E. Elsner9:
Shape of the Retina / 9.1:
Two Blood Supplies / 9.2:
Layers of the Fundus / 9.3:
Spectra / 9.4:
Light Scattering / 9.5:
Polarization / 9.6:
Contrast from Directly Backscattered or Multiply Scattered Light / 9.7:
Strategies for High-Resolution Retinal Imaging / Austin Roorda ; Julian Christou9.8:
Conventional Imaging / 10.1:
Scanning Laser Imaging / 10.3:
OCT Ophthalmoscope / 10.4:
Common Issues for all AO Imaging Systems / 10.5:
Image Postprocessing / 10.6:
Vision Correction Applications / Part Four:
Customized Vision Correction Devices / Ian Cox11:
Contact Lenses / 11.1:
Intraocular Lenses / 11.2:
Customized Corneal Ablation / Scott M. MacRae12:
Basics of Laser Refractive Surgery / 12.1:
Forms of Customization / 12.3:
The Excimer Laser Treatment / 12.4:
Biomechanics and Variable Ablation Rate / 12.5:
Effect of the LASIK Flap / 12.6:
Wavefront Technology and Higher Order Aberration Correction / 12.7:
Clinical Results of Excimer Laser Ablation / 12.8:
From Wavefronts To Refractions / Larry N. Thibos12.9:
Basic Terminology / 13.1:
Goal of Refraction / 13.2:
Foreword.
Contributors.
Introduction. / Part 1:
Wavefront Measurement And Correction. / Part 2:
Retinal Imaging Applications. / Antonio Guirao, and Pedro M. PrietoPart 3:
Vision Correction Applications. / Part 4:
Methods for Estimating the Monochromatic Refraction from an Aberration Map / 13.3:
Ocular Chromatic Aberration and the Polychromatic Refraction / 13.4:
Experimental Evaluation of Proposed Refraction Methods / 13.5:
Visual Psychophysics With Adaptive Optics / Joseph L. Hardy ; Peter B. Delahunt ; John S. Werner14:
Psychophysical Functions / 14.1:
Psychophysical Methods / 14.2:
Generating the Visual Stimulus / 14.3:
Conclusions / 14.4:
Design Examples. / Part 5:
Rochester Adaptive Optics Ophthalmoscope / Heidi Hofer15:
Optical Layout / 15.1:
Control Algorithm / 15.3:
Wavefront Correction Performance / 15.4:
Improvement in Retinal Image Quality / 15.5:
Improvement in Visual Performance / 15.6:
Current System Limitations / 15.7:
Design of an Adaptive Optics Scanning Laser Ophthalmoscope / Krishnakumar Venkateswaran ; Fernando Romero-Borja15.8:
Light Delivery / 16.1:
Raster Scanning / 16.3:
Adaptive Optics in the SLO / 16.4:
Optical Layout for the AOSLO / 16.5:
Image Acquisition / 16.6:
Software Interface for the AOSLO / 16.7:
Calibration and Testing / 16.8:
AO Performance Results / 16.9:
Imaging Results / 16.10:
Discussions on Improving Performance of the AOSLO / 16.11:
Indiana University AO-OCT System / Yan Zhang ; Jungtae Rha ; Ravi S. Jonnal17:
Description of the System / 17.1:
Experimental Procedures / 17.3:
AO Performance / 17.4:
Example Results with AO Conventional Flood- Illuminated Imaging / 17.5:
Example Results With AO Parallel SD-OCT Imaging / 17.6:
Design and Testing of A Liquid Crystal Adaptive OpticsPhoropter / Abdul Awwal ; Scot Olivier17.7:
Wavefront Sensor Selection / 18.1:
Beacon Selection: Size and Power, SLD versus Laser Diode / 18.3:
Wavefront Corrector Selection / 18.4:
Wavefront Reconstruction and Control / 18.5:
Software Interface / 18.6:
AO Assembly, Integration, and Troubleshooting / 18.7:
System Performance, Testing Procedures, and Calibration / 18.8:
Results from Human Subjects / 18.9:
Discussion / 18.10:
Optical Society Of America'S Standards For Reporting Optical Aberrations. / 18.11:
Glossary.
SYMBOL TABLE.
Index
Foreword
Acknowledgments
Contributors
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