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1.

図書

図書
Gordon L. Nelson, editor, Charles A. Wilkie, editor
出版情報: Washington, DC : American Chemical Society, c2001  xi, 411 p. ; 24 cm
シリーズ名: ACS symposium series ; 797
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Preface
Fire Retardancy in 2001 / Gordon L. Nelson ; Charles A. Wilkie Nanocomposites1:
Flammability properties of polymer-clay nanocomposites: Polyamide-6 and Polypropylene Clay Nanocomposites / Alexander B. Morgan, et al2:
Recent studies on thermal stability and flame retardancy of polystyrene-nanocomposites / Jin Zhu ; Fawn Uhl ; Charles A. Wilkie3:
Fire smart polymers
Fire Smart Polymers / Eli M. Pearce ; Edward D. Weil ; Victor Y. Barinov4:
High performance polyimide Foams / Martha K. Williams, et al5:
Comprehensive study of thermal and fire behavior of para-Aramid and polybenzazole fibers / Xavier Flambard, et al6:
Polyureathanes
Cone calorimetric analysis of modified polyurethane elastomers and foams with flame-retardant additives / N. Najafi-Mohajeri ; C. Jayakody ; G.L. Nelson7:
Mechanism of expandable graphite fire retardant action in polyurethanes / G. Camino, et al8:
Synthesis of phosphorus-containing two-component polyurethane coating and evaluation of their flame retardancy / Yong-Ho Choi, et al9:
Non-halogen Fire Retardants
Cross-linking of polystyrene by Friedel-Crafts chemistry: a review / Hongyand Yao10:
Use of carbonizing polymers as additives for intumescent polymer blends / M. Le Bras ; S. Bourbigot11:
The effect of aluminosilicates on the intumescent ammonium polyphosphate/pentaerythritol flame retardant systems - an X-ray photoelectron spectroscopic study / Jiangqi Wang ; Ping Wei ; Jianwei Hao12:
Role of interface modification in flame-retarded multiphase polyolefin systems / Gy. Marosi, et al13:
Thermal degradation and combustion mechanism of EVA-magnesium hydroxide-zinc borate / Serge Bourbigot ; Fabien Carpentier ; Michel Le Bras14:
Optimization of processing parameters for fire-retardant polymer-based formulations / L. Cartier, et al15:
Fire retardancy and thermal stability of materials coated by organosilicon thin films using a cold remore plasma process / C. Jama, et al16:
Phosphorus-containing fire retardants in aliphatic nylons / Sergei V. Levchik ; Galina F. Levchik ; Elena A. Murashko17:
Zinc borates - 30 years of successful development as multifunctional fire retardants / Kelvin K. Shen18:
Oxygenated hydrocarbon compounds as flame retardants for polyester fabric / Kobie Bisschoff ; W.W. Focke Halogen19:
Reductive dechlorination of a cycloaliphatic fire retardant by antimony trioxide and nylon 6,6: Implications for the Synergism of Antimony and Chlorine / William H. Starnes, Jr ; Yun M. Kang ; Lynda B. Payne20:
New copper complexes as potential smoke suppressants for poly(vinyl chloride): Further studies on Reductive Coupling Agents / Robert D. Pike, et al21:
Processing and thermo-oxidative aging of high impact polystyrene containing fire retardant, Kenneth Moller / Jukka Lausmaa ; Antal Boldizar22:
Assessment and performance
Fire performance of organic polymers, thermal decomposition, and chemical composition / Marcelo M. Hirschler23:
Studies of chemical behaviour in the different regions of polymer combustion and the influence of flame retardants thereon / D. Price, et al24:
Combustion toxicity and chemometrics / Ed Metcalfe ; John Tetteh25:
Thermal degradation of poly(vinyl acetate): A Solid-State 13C NMR Study / Caroline M. Dick ; John J. Liggat ; Colin E. Snape26:
Thermal characterization of thermoset matrix resins / B.K. Kandola ; A.R. Horrocks ; P. Myler ; D. Blair27:
Flammability studies of fire retardant coatings on wood / J. H. Koo, et al28:
Indexes
Author Index
Subject Index
Preface
Fire Retardancy in 2001 / Gordon L. Nelson ; Charles A. Wilkie Nanocomposites1:
Flammability properties of polymer-clay nanocomposites: Polyamide-6 and Polypropylene Clay Nanocomposites / Alexander B. Morgan, et al2:
2.

