Copper interconnects, new contact metallurgies, structures, and low-k interlevel dielectrics : proceedings of the internatioal symposium | 東京工業大学附属図書館蔵書検索

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Copper interconnects, new contact metallurgies, structures, and low-k interlevel dielectrics : proceedings of the internatioal symposium / editor, G.S. Mathad ; assistant editors, B.C. Baker ... [et al.] ; sponsoring divisions, Dielectric Science and Technology, Electronics, Electrodeposition

資料種別:

図書

出版情報:

Pennington, N.J. : Electrochemical Society, c2003

形態:

ix, 346 p. ; 24 cm

シリーズ名:

Proceedings / [Electrochemical Society] ; v. 2002-22 <BA01323290>

著者名:

International Symposium on Copper Interconnects, New Contact Metallurgies/Structures, and Low-k Interlevel Dielectrics

Mathad, G. S. <DA03249537>

Electrochemical Society. Dielectric Science and Technology Division <DA06421624>

Electrochemical Society. Electronics Division <DA0357072X>

Electrochemical Society. Electrodeposition Division <DA06133470>

Electrochemical Society. Meeting <DA03398898>

さらに 2 件

ISBN:

9781566773799 [1566773792]

書誌ID:

BA62538202

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注記:	"... was held as part of the 202nd Meeting of the Electrochemical Society, Inc., in Salt Lake City, UT, October 20-24, 2002"--on pref Includes bibliographical references and indexes
言語:	英語

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