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1.

図書

図書
edited by C. Murray Penney and H. John Caulfield
出版情報: Bedford : IFS Publications , Berlin : Springer, c1987  258 p. ; 30 cm
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2.

図書

図書
edited by Rolf H. Muller
出版情報: New York : Wiley, c1973  542 p. ; 24 cm
シリーズ名: Advances in electrochemistry and electrochemical engineering ; v. 9
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3.

図書

図書
edited by Barton E. Dahneke
出版情報: New York : Wiley, c1983  xiv, 570 p. ; 24 cm
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4.

図書

図書
D. Clarke, J.F. Grainger
出版情報: Oxford ; New York : Pergamon Press, 1971  viii, 187 p. ; 23 cm
シリーズ名: International series of monographs in natural philosophy ; v. 35
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5.

図書

図書
Daniel Malacara, editor
出版情報: Bellingham, Wash., USA : SPIE Optical Engineering Press, c1990  xv, 702 p. ; 28 cm
シリーズ名: SPIE milestone series / Brian J. Thompson, general editor ; v. MS 18
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6.

図書

図書
edited by Daniel Malacara
出版情報: Boston ; Tokyo : Academic Press, c1988  xiv, 341 p. ; 24 cm
シリーズ名: Methods of experimental physics ; v. 26
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7.

図書

図書
[edited by] H. Lipson
出版情報: London ; New York : Academic Press, 1972  xi, 436 p. ; 24 cm
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8.

