close
1.

図書
図書
1. Multilevel interconnect technology : 1-2 October 1997, Austin, Texas
Divyseh N. Patel, Mart Graef, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, the Electrochemical Society
出版情報: Bellingham, Wash. : SPIE, c1997  vii, 132 p. ; 28 cm
シリーズ名: Proceedings / SPIE -- the International Society for Optical Engineering ; v. 3214
所蔵情報: loading…
2.

図書
図書
2. Multilevel interconnect technology III : 22-23 September 1999, Santa Clara, California
Mart Graef, Divyesh N. Patel, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, the Electrochemical Society ... [et al.]
出版情報: Bellingham, Wash., USA : SPIE, c1999  ix, 184 p. ; 28 cm
シリーズ名: Proceedings / SPIE -- the International Society for Optical Engineering ; v. 3883
所蔵情報: loading…
3.

図書
図書
3. Methods and materials in microelectronic technology
edited by Joachim Bargon
出版情報: New York : Plenum Press, c1984  viii, 367 p. ; 26 cm
シリーズ名: The IBM research symposia series
所蔵情報: loading…
4.

図書
図書
4. Integrated circuits : chemical and physical processing : developed from the winter symposium
sponsored by the Division of Industrial and Engineering Chemistry of the American Chemical Society, University of California--Davis, March 26-27, 1984 ; Pieter Stroeve, editor
出版情報: Washington, D.C. : American Chemical Society, 1985  ix, 348 p. ; 24 cm
シリーズ名: ACS symposium series ; 290
所蔵情報: loading…
目次情報: 続きを見る
The Manufacture of Integrated
Circuits Application of Three Fundamental Conservation Laws Silicon
Oxidation Zone Refining of Low Prandtl Number Liquid Metals
Research Opportunities in Resist Technology
Modifications of Photoresists
Developer Concentration Effects Molecular-Beam
Epitaxy for Device Applications Ion-Implanted
Integrated Circuits Plasma-Assisted Processing Oxides and Nitrides of Germanium Group III-IV
Compound Optoelectronic Devices Advanced Device Isolation for VLSI Ternary Group III-V
Semiconductor Materials Device-Quality
Strained-Layer Superlattices Wafer Design and Characterization
The Manufacture of Integrated
Circuits Application of Three Fundamental Conservation Laws Silicon
Oxidation Zone Refining of Low Prandtl Number Liquid Metals
5.

図書
図書
5. Science and technology of microfabrication : symposium held December 4-5, 1986, Boston, Massachusetts, U.S.A.
editors, R.E. Howard ... [et al.]
出版情報: Pittsburgh, Pa. : Materials Research Society, c1987  xvii, 373 p. ; 24 cm
シリーズ名: Materials Research Society symposium proceedings ; v. 76
所蔵情報: loading…
6.

図書
図書
6. Yield modelling and defect tolerance in VLSI : papers presented at the International Workshop on Designing for Yield, Oxford, 1-3 July 1987
edited by Will Moore, Wojciech Maly, and Andrzej Strojwas
出版情報: Bristol ; Philadelphia : A. Hilger, c1988  vi, 282 p. ill. ; 24 cm
所蔵情報: loading…
7.

図書
図書
7. Proceedings, Tenth International Conference on VLSI Design : January 4-7, 1997, Hyderabad, India
sponsored by VLSI Society of India, Department of Electronics, Government of India ; in cooperation with IEEE ... [et al.]
出版情報: Los Alamitos, Calif. : IEEE Computer Society Press, c1997  xxxvii, 566 p. ; 28 cm
所蔵情報: loading…
8.

図書
図書
8. VLSI : systems on a chip : IFIP TC10 WG10.5 Tenth International Conference on Very Large Scale Integration (VLSI'99), December 1-4, 1999, Lisboa, Portugal
edited by Luis Miguel Silveira, Srinivas Devadas, Ricardo Reis
出版情報: Boston : Kluwer Academic Publishers, c2000  xviii, 675 p. ; 25 cm
シリーズ名: The International Federation for Information Processing ; 34
所蔵情報: loading…
9.

図書
図書
9. Multichamber and in-situ processing of electronic materials : 10-11 October 1989, Santa Clara, California
Robert S. Freund, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
出版情報: Bellingham, Wash., USA : The Society, c1990  vi, 196 p. ; 28 cm
シリーズ名: Proceedings / SPIE -- the International Society for Optical Engineering ; v. 1188
所蔵情報: loading…
10.

図書
図書
10. Manufacturing process control for microelectronic devices and circuits : 20-21 October 1994, Austin, Texas (:pbk)
Anant G. Sabnis, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering
出版情報: Bellingham, Wash. : SPIE, c1994  ix, 250 p. ; 28 cm
シリーズ名: Proceedings / SPIE -- the International Society for Optical Engineering ; v. 2336
所蔵情報: loading…
11.

図書
図書
11. Multilevel interconnection : issues that impact competitiveness : 27-28 September 1993, Monterey, California
Hoang H. Hoang ... [et al.], chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering
出版情報: Bellingham, Wash., USA : SPIE, c1993  vii, 228 p. ; 28 cm
シリーズ名: Proceedings / SPIE -- the International Society for Optical Engineering ; v. 2090
所蔵情報: loading…
12.