図書

図書
American Chemical Society. Division of Polymeric Materials : Science and Engineering ; American Chemical Society
出版情報: [York, PA] : American Chemical Society, c2001  lxxiv, 1106 p. ; 28 cm
シリーズ名: ACS Polymeric Materials Science and Engineering ; v. 84
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Section headings
Preface
Chair's Message
Missions, Values and Principles
PMSE Executive Committee
PMSE Committee Organization
Membership Information
Polyed Sponsors
Symposia Sponsors
Awards
Future Programs
Instructions for Authors
Program Listing
PMSE Papers
Functional Polymers and Dendrimers: From Synthesis to Applications
Macromolecular Self-Assembly at Surfaces and Interfaces
New Polyolefin Copolymers - Synthesis, Properties and Applications
Polymers in Supercritical Fluids
Practical Polymer Synthesis
ACS Award for Team Innovation in Honor of the Lucent Technologies Bell Laboratories/Arch Chemicals 193 nm Team
Functional Condensation Polymers
Cooperative Research Award Symposium in Honor of Dr.P.S
Chum and Professor Anne Hiltner
Advances in Controlled Drug Delivery
General Papers/New Concepts in Polymeric Materials
Joint PMSE/POLY Poster Session
Notes
Author Index
Section headings
Preface
Chair's Message
3.

図書

図書
American Chemical Society. Division of Polymeric Materials : Science and Engineering ; American Chemical Society
出版情報: [York, PA] : American Chemical Society, 2001  lii, 640 p. ; 28 cm
シリーズ名: ACS Polymeric Materials Science and Engineering ; v. 85
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4.

図書

図書
André M. Striegel, editor ; sponsored by the ACS Divisions of Analytical Chemistry, Polymer Chemistry, Inc., [and] Polymeric Materials, Science and Engineering, Inc
出版情報: Washington, DC : American Chemical Society, c2005  xii, 346 p., [1] leaf of plate ; 24 cm
シリーズ名: ACS symposium series ; 893
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5.

図書

図書
[edited by] Ankur S. Kulshrestha, Anil Mahapatro, Lori A. Henderson ; sponsored by the ACS Division of Polymeric Materials: Science and Engineering
出版情報: Washington DC : American Chemical Society, c2010  x, 269 p. ; 23 cm
シリーズ名: ACS symposium series ; 1054
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6.

図書

図書
Qing Wang,Lei Zhu, editor ; sponsored by the ACS Division of Polymeric Materials: Science and Engineering
出版情報: Washington, DC : American Chemical Society, c2010  xii, 226 p. ; 24 cm
シリーズ名: ACS symposium series ; 1034
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Preface
Nanostructure-Level Modeling of Nonlinear Energy Storage in Polymer-Ceramic Nanocomposites / Jeffrey P. Calame1:
Nanodielectrics for Energy Storage from First Principles Computations / N. Shi ; R. Ramprasad2:
Achieving Fast Discharge and Low Loss in Poly(vinylidene fluoride-co-chlorotrifluoroethylene)-graft-Polystyrene Films by Confined Ferroelectricity / Fanxiao Guan ; Zhongzhe Yuan ; Jing Wang ; Lei Zhu3:
Ferroelectric Polymer Based Nanocomposites for Electrical Energy Storage / Junjun Li ; Paisan Khanchaitit ; Qing Wang4:
Ultrafast IR Spectroscopic Study of Free Carrier Formation in OPV Polymer Blends / Ryan D. Pensack ; Kyle M. Banyas ; John B. Asbury5:
Recent Progress on Highly Efficient Bulk Heterojunction Polymer Solar Cells / Shengqiang Xiao ; Samuel C. Price ; Huaxing Zhou ; Wei You6:
Two Scale Roughness, Self-Cleaning, and Low Reflectivity Silicon Surface for Solar Cell Applications / Yonghao Xiu ; Yan Liu ; C. P. Wong7:
Dispersing and Functionalizing Carbon Nanotubes Using Cojugated Block Copolymers / Jianhua Zou ; Jianhua Liu ; Lei Zhai8:
Quantum Dots in Polymer Films for Light Selectivity / Weili Liu ; Ruigang Liu ; Yong Huang ; William Z. Xu ; Paul A. Charpentier9:
Proton Exchange Membrane Nanocomposites / Michael A. Hickner11:
Nanohybrid Nafion Membranes for Fuel Cells / Antonios Kelarakis ; Rafael Herrera Alonso ; Huiqin Lian ; Engin Burgaz ; Luiz Estevez ; Emmanuel P. Giannelis12:
Degradation Mitigation in PEM Fuel Cells Using Metal NanoParticle and Metal Oxide Additives / Panagiotis Trogadas ; Javier Parrondo ; Vijay Ramani13:
Indexes
Author Index
Subject Index
Preface
Nanostructure-Level Modeling of Nonlinear Energy Storage in Polymer-Ceramic Nanocomposites / Jeffrey P. Calame1:
Nanodielectrics for Energy Storage from First Principles Computations / N. Shi ; R. Ramprasad2:
7.

