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1.

図書

図書
edited by Nicholas P. Cheremisinoff
出版情報: New York : Marcel Dekker, c1997  xii, 881 p. ; 29 cm
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目次情報: 続きを見る
Artificial neural networks as a semi-empirical modelling tool for physical property predictions in polymer science
new generation high performance polymers by displacement polymerization
acrylamide polymers
transparent polyolefins
the polyolefins stabilizers with intramolecular synergism
high-temperature stabilization of polyolefins
poly(malic acid) from natural sources
stabilization of polyolefins
gamma radiation induced preparation of polyelectrolytes and its use for waste
Artificial neural networks as a semi-empirical modelling tool for physical property predictions in polymer science
new generation high performance polymers by displacement polymerization
acrylamide polymers
2.

図書

図書
Hiroshi Ito, editor ... [et al.]
出版情報: Washington, DC : American Chemical Society, c1998  xii, 386 p. ; 24 cm
シリーズ名: ACS symposium series ; 706
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目次情報: 続きを見る
Preface
Novel Patterning Chemistry and Processing
Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist / Christopher Harrison ; Miri Park ; Paul M. Chaikin ; Richard A. Register ; Douglas H. Adamson1.:
Inorganic Nanostructures on Surfaces Using Micellar Diblock Copolymer Templates / Joachim P. Spatz ; Thomas Herzog ; Stefan Mossmer ; Paul Ziemann ; Martin Moller2.:
Synthesis of Stereoregular Polymers as Precursors to Highly Conducting Carbon for Use in Applications in Micro- and Nanolithography / C. B. Gorman ; R. W. Vest ; J. L. Snover ; T. L. Utz ; S. A. Serron3.:
Metallization on Poly(tetrafluoroethylene) Substrate by Excimer-Laser-Induced Surface Reaction and Chemical Plating / Hiroyuki Niino ; Akira Yabe4.:
An Inorganic Approach to Photolithography: The Photolithographic Deposition of Dielectric Metal Oxide Films / Ross H. Hill ; Sharon L. Blair5.:
Molding of Polymeric Microstructures / T. Hanemann ; V. Piotter ; R. Ruprecht ; J. H. Hausselt6.:
Microlithographic Chemistry and Processing
Acid Labile Cross-Linked Units: A Concept for Improved Positive Deep-UV Photoresists / H.-T. Schacht ; P. Falcigno ; N. Munzel ; R. Schulz ; A. Medina7.:
Chemistry of Ketal Resist System and Its Lithographic Performance / Wu-Song Huang ; Kim Y. Lee ; Rao Bantu ; Ranee Kwong ; Ahmad Katnani ; Mahmoud Khojasteh ; William Brunsvold ; Steven Holmes ; Ronald Nunes ; Tsuyoshi Shibata ; George Orsula ; James Cameron ; Dominic Yang ; Roger Sinta8.:
Photoacid Diffusion in Chemically Amplified DUV Resists / Toshiro Itani ; Hiroshi Yoshino ; Shuichi Hashimoto ; Mitsuharu Yamana ; Norihiko Samoto ; Kunihiko Kasama9.:
Highly Photosensitive Diazo Compounds as Photoacid Generators for Chemically Amplified Resists / Kieko Harada ; Masahito Kushida ; Kyoichi Saito ; Kazuyuki Sugita ; Hirotada Iida10.:
Exploration of Chemically Amplified Resist Mechanisms and Performance at Small Linewidths / James W. Taylor ; Paul M. Dentinger ; Steven J. Rhyner ; Geoffrey W. Reynolds11.:
The Preparation and Investigation of Macromolecular Architectures for Microlithography by "Living" Free Radical Polymerization / G. G. Barclay ; M. King ; A. Orellana ; P. R. L. Malenfant ; R. Sinta ; E. Malmstrom ; H. Ito ; C. J. Hawker12.:
Acid Proliferation Reactions and Their Application to Chemically Amplified Lithographic Imaging / Kunihiro Ichimura ; Koji Arimitsu ; Soh Noguchi ; Kazuaki Kudo13.:
Advanced Microlithographic Materials Chemistry and Processing
Deprotection Kinetics of Alicyclic Polymer Resist Systems Designed for ArF (193 nm) Lithography / Uzodinma Okoroanyanwu ; Jeffrey D. Byers ; Ti Cao ; Stephen E. Webber ; C. Grant Willson14.:
193 nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives: The Interplay of the Chemical Structure of Components and Lithographic Properties / F. M. Houlihan ; A. Timko ; R. Hutton ; R. Cirelli ; J. M. Kometani ; Elsa Reichmanis ; O. Nalamasu15.:
Synthesis and Evaluation of Alicyclic Backbone Polymers for 193 nm Lithography / Hiroshi Ito ; Norbert Seehof ; Rikiya Sato ; Tomonari Nakayama ; Mitsuru Ueda16.:
Progress in 193-nm Single Layer Resists: The Role of Photoacid Generator Structure on the Performance of Positive Resists / Robert D. Allen ; Juliann Opitz ; Carl E. Larson ; Thomas I. Wallow ; Richard A. DiPietro ; Gregory Breyta ; Ratnam Sooriyakumaran ; Donald C. Hofer17.:
Calixarene and Dendrimer as Novel Photoresist Materials / Osamu Haba ; Daisuke Takahashi ; Kohji Haga ; Yoshimasa Sakai18.:
Calixarene Resists for Nanolithography / Yoshitake Ohnishi ; Naoko Wamme ; Jun-ichi Fujita19.:
Design and Preliminary Studies of Environmentally Enhanced Water-Castable, Water-Developable Positive Tone Resists: Model and Feasibility Studies / Jennifer M. Havard ; Dario Pasini ; Jean M. J. Frechet ; David Medeiros ; Shintario Yamada20:
Molecular Design for New Positive Electron-Beam Resists / Yukio Nagasaki21.:
Lithographic Materials and Processes
The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: Adaption of the Probabilistic Approach / Christopher L. McAdams ; Wang Yueh ; Pavlos Tsiartas ; Dale Hsieh22.:
Photoacid Generating Polymers for Surface Modification Resists / Masamitsu Shirai ; Mitsuho Masuda ; Masahiro Tsunooka ; Masayuki Endo ; Takahiro Matsuo23.:
Material Design and Development for Aqueous Base Compatible High-Performance Deep UV Negative-Tone Resists / Pushkara Rao Varanasi ; Phil Brock ; William R. Brunsvold ; Ahmad D. Katnani24.:
Advanced Chemically Amplified Resist Process Using Non-Ammonia Generating Adhesion Promoter / M. Endo ; A. Katsuyama25.:
Post-Exposure Bake Kinetics in Epoxy Novolac-Based Chemically Amplified Resists / P. Argitis ; S. Boyatzis ; I. Raptis ; N. Glezos ; M. Hatzakis26.:
Alkali-Developable Positive-Photosensitive Polyimide Based on Diazonaphthoquinone Sensitizer / T. Ueno ; Y. Okabe ; T. Miwa ; Y. Maekawa ; G. Rames-Langlade27.:
Author Index
Subject Index
Preface
Novel Patterning Chemistry and Processing
Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist / Christopher Harrison ; Miri Park ; Paul M. Chaikin ; Richard A. Register ; Douglas H. Adamson1.:
3.

