Developments in semiconductor microlithography, June 1-3, 1976, San Jose, California / Donald E. Routh ... [et al.], editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid Microelectronics
- 資料種別:
- 図書
- 出版情報:
- Palos Verdes Estates, Calif. : Society of Photo-optical Instrumentation Engineers, c1976
- 形態:
- vi, 146 p. ; 28 cm
- シリーズ名:
- Proceedings of the Society of Photo-Optical Instrumentation Engineers ; v. 80 <BA0118856X>
- 著者名:
- ISBN:
- 9780892521074 [0892521074]
- 書誌ID:
- BA23913119
類似資料:
S.P.I.E.-- the Society of Photo-optical Instrumentation Engineers | |
S.P.I.E.-- Society of Photo-optical Instrumentation Engineers | |
SPIE, the International Society for Optical Engineering | |