図書

図書
Peggy Cebe, editor, Benjamin S. Hsiao, editor, David J. Lohse, editor
出版情報: Washington, DC : American Chemical Society, c2000  xii, 558 p. ; 558 cm
シリーズ名: ACS symposium series ; 739
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Preface
Introduction
Introduction to Scattering from Polymers / Peggy Cebe1.:
Scattering Methods
Characteristics of Small-Angle Diffraction Data from Semicrystalline Polymers and Their Analysis in Elliptical Coordinates / N. S. Murthy ; D. T. Grubb ; K. Zero2.:
Analysis of SAXS Fiber Patterns by Means of Projections / N. Stribeck3.:
Studying Polymer Interfaces Using Neutron Reflection / D. G. Bucknall ; S. A. Butler ; J. S. Higgins4.:
Neutron Diffraction by Crystalline Polymers / Yasuhiro Takahashi5.:
Simulation of Melting Transitions in Crystalline Polymers / Lucio Toma ; Juan A. Subirana6.:
Neutron Spin Echo Spectroscopy at the NIST Center for Neutron Research / N. Rosov ; S. Rathgeber ; M. Monkenbusch7.:
Polymer Crystallization and Morphology
Isothermal Thickening and Thinning Processes in Low Molecular Weight Poly(ethylene oxide) Fractions Crystallized from the Melt: Effects of Molecular Configurational Defects on Crystallization, Melting, and Annealing / Er-Qiang Chen ; Song-Wook Lee|cAnqiu Zhang ; Bon-Suk Moon ; Ian Mann ; Frank W. Harris ; Stephen Z. D. Cheng ; Benjamin S. Hsiao ; Fengji Yeh ; Ernst D. von Meerwall8.:
Investigating the Mechanisms of Polymer Crystallization by SAXS Experiments / G. Hauser ; J. Schmidtke ; G. Strobl ; T. Thurn-Albrecht9.:
Simultaneous In-Situ SAXS and WAXS Study of Crystallization and Melting Behavior of Metallocene Isotactic Poly(propylene) / Patrick S. Dai ; Malcolm Capel ; Rufina G. Alamo ; Leo Mandelkern10.:
Lamellar Morphology of Narrow PEEK Fractions Crystallized from the Glassy State and from the Melt / M. Dosiere ; C. Fougnies ; M. H. J. Koch ; J. Roovers11.:
Real-Time Crystallization and Melting Study of Ethylene-Based Copolymers by SAXS, WAXD, and DSC Techniques / Weidong Liu ; Henglin Yang ; Richard S. Stein ; Shengsheng Liu ; Baotong Huang12.:
A Scattering Study of Nucleation Phenomena in Homopolymer Melts / Anthony J. Ryan ; Nicholas J. Terrill ; J. Patrick A. Fairclough13.:
Crystallization and Solid-State Structure of Model Poly(ethylene oxide) Blends / James Runt14.:
Transient Rotator Phase Induced Nucleation in n-Alkanes / E. B. Sirota ; A. B. Herhold15.:
Complex Fluids and Biopolymers
Highly Ordered Supramolecular Structures from Self-Assembly of Ionic Surfactants in Oppositely Charged Polyelectrolyte Gels / Shuiqin Zhou ; Christian Burger ; Benjamin Chu16.:
Some Thermodynamic Considerations of the Lower Disorder-to-Order Transition of Diblock Copolymers / M. Pollard ; O. K. C. Tsui ; T. P. Russell ; A. V. Ruzette ; A. M. Mayes ; Y. Gallot17.:
