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1.

図書

図書
edited by Yuanzhi Wang
出版情報: Stafa-Zurich : Trans Tech Publications, c2011  xvi, 611 p. ; 25 cm
シリーズ名: Applied mechanics and materials ; v. 39
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2.

図書

図書
editors: Qinghuang Lin ... [et al.]
出版情報: Warrendale, Pa. : Materials Research Society, c2007  xiv, 338 p. ; 24 cm
シリーズ名: Materials Research Society symposium proceedings ; v. 990
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3.

図書

図書
editors, David G. Seiler ... [et al.] ; sponsoring organizations, National Institute of Standards and Technology ... [et al.]
出版情報: Melville, New York : American Institute of Physics, 2007  xiii, 578 p. ; 28 cm.
シリーズ名: AIP conference proceedings ; 931
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4.

図書

図書
editors, Harold Hwang ... [et al.]
出版情報: Warrendale, Pa. : Materials Research Society , Cambridge : Cambridge University Press, 2011  ix, 157 p. ; 24 cm
シリーズ名: Materials Research Society symposium proceedings ; v. 1292
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目次情報: 続きを見る
Ferroelectric Oxides / Part I:
Structural and ferroelectric properties of large c/a phase bismuth ferrite thin films prepared by ion beam sputtering / Seiji Nakashima1:
Dielectric properties of BST/(Y2O3)x(ZrO2)1-x/BST trilayer films / Santosh Sahoo2:
Coupling of defect fields to domains and phase transition characteristics of ferroelectric thin films with charged defects / Ibrahim Misirlioglu3:
Polarization dependence and relaxation of the current in polycrystalline ferroelectric Pb(ZrTi)O3 film / Liubov Delimova4:
Template-assisted fabrication of double-shelled nanotubes composed of inner shell Pb(Zr0.52Ti0.48)O3 and outer shell TiO2 by sol-gel process with spin-coating technique / Sang Don Bu5:
Magnetization effects in bulk YFeO3 and their dependency on electric field strength and temperature as a basis for thin film investigation of multiferroic technology / Adam Hinckley6:
Electron Transport through Oxide Junctions / Part II:
Electronic states and magnetic coupling in Fe/Fe3O4 junctions / Junichiro Inoue7:
Tunneling currents in nanoscale high-K MOS structures / Andres Vercik8:
Fabrication of semi-transparent resistive random access memory and its characteristics of nonvolatile resistive switching / Jung Won Seo9:
Vanadium Dioxide / Part III:
Epitaxial growth of V2O3 on Al2O3 by reactive MBE / Leander Dillemans10:
Lattice-symmetry-driven phase competition in vanadium dioxide / Alexander Tselev11:
Twin-domain epitaxial growth and metal-insulator transition of VO2 thin film on c-plane sapphire / Zhaoyang Fan12:
Binary Oxides / Part IV:
Structural, optical and magnetic properties of Co-doped ZnO nanopowders / Segundo JÃíuregui Rosas13:
Preparation of the CrO2 thin films using a Cr8O21 precursor / Yuji Muraoka14:
Dispersed nanoelectrodes for high performance gas sensors / Antonio Tricoli15:
Template-free, low temperature synthesis of binary and ternary metal oxide nanostructures / Sanjaya Brahma16:
In-situ solution processed room temperature ferromagnetic MgO thin films printed by inkjet technique / Yan Wu17:
Effects of argon to oxygen ratio and post annealing on R.F. sputtered SnO2 thin film for ethylene gas detection / Dong-Joo Kim18:
The effect of oxygen partial pressure during deposition in the magnetic properties of ZnO thin film / Anis Biswas19:
Growth of Ternary Oxides / Part V:
Growth of CaFeOX/LaFeO3 superlattice on SrTiO3(100) substrates / Nobuyuki Iwata20:
Preparation and characterization of the single-layered cobaltate La2-xCaxCoO4 / Dirk Fuchs21:
Crystalline orientation of PbTiO3 nanorods grown by MOCVD using ZnO nanorods as a template / Hironori Fujisawa22:
PEG-assisted hydrothermal synthesis and photocatalytic activity of Bi2Fe4O9 crystallites / Dengrong Cai23:
Noncontact electrical diagnostics of barium strontium titanate (BST) thin films / Andrew Hoff24:
Ferroelectric Oxides / Part I:
Structural and ferroelectric properties of large c/a phase bismuth ferrite thin films prepared by ion beam sputtering / Seiji Nakashima1:
Dielectric properties of BST/(Y2O3)x(ZrO2)1-x/BST trilayer films / Santosh Sahoo2:
5.

図書

図書
edited by Yuanzhi Wang
出版情報: Durnten-Zurich : Trans Tech Publications, c2014  x, 289 p. ; 24 cm
シリーズ名: Applied mechanics and materials ; v. 481
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6.

図書

図書
editors, Mikhail R. Baklanov ... [et al.]
出版情報: Warrendale, Pa. : Materials Research Society , Cambridge ; New York : Cambridge University Press, 2012  ix, 127 p. ; 24 cm
シリーズ名: Materials Research Society symposium proceedings ; v. 1335
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目次情報: 続きを見る
Low-k Materials / Part I:
Ultra low-k materials based on self-assembled organic polymers / Marianna Pantouvaki1:
New designs of hydrophobic and mesostructured ultra low k materials with isolated mesopores / Anthony Grunenwald2:
Evaluation of ultra-thin layer fabricated by wet-process as a pore-seal for porous low-k films / Shoko Ono3:
Ozone treatment on nanoporous ultralow dielectric materials to optimize their mechanical and dielectrical properties / Hee-Woo Rhee4:
Integration / Part II:
Optimizing stressor film deposition sequence in polish rate order for best planarization / John H. Zhang5:
Effect of chemical solutions and surface wettability on the stability of advanced porous low-k materials / Quoc Toan Le6:
A less damaging patterning regime for a successful integration of ultra low-k materials in modern nanoelectronic devices / Sven Zimmermann7:
Defects in low-ĸ insulators (ĸ=2.5âÇô2.0): ESR analysis and charge injection / Valeri Afanas'ev8:
Patterning organic fluorescent molecules with SAM patterns / Nan Lu9:
Optical interconnect technologies based on silicon photonics / Wim Bogaerts10:
Metallization / Part III:
32nm node highly reliable Cu/low-k integration technology with CuMn alloy seed / Shaoning Yao11:
Amorphous Ta-N as a diffusion barrier for Cu metallization / Neda Dalili12:
Comparison of TiN thin films grown on SiO2 by reactive dc magnetron sputtering and high power impulse magnetron sputtering / Jon Gudmundsson13:
Specific contact resistance of ohmic contacts on n-type SiC membranes / Patrick Leech14:
Development of electrochemical copper deposition screening methodologies for next generation additive selection / Kevin Ryan15:
3D Packaging / Part IV:
Microbump impact on reliability and performance in through-silicon via stacks / Aditya Karmarkar16:
Tailoring the crystallographic texture and electrical properties of inkjet-printed interconnects for use in microelectronics / Romain Cauchois17:
Low-k Materials / Part I:
Ultra low-k materials based on self-assembled organic polymers / Marianna Pantouvaki1:
New designs of hydrophobic and mesostructured ultra low k materials with isolated mesopores / Anthony Grunenwald2:
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