Preface |
Acknowledgments |
Materials Research Society Symposium Proceedings |
Advanced Flash and Nano-Floating Gate Memories |
* Scaling Challenges for NAND and Replacement Memory Technology / Kirk Prall |
Growth and In-line Characterization of Silicon Nanodots Integrated in Discrete Charge Trapping Non-volatile Memories / J. Amouroux ; V. Delia Marca ; E. Petit ; D. Deleruyelle ; M. Putero ; Ch. Muller ; P. Boivin ; E. Jalaguier ; J-P. Colonna ; P. Maillot ; L. Fares |
Matrix Density Effect on Morphology of Germanium Nanocrystals Embedded in Silicon Dioxide Thin Films / Arif S. Alagoz ; Mustafa F. Genisel ; Steinar Foss ; Terje G. Finstad ; Rasit Turan |
Temperature Effects on Charge Transfer Mechanisms of nc-ITO Embedded ZrHfO High-k Nonvolatile Memory Devices / Chia-Han Yang ; Yue Kuo ; Chen-Han Lin ; Way Kuo |
Enhancement of Nonvolatile Floating Gate Memory Devices Containing AgInSbTe-SiO2 Nanocomposite by Inserting HfO2/SiO2 Blocking Oxide Layer / Kuo-Chang Chiang ; Tsung-Eong Hsieh |
*Invited Paper |
Resistive Switching Memories |
Complementary Resistive Switches (CRS): High Speed Performance for the Application in Passive Nanocrossbar Arrays / Roland Rosezin ; Eike Linn ; Lutz Nielen ; Carsten Kügeler ; Rainer Bruchhaus ; Rainer Waser |
Influence of Copper on the Switching Properties of Hafnium Oxide-based Resistive Memory / B.D. Briggs ; S.M. Bishop ; K.D. Leedy ; B. Butcher ; R.L. Moore ; S.W. Novak ; N.C. Cady |
Fabrication and Characterization of Copper Oxide Resistive Memory Devices / Z.P. Rice ; S. Addepalli ; N.R. McDonald |
Influence of Process Parameters on Resistive Switching in MOCVD NiO Films / X.P. Wang ; D.J. Wouters ; M. Toeller ; J. Meersschaut ; L. Goux ; Y.Y. Chen ; B. Govoreanu ; L. Pantisano ; R. Degraeve ; M. Jurczak ; L. Altimime ; J. Kittl |
Understanding the Role of Process Parameters on the Characteristics of Transition Metal Oxide RRAM/Memristor Devices / Branden Long ; Yibo Li ; Rashmi Jha |
Memristive Switches with Two Switching Polarities in a Forming Free Device Structure / Christoph R. Hermes |
WOx Resistive Memory Elements for Scaled Flash Memories / S. Gorji Ghalamestani ; D.E. Díaz-Droguett ; D. Wouters ; J.G. Lisoni |
Memory Retention Characteristics of Data Storage Area Written in Transition Metal Oxide Films by Using Atomic Force Microscope / K. Kinoshita ; T. Yoda ; S. Kishida |
A Survey of Metal Oxides and Top Electrodes for Resistive Memory Devices |
Switching Speed in Resistive Random Access Memories (RRAMS) Based on Plastic Semiconductor / Paulo F. Rocha ; Henrique L. Gomes ; Asal Kiazadeh ; Qian Chen ; Dago M. de Leeuw ; Stefan C.J. Meskers |
Retentivity of RRAM Devices Based on Metal / YBCO Interfaces / A. Schulman ; C. Acha |
Electro-forming of Vacancy-doped Metal-SrTiO3-metal Structures / Florian Hanzig ; Juliane Seibt ; Hartmut Stoecker ; Barbara Abendroth ; Dirk C. Meyer |
Phase Change, Ferroelectric, and Organic Memories |
Interface Characterization of Metals and Metal-nitrides to Phase Change Materials / Deepu Roy ; Dirk J. Gravesteijn ; Rob A.M. Wolters |
Investigation on Phase Change Behaviors of Si-Sb-Te Alloy: The Effect of Tellurium Segregation / Xilin Zhou ; Liangcai Wu ; Zhitang Song ; Feng Rao ; Kun Ren ; Yan Cheng ; Bo Liu ; Dongning Yao ; Songlin Feng ; Bomy Chen |
* Recent Progress in Downsizing FeFETs for Fe-NAND Application / Le Van Hai ; Mitsue Takahashi ; Shigeki Sakai |
Lanthanum Oxide Capping Layer for Solution-Processed Ferroelectric-Gate Thin-Film Transistors / Tue T. Phan ; Trinh N.Q. Bui ; Takaaki MiyasakoThanh V. Pham ; Eisuke Tokumitsu ; Tatsuya Shimoda |
New MEH-PPV Based Composite Materials for Rewritable Nonvolatile Polymer Memory Devices / Mikhail Dronov ; Ivan Belogorohov ; Dmitry Khokhlov |
Planar Non-volatile Memory Based on Metal Nanoparticles / A. Kiazadeh ; H.L. Gomes ; A.R. Da Costa ; P. Rocha ; Q. Chen ; J.A. Moreira ; D.M. De Leeuw ; S.C.J. Meskers |
Author Index |
Subject Index |
Preface |
Acknowledgments |
Materials Research Society Symposium Proceedings |