Analysis of the Structure, Interaction, and Viscosity of Pluronic Micelles in Aqueous Solutions by Combined Neutron and Light Scatterings / Yingchun Liu ; S-H Chen18.:
Optical Probe Study of Solutionlike and Meltlike Solutions of High Molecular Weight Hydroxypropylcellulose / Kiril A. Streletzky ; George D. J. Phillies19.:
SANS Studies of Polymers in Organic Solvents and Supercritical Fluids in the Poor, Theta, and Good Solvent Domains / Y. B. Melnichenko ; E. Kiran ; K. Heath ; S. Salaniwal ; H. D. Cochran ; M. Stamm ; W. A. Van Hook ; G. D. Wignall20.:
Destruction of Short-Range Order in Polycarbonate-Ionomer Blends / Ryan Tucker ; Barbara Gabrys ; Wojciech Zajac ; Ken Andersen ; M. S. Kalhoro ; R. A. Weiss21.:
Scattering from Magnetically Oriented Microtubule Biopolymers / Wim Bras ; Gregory P. Diakun ; Richard C. Denny ; Anthony Gleeson ; Claudio Ferrero ; Yehudi K. Levine ; J. Fernando Diaz22.:
Polymers Under Flow
What Is a Model Liquid Crystalline Polymer Solution?: Solvent Effects on the Flow Behavior of LCP Solutions / S. Chidambaram ; P. D. Butler ; W. A. Hamilton ; M. D. Dadmun23.:
X-ray Scattering Measurements of Molecular Orientation in Thermotropic Liquid Crystalline Polymers under Flow / Wesley R. Burghardt ; Victor M. Ugaz ; David K. Cinader, Jr.24.:
X-ray Rheology of Structured Polymer Melts / Geoffrey R. Mitchell ; Elke M. Andresen25.:
Phase Separation Kinetics during Shear in Compatibilized Polymer Blends / Alan I. Nakatani26.:
Block Copolymers
Ultra-Small-Angle X-ray Scattering and Transmission Electron Microscopy Studies Probing Grain Size of Lamellar Sytrene-Butadiene Block Copolymers / Randall T. Myers ; Alexander Karbach ; Anuj Bellare ; Robert E. Cohen27.:
Block Crystallization in Model Triarm Star Block Copolymers with Two Crystallizable Blocks: A Time-Resolved SAXS-WAXD Study / G. Floudas ; G. Reiter ; O. Lambert ; P. Dumas ; F.-J. Yeh ; B. Chu28.:
Temperature- and Pressure-Induced Microphase Separation Transitions of a Polystyrene-block-Butadiene Copolymer Melt / W. De Odorico ; H. Ladynski29.:
Ordering Kinetics between HEX and BCC Microdomains for SI and SIS Block Copolymers / Hee Hyun Lee ; Jin Kon Kim30.:
SAXS and Rheological Studies on the Order-Disorder and Order-Order Transitions in Mixtures of Polystyrene-b-Polyisoprene-b-Polystyrene and Low Molecular Weight PS / Seung-Heon Lee ; Kookheon Char31.:
Thermoreversible Order-Order Transition between Spherical and Cylindrical Microdomain Structures of Block Copolymer / Kohtaro Kimishima ; Tadanori Koga ; Yuko Kanazawa ; Takeji Hashimoto32.:
Indexes
Author Index
Subject Index
Preface
Introduction
Introduction to Scattering from Polymers / Peggy Cebe1.:
8.