図書

図書
J.E. Mark, editor, C.Y-C Lee, editor, P.A. Bianconi, editor
出版情報: Washington, D.C. : American Chemical Society, 1995  xi, 378 p. ; 24 cm
シリーズ名: ACS symposium series ; 585
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4.

図書

図書
A. A. Berlin ... [et al.] ; [editors, G. Henrici-Olivé, S. Olivé]
出版情報: Berlin ; New York : Springer-Verlag, c1986  x, 124 p. ; 25 cm
シリーズ名: Polymers, properties and applications ; 10
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5.

図書

図書
edited by Güneri Akovali
出版情報: Dordrecht ; Boston : Kluwer Academic, c1993  xvii, 455 p. ; 25 cm
シリーズ名: NATO ASI series ; ser.E . Applied sciences ; v. 230
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6.

図書

図書
Frederic Neil Cogswell
出版情報: Oxford [England] : Butterworth-Heinemann, 1992  viii, 277 p. ; 25 cm
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7.

図書

図書
edited by Mohsen Shahinpoor
出版情報: Cambridge : Royal Society of Chemistry, 2016-  2 v. ; 24 cm
シリーズ名: RSC smart materials ; no. 17
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8.

雑誌

雑誌
出版情報: Amsterdam ; New York : Elsevier, 1986-  v. ; 25 cm
巻次年月次: 1 ([1986])-
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9.

図書

図書
edited by Klaus Friedrich
出版情報: Amsterdam ; Tokyo : Elsevier, 1986  xii, 465 p. ; 25 cm
シリーズ名: Composite materials series ; 1
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10.

図書

図書
editor, F.R. Jones
出版情報: Burnt Mill, Harlow, Essex : Longman Scientific & Technical, 1994  xiv, 418 p. ; 24 cm
シリーズ名: Polymer science and technology series
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