Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
出版情報:
Bellingham, Washington : SPIE, c2001 2 v. (xxix, 1084 p.) ; 28 cm
L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor ; based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984
出版情報:
Washington, D.C. : The Society, 1984 viii, 494 p. ; 24 cm
An Analysis of Process Issues with Chemically Amplified Positive Resists / O. Nalamasu ; A.G. Timko ; E. Reichmanis ; F.M. Houlihan ; A.E. Novembre ; R. Tarascon ; N. Mnzel ; S.G. Slater
The Annealing Concept for Environmental Stabilization of Chemical Amplification Resists / H. Ito ; G. Breyta ; D.C. Hofer ; R. Sooriyakumaran
Structure-Property Relationship of Acetal- and Ketal-Blocked Polyvinyl Phenols as Polymeric Binder in Two-Component Positive Deep-UV Photoresists / C. Mertesdorf ; N, Mnzel ; P. Falcigno ; H.J. Kirner ; B. Nathal ; H.T. Schacht ; R. Schulz ; A. Zettler
Lithographic Effects of Acid Diffusion in Chemically Amplified Resists / C.A. Mack
Acid Diffusion in Chemically Amplified Resists: The Effect of Prebaking and Post-Exposure Baking Temperature / J. Nakamura ; H. Ban ; A. Tanaka
Correlation of the Strength of Photogenerated Acid with the Post-Exposure Delay Effect in Positive-Tone Chemically Amplified Deep-UV Resists / E. Chin ; J.M. Kometani ; R. Harley
Following the Acid: Effect of Acid Surface Depletion on Phenolic Polymers / J.W. Thackeray ; M.D. Denison ; T.H. Fedynyshyn ; D. Kang ; R. Sinta
Water-Soluble Onium Salts: New Class of Acid Generators for Chemical Amplification Positive Resists / T. Sakamizu ; H. Shiraishi ; T. Ueno
Photoacid and Photobase Generators: Arylmethyl Sulfones and Benzyhydrylammonium Salts / J.E. Hanson ; K.H. Jensen ; N. Gargiulo ; D. Motta ; D.A. Pingor ; D.A. Mixon ; C. Knurek
Functional Imaging with Chemically Amplified Resists / A. M. Vekselman ; C. Zhang ; G.D. Darling
Hydrogen Bonding in Sulfone- and N-Methylmaleimide-Containing Resist Polymers with Hydroxystyrene and Acetoxystyrene: Two-Dimensional NMR Studies / S. A. Heffner ; M. E. Galvin ; L. Gerena ; P. A. Mirau
NMR Investigation of Miscibility in Novolac-Poly(2-methyl-1-pentene sulfone) Resists / A. E. Novembre ; P.A. Mirau
4-Methanesulfonyloxystyrene: A Means of Improving the Properties of tert-Butoxycarbonyloxystyrene-Based Polymers for Chemically Amplified Deep-UV Resists
Dienone-Phenol Rearrangement Reaction: Design Pathway for Chemically Amplified Photoresists / Y. Jiang ; J. Maher ; D. Bassett
Single-Layer Resist for ArF Excimer Laser Exposure Containing Aromatic Compounds / T. Ushirogouchi ; T. Naito ; K. Asakawa ; N. Shida ; M. Nakase ; T. Tada
Design Considerations for 193-nm Positive Resists / R.D. Allen ; I-Y. Wan ; G. M. Wallraff ; R. A. DiPietro ; R.R. Kunz
Top-Surface Imaged Resists for 193-nm Lithography / R. R. Kunz ; S.C. Palmateer ; M.W. Horn ; A. R. Forte ; M. Rothschild
A Top-Surface Imaging Approach Based on the Light-Induced Formation of Dry-Etch Barriers / U. Schaedeli ; M. Hofmann ; E. Tinguely
Plasma-Developable Photoresist System Based on Polysiloxane Formation at the Irradiated Surface: A Liquid-Phase Deposition Method / M. Shirai ; N. Nogi ; M. Tsunooka ; T. Matsuo
New Polysiloxanes for Chemically Amplified Resist Applications / J.C. van de Grampel ; R. Puyenbroek ; A. Meetsma ; B.A. C. Rousseeuw ; E.W.J.M. van der Drift
Environmentally Friendly Polysilane Photoresists / J.V. Beach ; D. A. Loy ; Yu-Ling Hsiao ; R. M. Waymouth
Fluoropolymers with Low Dielectric Constants: Triallyl Ether-Hydrosiloxane Resins / H.S.-W. Hu ; J.R. Griffith ; L.J. Buckley ; A.W. Snow
Photophysics, Photochemistry, and Intramolecular Charge Transfer of Polyimides / M. Hasegawa ; Y. Shindo ; T. Sugimura
Structure, Properties, and Intermolecular Charge Transfer of Polyimides / J. Ishii ; T. Matano ; T. Miwa ; M. Ishida ; Y. Okabe ; A. Takahashi
Application of Polyisoimide as a / A. Mochizuki ; M. Ueda
An Analysis of Process Issues with Chemically Amplified Positive Resists / O. Nalamasu ; A.G. Timko ; E. Reichmanis ; F.M. Houlihan ; A.E. Novembre ; R. Tarascon ; N. Mnzel ; S.G. Slater
The Annealing Concept for Environmental Stabilization of Chemical Amplification Resists / H. Ito ; G. Breyta ; D.C. Hofer ; R. Sooriyakumaran
Structure-Property Relationship of Acetal- and Ketal-Blocked Polyvinyl Phenols as Polymeric Binder in Two-Component Positive Deep-UV Photoresists / C. Mertesdorf ; N, Mnzel ; P. Falcigno ; H.J. Kirner ; B. Nathal ; H.T. Schacht ; R. Schulz ; A. Zettler
edited by Robert Gleason, George J. Hefferon, L.K. White ; [sponsored by the] Dielectrics and Insulation and Electronics divisions and Luminescence and Display Materials Group
出版情報:
Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, c1990 vii, 248 p. ; 23 cm
L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983
出版情報:
Washington, D.C. : The American Chemical Society, 1983 ix, 363 p. ; 24 cm
Murrae J. Bowden, editor, S. Richard Turner, editor ; developed from a symposium sponsored by the Division of Polymeric Materials--Science and Engineering at the 192nd Meeting of the American Chemical Society, Anaheim, California, September 7-12, 1986
出版情報:
Washington, DC : American Chemical Society, 1987 x, 628 p. ; 24 cm
Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California
出版情報:
Bellingham, Wash. : International Society for Optical Engineering, 1982 viii, 179 p. ; 28 cm
John L. Sturtevant, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering, AZ Electronic Materials (USA), Rohm and Haas Electronic Materials (USA) ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering.
出版情報:
Bellingham, Wash. : SPIE, c2005 2 v. (xliii, 1216 p.) ; 28 cm