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1.

図書
図書
1. Polymers for microelectronics : resists and dielectrics
Larry F. Thompson, editor, C. Grant Willson, editor, Seiichi Tagawa, editor
出版情報: Washington, DC : American Chemical Society, 1994  xii, 571 p. ; 24 cm
シリーズ名: ACS symposium series ; 537
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Chemical Amplification Mechanisms for Microlithography / E.Reichmanis ; F. M. Houlihan ; O. Nalamasu ; T.X. Neenan:
Synthesis of 4-(tert-Butoxycarbonyl)-2,6-dinitrobenzyl Tosylate: A Potential Generator and Dissolution Inhibitor Solubilizable through Chemical Amplification / F.M. Houlihan ; E. Chin ; J. M. Kometani
Chemically Amplified Deep-UV Photoresists Based on Acetal-Protected Poly(vinylphenols) / Y. Jiang ; D.R. Bassett
Novel Analytic Method of Photoinduced Acid Generation and Evidence of Photosensitization via Matrix Resin / N. Takeyama ; Y. Ueda ; T. Kusumoto ; H. Ueki ; M. Hanabata
Acid-Catalyzed Dehydration: A New Mechanism for Chemically Amplified Lithographic Imaging / H. Ito ; Y. Maekawa ; R. Sooriyakumaran ; E. A. Mash
An Alkaline-Developable Positive Resist Based on Silylated Polyhydroxystyrene for KrF Excimer Laser Lithography / E. Kobayashi ; M. Murata ; M. yamachika ; Y. Kobayashi ; Y. Yumoto ; T. Miura
A Test for Correlation between Residual Solvent and Rates of N-Methylpyrrolidone Absorption by Polymer Films / W.D. Hinsberg ; S. A. MacDonald ; C. D. Snyder ; R. D. Allen
Dissolution Rates of Copolymers Based on 4-Hydroxystyrene and Styrene / C.-P. Lei ; T. Long ; S. K. Obendorf ; F. Rodriguez
Synthesis and Polymerization of N-(tert-Butoxy)maleimide and Application of Its Polymers as a Chemical Amplification Resist / K.-D. Ahn ; D.-I. Koo
Acid-Sensitive Pyrimidine Polymers for Chemical Amplification Resists / Y. Inaki ; N. Matsumura ; K. Takemoto
Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists / G. M. Wallraff ; W. D. Hinsberg ; L. L. Simpson ; R.R Kunz
Surface-Imaging Resists Using Photogenerated Acid-Catalyzed SiO2 Formation by Chemical Vapor Deposition / M. Shirai ; M. Tsunooka
Polysilphenylenesiloxane Resist with Three-Dimensional Structure / K. Watanabe ; E. Yano ; T. Namiki ; Y. Yoneda
Top-Surface Imaging Using Selective Electroless Metallization of Patterned Monolayer Films / J. M. Calvert ; W. J. Dressick ; C. S. Dulcey ; M. S. Chen ; J. H. Georger ; D.A. Stenger ; T.S. Koloski ; G.S. Calabrese
Langmuir-Blodgett Deposition To Evaluate Dissolution Behavior of Multicomponent Resists / V. Rao ; W.D.Hinsberg ; C.W. Frank ; R.F.W. Pease
Photochemical Control of a Morphology and Solubility Transformation in Poly(vinyl alcohol) Films Induced by Interfacial Contact with Siloxanes and Phenol-Formaldehyde Polymeric Photoresists / J.R. Sheats
Advances in the Chemistry of Resists for Ionizing Radiation / R. Dammel
Out-of-Plane Expansion Measurements in Polyimide Films / M.T. Pottiger ; J.C. Coburn
Radiation-Induced Modifications of Allylamino-Substituted Polyphosphazenes / M.F. Welker ; H. R. Allcock ; G. L. Grune ; R. T. Chern ; V. T. Stannett
