| 1.
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Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE ... [et al.]
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| 2.
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Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering
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| 3.
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Gilbert V. Shelden, James A. Reynolds., chairs/editors ; sponsored by BACUS
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| 4.
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James A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology
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| 5.
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Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering
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| 6.
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図書
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Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering
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| 7.
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Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--The International Society for Optical Engineering ; supporting societies, The Japan Society of Applied Physics ... [et al.] ; published by SPIE--The International Society for Optical Engineering
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| 8.
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Brian J. Grenon, Frank E. Abboud, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering
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| 9.
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9. Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan
Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan
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| 10.
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Brian J. Grenon, Giang T. Dao,chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering
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