Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A. / editors, H.R. Huff ... [et al.]
- 資料種別:
- 図書
- 出版情報:
- Warrendale, PA : Materials Research Society, 1999
- 形態:
- xvii, 615 p. ; 24 cm
- シリーズ名:
- Materials Research Society symposium proceedings ; v. 567 <BA00013775>
- 著者名:
- ISBN:
- 9781558994744 [1558994742]
- 書誌ID:
- BA43280580
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