Synthesis of Perfluorinated Polyimides for Optical Applications / S. Ando ; T, Matsuura ; S. Sasaki
Charged Species in s-Conjugated Polysilanes as Studied by Absorption Spectroscopy with Low-Temperature Matrices / K. Ushida ; A. Kira ; S. Tagawa ; Y. Yoshida ; H. Shibata
Acid-Sensitive Phenol-Formaldehyde Polymeric Resists / W. Brunsvold ; W. Conley ; W. Montgomery ; W. Moreau
Superiority of Bis(perfluorophenyl) Azides over Nonfluorinated Analogues as Cross-Linkers in Polystyrene-Based Deep-UV Resists / S.X. Cai ; M.N. Wybourne ; J.F.W. Keana
New Photoresponsive Polymers Bearing Norbornadiene Moiety Synthesis by Selective Cationic Polymerization of 2-(3-Phenyl-2,5-norbornadiene-2-carbonyloxy)ethyl Vinyl Ether and Photochemical Reaction of the Resulting Polymers / T. Nishikubo ; A. Kameyama|cK. Kishi ; C. Hijikata
Photoinitiated Thermolysis of Poly(5-norbornene 2, 3-dicarboxylates): A Way to Polyconjugated Systems and Photoresists / E. Zenkl ; M. Schimetta ; F. Stelzer
Recent Progress of the Application of Polyimides to Microelectronics / D. Makino
Base-Catalyzed Cyclization of ortho-Aromatic Amide Aklyl Esters: A Novel Approach to Chemical Imidization / W. Volksen ; T. Pascal ; J.W. Labadie ; M.I. Sanchez ; D.R. McKean
Chemical Amplification Mechanisms for Microlithography / E.Reichmanis ; F. M. Houlihan ; O. Nalamasu ; T.X. Neenan:
Synthesis of 4-(tert-Butoxycarbonyl)-2,6-dinitrobenzyl Tosylate: A Potential Generator and Dissolution Inhibitor Solubilizable through Chemical Amplification / F.M. Houlihan ; E. Chin ; J. M. Kometani
Chemically Amplified Deep-UV Photoresists Based on Acetal-Protected Poly(vinylphenols) / Y. Jiang ; D.R. Bassett
2.

図書
図書
2. Materials science of high temperature polymers for microelectronics : symposium held April 29-May 2, 1991, Anaheim, California, U.S.A.
editors, D.T. Grubb, Itaru Mita, D.Y. Yoon.
出版情報: Pittsburgh, Pa. : Materials Research Society, c1991  ix, 399 p. ; 24 cm
シリーズ名: Materials Research Society symposium proceedings ; v. 227
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3.

図書
図書
3. Polymers for high technology : electronics and photonics
Murrae J. Bowden, editor, S. Richard Turner, editor ; developed from a symposium sponsored by the Division of Polymeric Materials--Science and Engineering at the 192nd Meeting of the American Chemical Society, Anaheim, California, September 7-12, 1986
出版情報: Washington, DC : American Chemical Society, 1987  x, 628 p. ; 24 cm
シリーズ名: ACS symposium series ; 346
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目次情報: 続きを見る
Development of Radiation Chemistry Ionizing
Radiation on Condensed Systems
Radiation Effects in Polymers Main
Reactions of Chlorine- and Silicon-Containing Resists
Relations Between Photochemistry and Radiation Chemistry
Characteristics of a Two-layer Resist System
Phenolic Resin-Based Negative Resists
Electron-Beam Sensitivity of Acrylate Resists
A ""One-Layer"" Multilayer Resist
Silicon-Containing Electron-Beam Resist
Systems Lithographic Evaluation of Copolymers Acid-Catalyzed Thermo
Development of Radiation Chemistry Ionizing
Radiation on Condensed Systems
Radiation Effects in Polymers Main
4.