図書

図書
Richard A. Gross, David L. Kaplan, Graham Swift, editor
出版情報: Washington, DC : American Chemical Society, c1998  viii, 216 p. ; 24 cm
シリーズ名: ACS symposium series ; 684
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9.

図書

図書
Alec B. Scranton, editor, Christopher N. Bowman, editor, Robert W. Peiffer, editor
出版情報: Washington, DC : American Chemical Society, c1997  x, 242 p. ; 24 cm
シリーズ名: ACS symposium series ; 673
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Applications of Photopolymer Technology / Robert W. Peiffer1:
Acrylate Systems
Photopolymerization and Electrooptic Properties of Polymer Network/Ferroelectric Liquid-Crystal Composites / C. Allan Guymon ; Lisa A. Dougan ; Christopher N. Bowman2:
Solid-State NMR Spectroscopy for Characterization of Acrylate Reactions / J. Eric Dietz ; Brett A. Cowans ; Robert A. Scott ; Nicholas A. Peppas3:
The Effects of Initiator and Diluent on the Photopolymerizationof 2-Hydroxyethyl Methacrylate and on Properties of Hydrogels Obtained / Yu-Chin Lai ; Edmond T. Quinn4:
Reaction Behavior and Kinetic Modeling Studies of "Living" RadicalPhotopolymerizations / Anandkumar R. Kannurpatti ; Michael D. Goodner ; Hyun R. Lee5:
Light Intensity and Temperature Effect in Photoinitiated Polymerization / C. Decker ; D. Decker ; F. Morel6:
Cationic, Charge-Transfer and Thiol-Ene Systems
Structure and Reactivity Relationships in the Photoinitiated CationicPolymerization of 3,4-Epoxycyclohexylmethyl-3(4(-epoxycyclohexaneCarboxylate / James V. Crivello ; Ulrike Varlemann7:
Effect of Viscosity on the Rate of Photosensitization of DiaryliodoniumSalts by Anthracene / Shailender K. Moorjani ; Bharath Rangarajan ; Alec B. Scranton8:
Alkenyloxstyrene Monomers for High-Temperature Adhesives and Sealants / John Woods ; Maria Masterson ; Ciaran McArdle ; Joe Burke9:
Maleate/Vinyl Ether UV-Cured Coatings: Effects of Composition on Curing and Properties / Gerry K. Noren10:
Photoinitiator Free Polymerization of Maleimides and Vinyl Ethers / Charles E. Hoyle ; Sonny Jonsson ; Makoto Shimose ; Jim Owens ; Per-Erik Sundell11:
UV Cross-Linking of Thiol-ene Polymers: A Rheological Study / Bor-Sen Chiou ; Robert J. English ; Saad A. Khan12:
Emerging Applications
Electrochemical Deposition of Photoresists / K. Chandrasekaran ; M. J. Hill ; W. L. Hamilton ; H. V. Nguyen ; R. W. Collins13:
Photopolymerization of Novel Degradable Networks for OrthopedicApplications / Kristi S. Anseth ; Dina C. Svaldi ; Cato T. Laurencin ; Robert Langer14:
Photopolymerizations of Vinyl Ester: Glass Fiber Composites / L. Scott Coons ; David Godshall15:
Pigmented Coatings Cured with Visible Light / Barbara F. Howell ; Anita de Raaff ; Thomas Marinovii16:
Applications of Photopolymer Technology / Robert W. Peiffer1:
Acrylate Systems
Photopolymerization and Electrooptic Properties of Polymer Network/Ferroelectric Liquid-Crystal Composites / C. Allan Guymon ; Lisa A. Dougan ; Christopher N. Bowman2:
10.