図書
図書
12. Logic and architecture synthesis : state-of-the-art and novel approaches : IFIP Workshop on Logic and Architecture Synthesis, 1994
edited by Gabrièle Saucier and Anne Mignotte
出版情報: London : Chapman & Hall, 1995  xii, 388p ; 24 cm
所蔵情報: loading…
13.

図書
図書
13. Proceedings : First Great Lakes Symposium on VLSI, March 1-2, 1991, Kalamazoo, Michigan (: paper ; : microfiche ; : case)
edited by Naveed Sherwani ; sponsored by Department of Computer Science and Department of Electrical Engineering, Western Michigan University ; in cooperation with IEEE Computer Society, Technical Committee on VLSI and IEEE West Michigan Section
出版情報: Los Alamitos, Calif. : IEEE Computer Society Press, c1991  xi, 346 p. ; 28 cm
所蔵情報: loading…
14.

図書
図書
14. Advanced research in VLSI : proceedings of the 1991 University of California/Santa Cruz conference
edited by Carlo H. Séquin
出版情報: Cambridge, Mass. : MIT Press, c1991  viii, 410 p. ; 24 cm
所蔵情報: loading…
15.

図書
図書
15. VLSI 91 : proceedings of the IFIP TC10/WG10.5 International Conference on Very Large Scale Integration, Edinburgh, Scotland, 20-22 August, 1991
edited by A. Halaas, P.B. Denyer
出版情報: Amsterdam ; Tokyo : North-Holland, 1992  xv, 500 p. ; 23 cm
シリーズ名: IFIP transactions ; A . Computer science and technology ; 1
所蔵情報: loading…
16.

図書
図書
16. Logic and architecture synthesis : proceedings of the IFIP TC10/WG10.5 Workshop on Logic and Architecture Synthesis, Paris, France, 30 May-1 June 1990
edited by Petra Michel, Gabrielle Saucier
出版情報: Amsterdam ; Tokyo : North-Holland , New York, N.Y., U.S.A. : Distributors for the U.S. and Canada, Elsevier Science Pub. Co., 1991  xii, 337 p. ; 24 cm
所蔵情報: loading…
17.

図書
図書
17. Microelectronic materials and processes (: hbk ; : pbk)
edited by R.A. Levy
出版情報: Dordrecht ; Boston : Kluwer Academic, 1989  985 p. ; 25 cm
シリーズ名: NATO ASI series ; ser. E . Applied sciences ; no. 164
所蔵情報: loading…
18.

図書
図書
18. Emerging technologies for in situ processing
edited by Daniel J. Ehrlich and Van Tran Nguyen
出版情報: Dordrecht ; Boston : M. Nijhoff , Hingham, MA, USA : Distributors for the U.S. and Canada, Kluwer Academic Publishers, 1988  x, 290 p. ; 25 cm
シリーズ名: NATO ASI series ; ser. E . Applied sciences ; no. 139
所蔵情報: loading…
19.

図書
図書
19. Design methodologies for VLSI and computer architecture : proceedings of the IFIP TC10 Working Conference on Design Methodologies for VLSI and Computer Architecture, Pisa, Italy, 19-21 September 1988
edited by D.A. Edwards
出版情報: Amsterdam ; Tokyo : North-Holland , New York, N.Y., U.S.A. : Distributors for the U.S. and Canada, Elsevier Science Pub. Co., 1989  xiii, 348 p. ; 23 cm
所蔵情報: loading…
20.

図書
図書
20. Formal aspects of VLSI design : proceedings of the 1985 Edinburgh Workshop on VLSI, Edinburgh, Scotland, U.K.
editors, George J. Milne and P.A. Subramanyam
出版情報: Amsterdam ; Tokyo : North Holland, 1986  ix, 213 p. ; 25 cm
所蔵情報: loading…
21.

図書
図書
21. In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK
Gudrun Kissinger, Larg H. Weiland, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)
出版情報: Bellingham, Wash. : SPIE, c2001  ix, 242 p. ; 28 cm
シリーズ名: Proceedings / SPIE -- the International Society for Optical Engineering ; v. 4406
所蔵情報: loading…
22.

図書
図書
22. Proceedings, fourth International Symposium on Quality Electronic Design, 24-26 March 2003, San Jose, California
sponsored by IEEE Electron Device Society, IEEE Components, Packaging & Manufacturing Technology Society, Association for Computing Machinery, ACM Special Interest Group on Design Automation
出版情報: Los Alamitos, Calif. : IEEE Computer Society, c2003  xxi, 457 p. ; 28 cm
所蔵情報: loading…
23.

図書
図書
23. Proceedings of the Symposium on Multilevel Metallization, Interconnection, and Contact Technologies
edited by L. B. Rothman, T. Herndon
出版情報: Pennington, NJ : Electrochemical Society, Inc., c1987  vii, 272 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 87-4
所蔵情報: loading…
24.

