Preface |
Innovation in material technologies |
Perspectives of SIMOX technology / M.J. Anc |
MBE growth of the top layer in Si/YSZ/Si structure / V.G. Beshenkov ; V.A. Marchenko ; A.G. Znamenskii ; A.F. Vyatkin ; V.S. Avrutin ; N.F. Izyumskaya ; O.A. Soltanovich ; A.G. Akimov ; L.P. Kazanskii |
SiCOI structures. Technology and characterization / C. Serre ; A. Perez-Rodriguez ; A. Romano-Rodriguez ; J.R. Morante ; J. Esteve ; M.C. Acero ; R. Kogler ; W. Skorupa |
New SiC on insulator wafers based on the Smart-Cut approach and their potential applications / J.P. Joly ; B. Aspar ; M. Bruel ; L. Di Cioccio ; F. Letertre ; E. Hugonnard-Bruyere |
ELTRAN (SOI-Epi Wafer) Technology / T. Yonehara ; K. Sakaguchi |
Low dimension properties of nanostructures on ultra thin layers of silicon formed by oxidation of ion cut SOI wafers and electron lithography / V.P. Popov ; A.L. Aseev ; I.V. Antonova ; Yu.V. Nastaushev ; T.A. Gavrilova ; O.V. Naumova ; A.A. Franzusov ; G.N. Feafanov ; V.A. Kolosanov |
Reliability of SOI devices operating at harsh conditions |
SOI for Harsh Environment Applications in the USA / C.A. Colinge |
Performance and reliability of deep submicron SOI MOSFETs in a wide temperature range / F. Balestra |
Strategies for high-temperature electronics: a Western European Perspective / C. Johnston ; A. Crossley |
Charge carrier injection and trapping in the buried oxides of SOI structures / A.N. Nazarov ; V. Kilchytska ; I.P. Barchuk |
Cryogenic investigations of SIMOX buried oxide parameters / V.S. Lysenko ; I.P. Tyagulski ; I.N. Osiyuk ; Y.V. Gomeniuk |
Gate-All-Around Technology for Harsh Environment Applications / J.P. Colinge |
Low-Noise High-Temperature SOI Analog Circuits / V. Dessard ; B. Iniguez ; S. Adriaensen ; D. Flandre |
Influence of [gamma]-radiation on short channel SOI-MOSFETs with thin SiO[subscript 2] films / C. Claeys ; E. Simoen ; V.G. Litovchenko ; A. Evtukh ; A. Efremov ; A. Kizjak ; Ju. Rassamakin |
Radiation effects in SOI magnetic sensitive elements under different radiation conditions / A.D. Mokrushin ; N.M. Omeljanovskaja ; A.V. Leonov ; V.N. Mordkovich ; D.M. Pazhin |
Characterization of advanced SOI materials and devices |
Similarity relation for I-V characteristics of FETs with different channel shape / V.N. Dobrovolsky ; M. Balucani ; A. Ferrari |
Laser-recrystallized SOI layers for sensor applications at cryogenic temperatures / A. Druzhinin ; E. Lavitska ; I. Maryamova ; Y. Khoverko |
Characterization and modeling of advanced SOI materials and devices / F. Allibert ; J. Pretet ; T. Ernst ; J. Jomaah ; S. Cristoloveanu |
Modeling and measurements of generation and recombination currents in thin-film SOI gated-diodes / T.E. Rudenko ; V.I. Kilchytska |
Defect creation mechanisms due to hot-carriers in 0.15 [mu]m SIMOX MOSFETs / P. Dimitrakis ; G.J. Papaioannou |
Defects and their electronic properties in high-pressure-annealed SOI structures sliced by hydrogen / A.K. Gutakovskii ; L.N. Safronov ; I.E. Tyschenko ; S.K. Zhuravlev ; A.B. Talochkin ; A.I. Antonova ; V.I. Obodikov ; A. Misiuk ; J. Bak-Misiuk ; J. Domagala ; A. Romano-Rodrigues ; A. Bachrouri |
DC and AC models of partially-depleted SOI MOSFETs in weak inversion / D. Tomaszewski ; K. Domanski ; L. Lukasiak ; A. Zareba ; J. Gibki ; A. Jakubowski |
Perspectives of SOI structures and devices |
On scaling the thin film Si thickness of SOI substrates. A Perspective on Wafer Bonding for Thin Film Devices / K.D. Hobart ; F.J. Kub ; M.E. Twigg ; M. Fatemi |
Oxidized porous silicon based SOI: untapped resources / V. Bondarenko ; V. Yakovtseva ; L. Dolgyi ; N. Vorozov ; S. Volchek ; G. Lamedica |
Electron-hole pair reversed drift in SOI structure / L.V. Ishchuk ; G.K. Ninidze |
A novel depleted semi-insulating silicon material for high frequency applications / M. Johansson ; S. Bengtsson |
Self-organizing growth of silicon dot- and wire-like microcrystals on isolated substrates / A.I. Klimovskaya ; I.P. Ostrovskii ; A.A. Efremov ; A.V. Sarikov ; S.A. Kostyukevich |
Author Index |
Preface |
Innovation in material technologies |
Perspectives of SIMOX technology / M.J. Anc |
MBE growth of the top layer in Si/YSZ/Si structure / V.G. Beshenkov ; V.A. Marchenko ; A.G. Znamenskii ; A.F. Vyatkin ; V.S. Avrutin ; N.F. Izyumskaya ; O.A. Soltanovich ; A.G. Akimov ; L.P. Kazanskii |
SiCOI structures. Technology and characterization / C. Serre ; A. Perez-Rodriguez ; A. Romano-Rodriguez ; J.R. Morante ; J. Esteve ; M.C. Acero ; R. Kogler ; W. Skorupa |
New SiC on insulator wafers based on the Smart-Cut approach and their potential applications / J.P. Joly ; B. Aspar ; M. Bruel ; L. Di Cioccio ; F. Letertre ; E. Hugonnard-Bruyere |