図書

図書
Hiroshi Ito, editor ... [et al.]
出版情報: Washington, DC : American Chemical Society, c1998  xii, 386 p. ; 24 cm
シリーズ名: ACS symposium series ; 706
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Preface
Novel Patterning Chemistry and Processing
Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist / Christopher Harrison ; Miri Park ; Paul M. Chaikin ; Richard A. Register ; Douglas H. Adamson1.:
Inorganic Nanostructures on Surfaces Using Micellar Diblock Copolymer Templates / Joachim P. Spatz ; Thomas Herzog ; Stefan Mossmer ; Paul Ziemann ; Martin Moller2.:
Synthesis of Stereoregular Polymers as Precursors to Highly Conducting Carbon for Use in Applications in Micro- and Nanolithography / C. B. Gorman ; R. W. Vest ; J. L. Snover ; T. L. Utz ; S. A. Serron3.:
Metallization on Poly(tetrafluoroethylene) Substrate by Excimer-Laser-Induced Surface Reaction and Chemical Plating / Hiroyuki Niino ; Akira Yabe4.:
An Inorganic Approach to Photolithography: The Photolithographic Deposition of Dielectric Metal Oxide Films / Ross H. Hill ; Sharon L. Blair5.:
Molding of Polymeric Microstructures / T. Hanemann ; V. Piotter ; R. Ruprecht ; J. H. Hausselt6.:
Microlithographic Chemistry and Processing
Acid Labile Cross-Linked Units: A Concept for Improved Positive Deep-UV Photoresists / H.-T. Schacht ; P. Falcigno ; N. Munzel ; R. Schulz ; A. Medina7.:
Chemistry of Ketal Resist System and Its Lithographic Performance / Wu-Song Huang ; Kim Y. Lee ; Rao Bantu ; Ranee Kwong ; Ahmad Katnani ; Mahmoud Khojasteh ; William Brunsvold ; Steven Holmes ; Ronald Nunes ; Tsuyoshi Shibata ; George Orsula ; James Cameron ; Dominic Yang ; Roger Sinta8.:
Photoacid Diffusion in Chemically Amplified DUV Resists / Toshiro Itani ; Hiroshi Yoshino ; Shuichi Hashimoto ; Mitsuharu Yamana ; Norihiko Samoto ; Kunihiko Kasama9.:
Highly Photosensitive Diazo Compounds as Photoacid Generators for Chemically Amplified Resists / Kieko Harada ; Masahito Kushida ; Kyoichi Saito ; Kazuyuki Sugita ; Hirotada Iida10.:
Exploration of Chemically Amplified Resist Mechanisms and Performance at Small Linewidths / James W. Taylor ; Paul M. Dentinger ; Steven J. Rhyner ; Geoffrey W. Reynolds11.:
The Preparation and Investigation of Macromolecular Architectures for Microlithography by "Living" Free Radical Polymerization / G. G. Barclay ; M. King ; A. Orellana ; P. R. L. Malenfant ; R. Sinta ; E. Malmstrom ; H. Ito ; C. J. Hawker12.:
Acid Proliferation Reactions and Their Application to Chemically Amplified Lithographic Imaging / Kunihiro Ichimura ; Koji Arimitsu ; Soh Noguchi ; Kazuaki Kudo13.:
Advanced Microlithographic Materials Chemistry and Processing
Deprotection Kinetics of Alicyclic Polymer Resist Systems Designed for ArF (193 nm) Lithography / Uzodinma Okoroanyanwu ; Jeffrey D. Byers ; Ti Cao ; Stephen E. Webber ; C. Grant Willson14.:
193 nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives: The Interplay of the Chemical Structure of Components and Lithographic Properties / F. M. Houlihan ; A. Timko ; R. Hutton ; R. Cirelli ; J. M. Kometani ; Elsa Reichmanis ; O. Nalamasu15.:
Synthesis and Evaluation of Alicyclic Backbone Polymers for 193 nm Lithography / Hiroshi Ito ; Norbert Seehof ; Rikiya Sato ; Tomonari Nakayama ; Mitsuru Ueda16.:
Progress in 193-nm Single Layer Resists: The Role of Photoacid Generator Structure on the Performance of Positive Resists / Robert D. Allen ; Juliann Opitz ; Carl E. Larson ; Thomas I. Wallow ; Richard A. DiPietro ; Gregory Breyta ; Ratnam Sooriyakumaran ; Donald C. Hofer17.:
Calixarene and Dendrimer as Novel Photoresist Materials / Osamu Haba ; Daisuke Takahashi ; Kohji Haga ; Yoshimasa Sakai18.:
Calixarene Resists for Nanolithography / Yoshitake Ohnishi ; Naoko Wamme ; Jun-ichi Fujita19.:
Design and Preliminary Studies of Environmentally Enhanced Water-Castable, Water-Developable Positive Tone Resists: Model and Feasibility Studies / Jennifer M. Havard ; Dario Pasini ; Jean M. J. Frechet ; David Medeiros ; Shintario Yamada20:
Molecular Design for New Positive Electron-Beam Resists / Yukio Nagasaki21.:
Lithographic Materials and Processes
The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: Adaption of the Probabilistic Approach / Christopher L. McAdams ; Wang Yueh ; Pavlos Tsiartas ; Dale Hsieh22.:
Photoacid Generating Polymers for Surface Modification Resists / Masamitsu Shirai ; Mitsuho Masuda ; Masahiro Tsunooka ; Masayuki Endo ; Takahiro Matsuo23.:
Material Design and Development for Aqueous Base Compatible High-Performance Deep UV Negative-Tone Resists / Pushkara Rao Varanasi ; Phil Brock ; William R. Brunsvold ; Ahmad D. Katnani24.:
Advanced Chemically Amplified Resist Process Using Non-Ammonia Generating Adhesion Promoter / M. Endo ; A. Katsuyama25.:
Post-Exposure Bake Kinetics in Epoxy Novolac-Based Chemically Amplified Resists / P. Argitis ; S. Boyatzis ; I. Raptis ; N. Glezos ; M. Hatzakis26.:
Alkali-Developable Positive-Photosensitive Polyimide Based on Diazonaphthoquinone Sensitizer / T. Ueno ; Y. Okabe ; T. Miwa ; Y. Maekawa ; G. Rames-Langlade27.:
Author Index
Subject Index
Preface
Novel Patterning Chemistry and Processing
Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist / Christopher Harrison ; Miri Park ; Paul M. Chaikin ; Richard A. Register ; Douglas H. Adamson1.:
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