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図書

図書
Hiroshi Ito, editor ... [et al.]
出版情報: Washington, DC : American Chemical Society, c1998  xii, 386 p. ; 24 cm
シリーズ名: ACS symposium series ; 706
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Preface
Novel Patterning Chemistry and Processing
Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist / Christopher Harrison ; Miri Park ; Paul M. Chaikin ; Richard A. Register ; Douglas H. Adamson1.:
Inorganic Nanostructures on Surfaces Using Micellar Diblock Copolymer Templates / Joachim P. Spatz ; Thomas Herzog ; Stefan Mossmer ; Paul Ziemann ; Martin Moller2.:
Synthesis of Stereoregular Polymers as Precursors to Highly Conducting Carbon for Use in Applications in Micro- and Nanolithography / C. B. Gorman ; R. W. Vest ; J. L. Snover ; T. L. Utz ; S. A. Serron3.:
Metallization on Poly(tetrafluoroethylene) Substrate by Excimer-Laser-Induced Surface Reaction and Chemical Plating / Hiroyuki Niino ; Akira Yabe4.:
An Inorganic Approach to Photolithography: The Photolithographic Deposition of Dielectric Metal Oxide Films / Ross H. Hill ; Sharon L. Blair5.:
Molding of Polymeric Microstructures / T. Hanemann ; V. Piotter ; R. Ruprecht ; J. H. Hausselt6.:
Microlithographic Chemistry and Processing
Acid Labile Cross-Linked Units: A Concept for Improved Positive Deep-UV Photoresists / H.-T. Schacht ; P. Falcigno ; N. Munzel ; R. Schulz ; A. Medina7.:
Chemistry of Ketal Resist System and Its Lithographic Performance / Wu-Song Huang ; Kim Y. Lee ; Rao Bantu ; Ranee Kwong ; Ahmad Katnani ; Mahmoud Khojasteh ; William Brunsvold ; Steven Holmes ; Ronald Nunes ; Tsuyoshi Shibata ; George Orsula ; James Cameron ; Dominic Yang ; Roger Sinta8.:
Photoacid Diffusion in Chemically Amplified DUV Resists / Toshiro Itani ; Hiroshi Yoshino ; Shuichi Hashimoto ; Mitsuharu Yamana ; Norihiko Samoto ; Kunihiko Kasama9.:
Highly Photosensitive Diazo Compounds as Photoacid Generators for Chemically Amplified Resists / Kieko Harada ; Masahito Kushida ; Kyoichi Saito ; Kazuyuki Sugita ; Hirotada Iida10.:
Exploration of Chemically Amplified Resist Mechanisms and Performance at Small Linewidths / James W. Taylor ; Paul M. Dentinger ; Steven J. Rhyner ; Geoffrey W. Reynolds11.:
The Preparation and Investigation of Macromolecular Architectures for Microlithography by "Living" Free Radical Polymerization / G. G. Barclay ; M. King ; A. Orellana ; P. R. L. Malenfant ; R. Sinta ; E. Malmstrom ; H. Ito ; C. J. Hawker12.:
Acid Proliferation Reactions and Their Application to Chemically Amplified Lithographic Imaging / Kunihiro Ichimura ; Koji Arimitsu ; Soh Noguchi ; Kazuaki Kudo13.:
Advanced Microlithographic Materials Chemistry and Processing
Deprotection Kinetics of Alicyclic Polymer Resist Systems Designed for ArF (193 nm) Lithography / Uzodinma Okoroanyanwu ; Jeffrey D. Byers ; Ti Cao ; Stephen E. Webber ; C. Grant Willson14.:
193 nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives: The Interplay of the Chemical Structure of Components and Lithographic Properties / F. M. Houlihan ; A. Timko ; R. Hutton ; R. Cirelli ; J. M. Kometani ; Elsa Reichmanis ; O. Nalamasu15.:
Synthesis and Evaluation of Alicyclic Backbone Polymers for 193 nm Lithography / Hiroshi Ito ; Norbert Seehof ; Rikiya Sato ; Tomonari Nakayama ; Mitsuru Ueda16.:
Progress in 193-nm Single Layer Resists: The Role of Photoacid Generator Structure on the Performance of Positive Resists / Robert D. Allen ; Juliann Opitz ; Carl E. Larson ; Thomas I. Wallow ; Richard A. DiPietro ; Gregory Breyta ; Ratnam Sooriyakumaran ; Donald C. Hofer17.:
Calixarene and Dendrimer as Novel Photoresist Materials / Osamu Haba ; Daisuke Takahashi ; Kohji Haga ; Yoshimasa Sakai18.:
Calixarene Resists for Nanolithography / Yoshitake Ohnishi ; Naoko Wamme ; Jun-ichi Fujita19.:
Design and Preliminary Studies of Environmentally Enhanced Water-Castable, Water-Developable Positive Tone Resists: Model and Feasibility Studies / Jennifer M. Havard ; Dario Pasini ; Jean M. J. Frechet ; David Medeiros ; Shintario Yamada20:
Molecular Design for New Positive Electron-Beam Resists / Yukio Nagasaki21.:
Lithographic Materials and Processes
The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: Adaption of the Probabilistic Approach / Christopher L. McAdams ; Wang Yueh ; Pavlos Tsiartas ; Dale Hsieh22.:
Photoacid Generating Polymers for Surface Modification Resists / Masamitsu Shirai ; Mitsuho Masuda ; Masahiro Tsunooka ; Masayuki Endo ; Takahiro Matsuo23.:
Material Design and Development for Aqueous Base Compatible High-Performance Deep UV Negative-Tone Resists / Pushkara Rao Varanasi ; Phil Brock ; William R. Brunsvold ; Ahmad D. Katnani24.:
Advanced Chemically Amplified Resist Process Using Non-Ammonia Generating Adhesion Promoter / M. Endo ; A. Katsuyama25.:
Post-Exposure Bake Kinetics in Epoxy Novolac-Based Chemically Amplified Resists / P. Argitis ; S. Boyatzis ; I. Raptis ; N. Glezos ; M. Hatzakis26.:
Alkali-Developable Positive-Photosensitive Polyimide Based on Diazonaphthoquinone Sensitizer / T. Ueno ; Y. Okabe ; T. Miwa ; Y. Maekawa ; G. Rames-Langlade27.:
Author Index
Subject Index
Preface
Novel Patterning Chemistry and Processing
Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist / Christopher Harrison ; Miri Park ; Paul M. Chaikin ; Richard A. Register ; Douglas H. Adamson1.:
2.

図書

図書
Muthu B.J. Wijesundara, Robert G. Azevedo
出版情報: New York : Springer, c2011  xv, 232 p. ; 25 cm
シリーズ名: MEMS reference shelf
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3.

図書

図書
C.R.M. Grovenor
出版情報: Bristol ; Philadelphia : A. Hilger, c1989  x, 544 p. ; 24 cm
シリーズ名: Graduate student series in materials science and engineering
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4.

図書

図書
David S. Soane and Zoya Martynenko
出版情報: Amsterdam ; Tokyo : Elsevier Science Publishers, 1989  xiv, 308 p. ; 25 cm
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5.

図書

図書
edited by D.M. Rowe
出版情報: Boca Raton : CRC/Taylor & Francis, 2006  1 v. (various pagings) ; 27 cm
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