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1.

図書

図書
Hiroshi Ito, editor ... [et al.]
出版情報: Washington, DC : American Chemical Society, c1998  xii, 386 p. ; 24 cm
シリーズ名: ACS symposium series ; 706
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目次情報: 続きを見る
Preface
Novel Patterning Chemistry and Processing
Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist / Christopher Harrison ; Miri Park ; Paul M. Chaikin ; Richard A. Register ; Douglas H. Adamson1.:
Inorganic Nanostructures on Surfaces Using Micellar Diblock Copolymer Templates / Joachim P. Spatz ; Thomas Herzog ; Stefan Mossmer ; Paul Ziemann ; Martin Moller2.:
Synthesis of Stereoregular Polymers as Precursors to Highly Conducting Carbon for Use in Applications in Micro- and Nanolithography / C. B. Gorman ; R. W. Vest ; J. L. Snover ; T. L. Utz ; S. A. Serron3.:
Metallization on Poly(tetrafluoroethylene) Substrate by Excimer-Laser-Induced Surface Reaction and Chemical Plating / Hiroyuki Niino ; Akira Yabe4.:
An Inorganic Approach to Photolithography: The Photolithographic Deposition of Dielectric Metal Oxide Films / Ross H. Hill ; Sharon L. Blair5.:
Molding of Polymeric Microstructures / T. Hanemann ; V. Piotter ; R. Ruprecht ; J. H. Hausselt6.:
Microlithographic Chemistry and Processing
Acid Labile Cross-Linked Units: A Concept for Improved Positive Deep-UV Photoresists / H.-T. Schacht ; P. Falcigno ; N. Munzel ; R. Schulz ; A. Medina7.:
Chemistry of Ketal Resist System and Its Lithographic Performance / Wu-Song Huang ; Kim Y. Lee ; Rao Bantu ; Ranee Kwong ; Ahmad Katnani ; Mahmoud Khojasteh ; William Brunsvold ; Steven Holmes ; Ronald Nunes ; Tsuyoshi Shibata ; George Orsula ; James Cameron ; Dominic Yang ; Roger Sinta8.:
Photoacid Diffusion in Chemically Amplified DUV Resists / Toshiro Itani ; Hiroshi Yoshino ; Shuichi Hashimoto ; Mitsuharu Yamana ; Norihiko Samoto ; Kunihiko Kasama9.:
Highly Photosensitive Diazo Compounds as Photoacid Generators for Chemically Amplified Resists / Kieko Harada ; Masahito Kushida ; Kyoichi Saito ; Kazuyuki Sugita ; Hirotada Iida10.:
Exploration of Chemically Amplified Resist Mechanisms and Performance at Small Linewidths / James W. Taylor ; Paul M. Dentinger ; Steven J. Rhyner ; Geoffrey W. Reynolds11.:
The Preparation and Investigation of Macromolecular Architectures for Microlithography by "Living" Free Radical Polymerization / G. G. Barclay ; M. King ; A. Orellana ; P. R. L. Malenfant ; R. Sinta ; E. Malmstrom ; H. Ito ; C. J. Hawker12.:
Acid Proliferation Reactions and Their Application to Chemically Amplified Lithographic Imaging / Kunihiro Ichimura ; Koji Arimitsu ; Soh Noguchi ; Kazuaki Kudo13.:
Advanced Microlithographic Materials Chemistry and Processing
Deprotection Kinetics of Alicyclic Polymer Resist Systems Designed for ArF (193 nm) Lithography / Uzodinma Okoroanyanwu ; Jeffrey D. Byers ; Ti Cao ; Stephen E. Webber ; C. Grant Willson14.:
193 nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives: The Interplay of the Chemical Structure of Components and Lithographic Properties / F. M. Houlihan ; A. Timko ; R. Hutton ; R. Cirelli ; J. M. Kometani ; Elsa Reichmanis ; O. Nalamasu15.:
Synthesis and Evaluation of Alicyclic Backbone Polymers for 193 nm Lithography / Hiroshi Ito ; Norbert Seehof ; Rikiya Sato ; Tomonari Nakayama ; Mitsuru Ueda16.:
Progress in 193-nm Single Layer Resists: The Role of Photoacid Generator Structure on the Performance of Positive Resists / Robert D. Allen ; Juliann Opitz ; Carl E. Larson ; Thomas I. Wallow ; Richard A. DiPietro ; Gregory Breyta ; Ratnam Sooriyakumaran ; Donald C. Hofer17.:
Calixarene and Dendrimer as Novel Photoresist Materials / Osamu Haba ; Daisuke Takahashi ; Kohji Haga ; Yoshimasa Sakai18.:
Calixarene Resists for Nanolithography / Yoshitake Ohnishi ; Naoko Wamme ; Jun-ichi Fujita19.:
Design and Preliminary Studies of Environmentally Enhanced Water-Castable, Water-Developable Positive Tone Resists: Model and Feasibility Studies / Jennifer M. Havard ; Dario Pasini ; Jean M. J. Frechet ; David Medeiros ; Shintario Yamada20:
Molecular Design for New Positive Electron-Beam Resists / Yukio Nagasaki21.:
Lithographic Materials and Processes
The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: Adaption of the Probabilistic Approach / Christopher L. McAdams ; Wang Yueh ; Pavlos Tsiartas ; Dale Hsieh22.:
Photoacid Generating Polymers for Surface Modification Resists / Masamitsu Shirai ; Mitsuho Masuda ; Masahiro Tsunooka ; Masayuki Endo ; Takahiro Matsuo23.:
Material Design and Development for Aqueous Base Compatible High-Performance Deep UV Negative-Tone Resists / Pushkara Rao Varanasi ; Phil Brock ; William R. Brunsvold ; Ahmad D. Katnani24.:
Advanced Chemically Amplified Resist Process Using Non-Ammonia Generating Adhesion Promoter / M. Endo ; A. Katsuyama25.:
Post-Exposure Bake Kinetics in Epoxy Novolac-Based Chemically Amplified Resists / P. Argitis ; S. Boyatzis ; I. Raptis ; N. Glezos ; M. Hatzakis26.:
Alkali-Developable Positive-Photosensitive Polyimide Based on Diazonaphthoquinone Sensitizer / T. Ueno ; Y. Okabe ; T. Miwa ; Y. Maekawa ; G. Rames-Langlade27.:
Author Index
Subject Index
Preface
Novel Patterning Chemistry and Processing
Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist / Christopher Harrison ; Miri Park ; Paul M. Chaikin ; Richard A. Register ; Douglas H. Adamson1.:
2.