図書
図書
24. Proceedings of the symposia on reliability of semiconductor devices and interconnection and multilevel metallization, interconnection, and contact technologies
edited by Harzara S. Rathore, Geraldine C. Schwartz, Robin A. Susko ; [sponsored by] Dielectrics and Insulation and Electronics divisions
出版情報: Pennington, NJ : Electrochemical Society, c1989  viii, 495 p. ; 23 cm
シリーズ名: Proceedings / [Electrochemical Society] ; v. 89-6
所蔵情報: loading…
25.

図書
図書
25. Proceedings, IEEE International SOC Conference : September 25-28, 2005, Hilton Washington Dulles Airport, Herndon, VA
editors, Dong Ha ... [et al.]
出版情報: Piscataway, N. J. : IEEE, c2004  324 p. ; 28 cm
所蔵情報: loading…
26.

図書
図書
26. DFT 2005 : 20th IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems : 3-5 October, 2005, Monterey, California, USA
edited by Robert Aitken ... [et al.] ; sponsored by the IEEE Computer Society Test Technology Technical Council (TTTC), the IEEE Computer Society Technical Committee on Fault-Tolerant Computing(TCFTC)
出版情報: Los Alamitos, Calif. : IEEE Computer Society, c2005  xii, 602 p. ; 23 cm
所蔵情報: loading…
27.

図書
図書
27. The Physics and fabrication of microstructures and microdevices : proceedings of the winter school, Les Houches, France, March 25-April 5, 1986 (: U.S. ; : Berlin)
editors, M.J. Kelly and C. Weisbuch
出版情報: Berlin ; Tokyo : Springer-Verlag, c1986  xi, 469 p. ; 25 cm
シリーズ名: Springer proceedings in physics ; v. 13
所蔵情報: loading…
28.

図書
図書
28. Introduction to microelectronic fabrication. 2nd ed
by Richard C. Jaeger
出版情報: Upper Saddle River, NJ : Prentice Hall, c2002  xiv, 316 p. ; 24 cm
シリーズ名: Modular series on solid state devices ; v. 5
所蔵情報: loading…
目次情報: 続きを見る
Preface
An Overview of Microelectronic Fabrication / 1：
A Historical Perspective
An Overview of Monolithic Fabrication Processes and Structures
Metal-Oxide-Semiconductor (MOS) Processes
Basic Bipolar Processing
Safety
Lithography / 2：
The Photolithographic Process
Etching Techniques
Photomask Fabrication
Exposure Systems
Exposure Sources
Optical and Electron Microscopy
Further Reading
Thermal Oxidation of Silicon / 3：
The Oxidation Process
Modeling Oxidation
Factors Influencing Oxidation Rate
Dopant Redistribution During Oxidation
Masking Properties of Silicon Dioxide
Technology of Oxidation
Oxide Quality
Selective Oxidation and Shallow Trench Formation
Oxide Thickness Characterization
Process Simulation
Diffusion / 4：
The Diffusion Process
Mathematical Model for Diffusion
The Diffusion Coefficient
Successive Diffusions
Solid-Solubility Limits
Junction Formation and Characterization
Sheet Resistance
Generation-Depth and Impurity Profile Measurement
Diffusion Simulation
Diffusion Systems
Gettering
Ion Implantation / 5：
Implantation Technology
Mathematical Model for Ion Implantation
Selective Implantation
Junction Depth and Sheet Resistance
Channeling, Lattice Damage, and Annealing
Shallow Implantation
Source Listing
Film Deposition / 6：
Evaporation
Sputtering
Chemical Vapor Deposition
Epitaxy
Interconnections and Contacts / 7：
Interconnections in Integrated Circuits
Metal Interconnections and Contact Technology
Diffused Interconnections
Polysilicon Interconnections and Buried Contacts
Silicides and Multilayer-Contact Technology
The Liftoff Process
Multilevel Metallization
Copper Interconnects and Damascene Processes
Packaging and Yield / 8：
Testing
Wafer Thinning and Die Separation
Die Attachment
Wire Bonding
Packages
Flip-Chip and Tape-Automated-Bonding Processes
Yield
MOS Process Integration / 9：
Basic MOS Device Considerations
MOS Transistor Layout and Design Rules
Complementary MOS (CMOS) Technology
Silicon on Insulator
Bipolar Process Integration / 10：
The Junction-Isolated Structure
Current Gain
Transit Time
Basewidth
Breakdown Voltages
Other Elements in SBC Technology
Layout Considerations
Advanced Bipolar Structures
Other Bipolar Isolation Techniques
BICMOS
Processes for Microelectromechanical Systems--MEMS / 11：
Mechanical Properties of Silicon
Bulk Micromachining
Silicon Etchants
Surface Micromachining
High-Aspect-Ratio Micromachining: The LIGA Molding Process
Silicon Wafer Bonding
IC Process Compatibility
Answers to Selected Problems
Index
Preface
An Overview of Microelectronic Fabrication / 1：
A Historical Perspective
文献の複写および貸借の依頼を行う
 文献複写・貸借依頼