Low-k Materials / Part I: |
Ultra low-k materials based on self-assembled organic polymers / Marianna Pantouvaki1: |
New designs of hydrophobic and mesostructured ultra low k materials with isolated mesopores / Anthony Grunenwald2: |
Evaluation of ultra-thin layer fabricated by wet-process as a pore-seal for porous low-k films / Shoko Ono3: |
Ozone treatment on nanoporous ultralow dielectric materials to optimize their mechanical and dielectrical properties / Hee-Woo Rhee4: |
Integration / Part II: |
Optimizing stressor film deposition sequence in polish rate order for best planarization / John H. Zhang5: |
Effect of chemical solutions and surface wettability on the stability of advanced porous low-k materials / Quoc Toan Le6: |
A less damaging patterning regime for a successful integration of ultra low-k materials in modern nanoelectronic devices / Sven Zimmermann7: |
Defects in low-ĸ insulators (ĸ=2.5âÇô2.0): ESR analysis and charge injection / Valeri Afanas'ev8: |
Patterning organic fluorescent molecules with SAM patterns / Nan Lu9: |
Optical interconnect technologies based on silicon photonics / Wim Bogaerts10: |
Metallization / Part III: |
32nm node highly reliable Cu/low-k integration technology with CuMn alloy seed / Shaoning Yao11: |
Amorphous Ta-N as a diffusion barrier for Cu metallization / Neda Dalili12: |
Comparison of TiN thin films grown on SiO2 by reactive dc magnetron sputtering and high power impulse magnetron sputtering / Jon Gudmundsson13: |
Specific contact resistance of ohmic contacts on n-type SiC membranes / Patrick Leech14: |
Development of electrochemical copper deposition screening methodologies for next generation additive selection / Kevin Ryan15: |
3D Packaging / Part IV: |
Microbump impact on reliability and performance in through-silicon via stacks / Aditya Karmarkar16: |
Tailoring the crystallographic texture and electrical properties of inkjet-printed interconnects for use in microelectronics / Romain Cauchois17: |
Low-k Materials / Part I: |
Ultra low-k materials based on self-assembled organic polymers / Marianna Pantouvaki1: |
New designs of hydrophobic and mesostructured ultra low k materials with isolated mesopores / Anthony Grunenwald2: |