図書

図書
Richard Leach (Ed.)
出版情報: Berlin ; Heidelberg : Springer, c2011  xiii, 323p. ; 25cm
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目次情報: 続きを見る
Introduction to Surface Texture Measurement / Richard Leach1:
Surface Texture Measurement / 1.1:
Surface Profile and Areal Measurement / 1.2:
Areal Surface Texture Measurement / 1.3:
Surface Texture Standards and GPS / 1.4:
Profile Standards / 1.4.1:
Areal Specification Standards / 1.4.2:
Instrument Types in the ISO 25178 Series / 1.5:
The Stylus Instrument / 1.5.1:
Scanning Probe Microscopes / 1.5.2:
Scanning Electron Microscopes / 1.5.3:
Optical Instrument Types / 1.5.4:
Considerations When Choosing a Method / 1.6:
Acknowledgements
References
Some Common Terms and Definitions / 2:
Introduction / 2.1:
The Principal Aberrations / 2.2:
Objective Lenses / 2.3:
Magnification and Numerical Aperture / 2.4:
Spatial Resolution / 2.5:
Optical Spot Size / 2.6:
Field of View / 2.7:
Depth of Field and Depth of Focus / 2.8:
Interference Objectives / 2.9:
Limitations of Optical 3D Sensors / Gerd Häusler ; Svenja Ettl3:
Introduction: What Is This Chapter About? / 3.1:
The Canonical Sensor / 3.2:
Optically Rough and Smooth Surfaces / 3.3:
Type I Sensors: Triangulation / 3.4:
Type II and Type III Sensors: Interferometry / 3.5:
Type IV Sensors: Deflectometry / 3.6:
Only Four Sensor Principles? / 3.7:
Conclusion and Open Questions / 3.8:
Calibration of Optical Surface Topography Measuring Instruments / Claudiu Giusca4:
Introduction to Calibration and Traceability / 4.1:
Calibration of Surface Topography Measuring Instruments / 4.2:
Can an Optical Instrument Be Calibrated? / 4.3:
Types of Material Measure / 4.4:
Calibration of Instrument Scales / 4.5:
Noise / 4.5.1:
Residual Flatness / 4.5.2:
Amplification, Linearity and Squareness of the Scales / 4.5.3:
Resolution / 4.5.4:
Relationship between the Calibration, Adjustment and Measurement Uncertainty / 4.6:
Summary / 4.7:
Chromatic Confocal Microscopy / François Blateyron5:
Basic Theory / 5.1:
Confocal Setting / 5.1.1:
Axial Chromatic Dispersion / 5.1.2:
Spectral Decoding / 5.1.3:
Height Detection / 5.1.4:
Metrological Characteristics / 5.1.5:
Spot Size / 5.1.5.1:
Instrumentation / 5.2:
Lateral Scanning Configurations / 5.2.1:
Profile Measurement / 5.2.1.1:
Areal Measurement / 5.2.1.2:
Optoelectronic Controller / 5.2.2:
Optical Head / 5.2.3:
Light Source / 5.2.4:
Chromatic Objective / 5.2.5:
Spectrometer / 5.2.6:
Optical Fibre Cord / 5.2.7:
Instrument Use and Good Practice / 5.3:
Calibration / 5.3.1:
Calibration of Dark Level / 5.3.1.1:
Linearisation of the Response Curve / 5.3.1.2:
Calibration of the Height Amplification Coefficient / 5.3.1.3:
Calibration of the Lateral Amplification Coefficient / 5.3.1.4:
Calibration of the Hysteresis in Bi-directional Measurement / 5.3.1.5:
Preparation for Measurement / 5.3.2:
Pre-processing / 5.3.3:
Limitations of the Technique / 5.4:
Local Slopes / 5.4.1:
Scanning Speed / 5.4.2:
Light Intensity / 5.4.3:
Non-measured Points / 5.4.4:
Outliers / 5.4.5:
Interference / 5.4.6:
Ghost Foci / 5.4.7:
Extensions of the Basic Principles / 5.5:
Thickness Measurement / 5.5.1:
Line and Field Sensors / 5.5.2:
Absolute Reference / 5.5.3:
Case Studies / 5.6:
Point Autofocus Instruments / Katsuhiro Miura ; Atsuko Nose6:
Comparison with Roughness Material Measures / 6.1:
Three-Dimensional Measurement of Grinding Wheel Surface Topography / 6.3.2:
Limitations of PAI / 6.4:
Lateral Resolution / 6.4.1:
Vertical Resolution / 6.4.2:
The Maximum Acceptable Local Surface Slope / 6.4.3:
Conclusion / 6.5:
Focus Variation Instruments / Franz Helmli7:
How Does It Work? / 7.1:
Acquisition of Image Data / 7.2.2:
Measurement of 3D Information / 7.2.3:
Post-processing / 7.2.4:
Handling of Invalid Points / 7.2.5:
Difference to Other Techniques / 7.3:
Difference to Imaging Confocal Microscopy / 7.3.1:
Difference to Point Auto Focusing Techniques / 7.3.2:
Optical System / 7.4:
CCD Sensor / 7.4.2:
Microscope Objective / 7.4.3:
Driving Unit / 7.4.5:
Practical Instrument Realisation / 7.4.6:
Limitations of the Technology / 7.5:
Translucent Materials / 7.6.1:
Measurable Surfaces / 7.6.2:
Repeatability Information / 7.7:
High Radiometric Data Acquisition / 7.7.2:
2D Alignment / 7.7.3:
3D Alignment / 7.7.4:
Surface Texture Measurement of Worn Metal Parts / 7.8:
Form Measurement of Complex Tap Parameters / 7.8.2:
Phase Shifting Interferometry / Peter de Groot7.9:
Concept and Overview / 8.1:
Principles of Surface Measurement Interferometry / 8.2:
Phase Shifting Method / 8.3:
Phase Unwrapping / 8.4:
Phase Shifting Error Analysis / 8.5:
Interferometer Design / 8.6:
Focus / 8.7:
Light Sources / 8.9:
Examples of PSI Measurement / 8.10:
Coherence Scanning Interferometry / 9:
Terminology / 9.1:
Typical Configurations of CSI / 9.3:
Signal Formation / 9.4:
Signal Processing / 9.5:
Foundation Metrics and Height Calibration for CSI / 9.6:
Dissimilar Materials / 9.7:
Vibrational Sensitivity / 9.8:
Transparent Films / 9.9:
Examples / 9.10:
Digital Holographic Microscopy / Tristan Colomb ; Jonas Kühn9.11:
Acquisition / 10.1:
Reconstruction / 10.2.2:
Digital Camera / 10.3:
Optical Path Retarder / 10.3.3:
Digital Focusing / 10.4:
DHM Parameters / 10.4.2:
Automatic Working Distance in Reflection DHM / 10.4.3:
Sample Preparation and Immersion Liquids / 10.4.4:
Limitations of DHM / 10.5:
Parasitic Interferences and Statistical Noise / 10.5.1:
Height Measurement Range / 10.5.2:
Sample Limitation / 10.5.3:
Extensions of the Basic DHM Principles / 10.6:
Multi-wavelength DHM / 10.6.1:
Extended Measurement Range / 10.6.1.1:
Mapping / 10.6.1.2:
Stroboscopic Measurement / 10.6.2:
DHM Reflectometry / 10.6.3:
Infinite Focus / 10.6.4:
Applications of DHM / 10.6.5:
Topography and Defect Detection / 10.6.5.1:
Roughness / 10.6.5.2:
Micro-optics Characterization / 10.6.5.3:
MEMS and MOEMS / 10.6.5.4:
Semi-transparent Micro-structures / 10.6.5.5:
Conclusions / 10.7:
Imaging Confocal Microscopy / Roger Artigas11:
Introduction to Imaging Confocal Microscopes / 11.1:
Working Principle of an Imaging Confocal Microscope / 11.1.2:
Metrological Algorithm / 11.1.3:
Image Formation of a Confocal Microscope / 11.1.4:
General Description of a Scanning Microscope / 11.1.4.1:
Point Spread Function for the Limiting Case of an Infinitesimally Small Pinhole / 11.1.4.2:
Pinhole Size Effect / 11.1.4.3:
Types of Confocal Microscopes / 11.2:
Laser Scanning Confocal Microscope Configuration / 11.2.1.1:
Disc Scanning Confocal Microscope Configuration / 11.2.1.2:
Programmable Array Scanning Confocal Microscope Configuration / 11.2.1.3:
Objectives for Confocal Microscopy / 11.2.2:
Vertical Scanning / 11.2.3:
Motorised Stages with Optical Linear Encoders / 11.2.3.1:
Piezoelectric Stages / 11.2.3.2:
Comparison between Motorised and Piezoelectric Scanning Stages / 11.2.3.3:
Location of an Imaging Confocal Microscope / 11.3:
Setting Up the Sample / 11.3.2:
Setting the Right Scanning Parameters / 11.3.3:
Simultaneous Detection of Confocal and Bright Field Images / 11.3.4:
Sampling / 11.3.5:
Low Magnification against Stitching / 11.3.6:
Limitations of Imaging Confocal Microscopy / 11.4:
Maximum Detectable Slope on Smooth Surfaces / 11.4.1:
Noise and Resolution in Imaging Confocal Microscopes / 11.4.2:
Errors in Imaging Confocal Microscopes / 11.4.3:
Objective Flatness Error / 11.4.3.1:
Calibration of the Flatness Error / 11.4.3.2:
Measurements on Thin Transparent Materials / 11.4.3.3:
Measurement of Thin and Thick Film with Imaging Confocal Microscopy / 11.4.4:
Thick Films / 11.5.1:
Thin Films / 11.5.3:
Case Study: Roughness Prediction on Steel Plates / 11.6:
Light Scattering Methods / Theodore V. Vorburger ; Richard Silver ; Rainer Brodmann ; Boris Brodmann ; Jörg Seewig12:
Instrumentation and Case Studies / 12.1:
Early Developments / 12.3.1:
Recent Developments in Instrumentation for Mechanical Engineering Manufacture / 12.3.2:
Recent Developments in Instrumentation for Semiconductor Manufacture (Optical Critical Dimension) / 12.3.3:
SEMI MF 1048-1109 (2009) Test Method for Measuring the Effective Surface Roughness of Optical Components by Total Integrated Scattering / 12.4:
SEMI ME1392-1109 (2009) Guide for Angle-Resolved Optical Scatter Measurements on Specular or Diffuse Surfaces / 12.4.2:
ISO10110-8: 2010 Optics and Photonics - Preparation of Drawings for Optical Elements and Systems - Part 8: Surface Texture / 12.4.3:
Standards for Gloss Measurement / 12.4.4:
VDA Guideline 2009, Geometrische Produktspezifikation Oberflächenbeschaffenheit Winkelaufgelöste Streulichtmesstech-nik Definition, KenngröBen und Anwendung (Light Scattering Measurement Technique) / 12.4.5:
Index / 12.5:
Introduction to Surface Texture Measurement / Richard Leach1:
Surface Texture Measurement / 1.1:
Surface Profile and Areal Measurement / 1.2:
9.

図書

図書
Franz Mayinger, Oliver Feldmann (Eds)
出版情報: Berlin ; Tokyo : Springer-Verlag, c2001  xvii, 403 p. ; 25 cm
シリーズ名: Heat and mass transfer
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10.

図書

図書
edited by Toru Yoshizawa
出版情報: Boca Raton, Fla : CRC, c2009  xiii, 730 p. ; 26 cm
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