図書

図書
C.R.M. Grovenor
出版情報: Bristol ; Philadelphia : A. Hilger, c1989  x, 544 p. ; 24 cm
シリーズ名: Graduate student series in materials science and engineering
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3.

図書

図書
edited by D.M. Rowe
出版情報: Boca Raton : CRC/Taylor & Francis, 2006  1 v. (various pagings) ; 27 cm
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4.

図書

図書
Muthu B.J. Wijesundara, Robert G. Azevedo
出版情報: New York : Springer, c2011  xv, 232 p. ; 25 cm
シリーズ名: MEMS reference shelf
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5.

図書

図書
David S. Soane and Zoya Martynenko
出版情報: Amsterdam ; Tokyo : Elsevier Science Publishers, 1989  xiv, 308 p. ; 25 cm
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6.

電子ブック

EB
Dennis W. Hess, editor, Klavs F. Jensen, editor
出版情報: [S.l.] : ACS Publications  1 online resource (xiv, 547 p.)
シリーズ名: Advances in chemistry series ; 221
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目次情報: 続きを見る
Microelectronics Processing
Theory of Transport Processes in Semiconductor Crystal Growth from the Melt
Liquid-Phase Epitaxy and Phase Diagrams of Compound Semiconductors
Physical Vapor Deposition Reactors
Chemical Vapor Deposition
Diffusion and Oxidation of Silicon
Resists in Microlithography
Plasma-Enhanced Etching and Deposition
Interconnection and Packaging of High-Performance Integrated Circuits
Semiconductor Processing Problems Solved by Wet (Solution) Chemistry
Microelectronics Processing
Theory of Transport Processes in Semiconductor Crystal Growth from the Melt
Liquid-Phase Epitaxy and Phase Diagrams of Compound Semiconductors
7.

電子ブック

EB
John H. Lupinski, editor, Robert S. Moore, editor
出版情報: [S.l.] : ACS Publications  1 online resource (xi, 499 p.)
シリーズ名: ACS symposium series ; 407
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目次情報: 続きを見る
Polymeric Materials for Electronics
Packaging and Interconnection: An Overview Cure
Studies of PMDA-ODA- and BTDA-ODA-Based
Polyimides by Fluorescence Spectroscopy Dynamic
Fourier Transform-IR Analysis of Cure
Reactions and Kinetics of Polyimides
Polyimide Hydrolysis: Measurement by Fourier
Transform-IR Spectroscopy Dielectric
Characterization of Water in Polyimide and Poly(amide-imide)
Thin Films Calculated Final-State Effects of the PMDA-ODA
Polyimide X-Ray Photoemission Spectrum
Effect of Diamic Acid Additives on Dielectric
Constants of Polyimides Organic Dielectrics with Reduced
Moisture Absorption and Improved
Electrical Properties Synthesis and Characterization of the t-Butyl
Ester of the Oxdianiline-Pyromellitic Dianhydride
Polyamic Acid Curing of Binary
Mixtures of Polymides Polyimides for Dielectric Layers
Siloxane Polyimides for Interlayer
Dielectric Applications Electrophoretic
Deposition of Polyimides: Electrocoating on the Cathode Accelerated
Testing of Polyimide Coatings for Neural
Prostheses Conduction Transients in Polyimides Polymer
Insulating Layers for Multilayer Hybrid Circuits
Fabrication and Properties of Thermoset Films
Derived from Bis-Benzocyclobutene for Multilayer
Applications Synthesis of Poly(arylene ether phenylquinoxaline)
High-Performance Silicone Gel for Packaging of Devices with Very Large
Scale Integration (VLSI) Modeling of Triple-Track and Comb-Pattern
Leakage Current Measurements Silicone Gels and Coatings for Integrated-Circuit
Packaging Ultraviolet-Curable Silicones for Integrated-Circuit
Protection Moisture Transport Phenomena in Epoxies for Microelectronics
Applications Heterogeneous Conduction Processes in Integrated-Circuit
Encapsulation Novel Coatings That Maintain Low Surface-Water
Concentrations Thermal Stress in Epoxy Molding
Compounds and Packaged Devices
Characterization of Stresses in Polymer Films for Microelectronics
Applications Stress Factors in Molding
Compounds New Transfer Molding
Compounds Chemistry of Stable
Brominated Epoxies Performance of Stable Brominated
Epoxies in Encapsulants for Microelectronic
Devices New Polymeric Materials for Electronics Packaging
Degradation of Brominated
Epoxy Resin and Effects on Integrated-Circuit-Device Wirebonds
Enhancement of Gold-Aluminum Wirebond
Reliability in Plastic Encapsulated Very Large Scale
Integration (VLSI) Devices Through C-Br Bond Stabilization Ordered
Polymers for Interconnection Substrates
Three-Dimensional Circuit Interconnections with Thermoplastic
Performance Polymers Significance of Developments in New Substrate Materials
Polymeric Materials for Electronics
Packaging and Interconnection: An Overview Cure
Studies of PMDA-ODA- and BTDA-ODA-Based
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