図書
図書
4. Polymeric materials for microelectronic applications : science and technology
Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor
出版情報: Washington, DC : American Chemical Society, 1994  ix, 468 p. ; 24 cm
シリーズ名: ACS symposium series ; 579
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Photophysics, Photochemistry, and Photo-optical Effects in Polymer Solids / K. Horie
Photochemistry of Liquid-Crystalline Polymers / D. Creed ; R. A. Coad ; A.C. Griffin ; C. E. Hoyle ; L. Jin ; P. Subramanian ; S. V. Varma ; K. Venkataram
Dissociative Electron Capture of Polymers with Bridging Acid Anhydrides: Matrix Isolation Electron Spin Resonance Study / P.H. Kasai
Luminescence Study of Ion-Irradiated Aromatic Polymers / Y.Aoki ; H. Namba ; F. Hosoi ; S. Nagai
New Directions in the Design of Chemically Amplified Resist / E.Reichmanis ; M.E. Galvin ; K. E. Uhrich ; P. Mirau ; S. A. Heffner:
Dual-Tone and Aqueous Base Developable Negative Resists Based on Acid-Catalyzed Dehydration / H.Ito ; Y. Maekawa
Importance of Donor-Acceptor Reactions for the Photogeneration of Acid in Chemically Amplified Resists / N.P. Hacker
Acid Generation in Chemivcally Amplified Resist Films / T.Watanabe ; Y. Yamashita ; T. Kozawa ; Y. Yoshida ; S. Tagawa
Radiation-Induced Reactions of Onium Salts in Novolak / M. Uesaka ; T. Watanabe ; Y.Yamashita ; H. Shibata
Polymeric Sulfonium Salts as Acid Generators for Excimer Laser Lithography / K. Maeda ; K. Nakano ; E. Hasegawa
Application of Triaryl Phosphate to Photosensitive Materials: Photoreaction Mechanisms of Triaryl Phosphate / I. Naito ; A. Kinoshita ; Y. Okamoto ; S. Takamuku
Effect of Water on the Surface Insoluble Layer of Chemical Amplified Positive Resists / J. Nakamura ; H. Ban ; Y. Kawai ; A. Tanaka
Thermal Properties of a Chemically Amplified Resist Resin / K. Asakawa ; A. Hongu ; N. Oyasato ; M. Nakase
Modeling and Simulation of Chemically Amplified Resist Systems / T. Ushirogouchi ; H. Wakabayashi ; S. Saito
Surface Imaging Using Photoinduced Acid-Catalyzed Formation of Polysiloxanes at Air-Polymer Interface / M. Shirai ; T. Sumino ; M. Tsunooka
Surface Imaging for Applications to Sub-0.35-mm Lithography / K.-H. Baik ; L. Van den hove
Molecular Design of Epoxy Resins for Microelectronics Packaging / M. Kaji
Uniaxial and In-Plane Molecular Orientation of Polymides and Their Precursor: Studied by Absorption Dichroism of Perylenebisimide Dye / M. Hasegawa ; T. Matan ; Y. Shindo ; T. Sugimura
Novel Photosensitive Polyimide Precursor Based on Polyisoimide Using Nifedipine as A Dissolution Inhibitor / A. Mochizuki ; T. Teraniishi ; M. Ueda ; T. Omote
Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitsive Polyimides / T. Yamaoka ; S. Yokoyama ; K. Naitoh ; K. Yoshida
Waveguiding in High-Temperature-Stable Materials / C. Feger ; S. Perutz ; R. Reuter ; J.E. McGrath ; M. Osterfeld ; H. Franke
Rodlike Fluorinated Polyimide as in In-Plane Birefringent Optical Material / S. Ando ; T. Sawada ; Y. Inoue
Preparation of Polyphenylene and Copolymer for Microelectronics Applications / N.A. Johnen ; H.K. Kim ; C. K. Ober
Charge-Carrier Generation and Migration in a Polydiacetylene compound: Pulse Radiolysis, Time-Resolved Microwave Conductivity Study / G.P. van der Laan ; M.P. de Haas ; J.M. Warman ; D.M. de Leeuw ; J. Tsibouklis
Excitation Dynamics in Conjugated Polymers / H.ssler ; E.O. Gbel ; A. Greiner ; R. Kersting ; H. Kurz ; U. Lemmer ; R.F. Mahrt ; Y. Wada
Application of Polyaniline Films to Radiation Dosimetry / Y. Oki ; T. Suzuki ; T. Miura ; M. Numajiri ; K. Kondo
Present and Future of Fullerenes: C60 nd Tubules / K. Tanigaki
Photoresponsive Liquid-Crystalline Polymers: Holographic Storage, Digital Storage, and Holographic Optical Components / K. Anderle ; J. H. Wendorff
Azimuthal Alighment Photocontrol of Piquid Crystals / K. Ichimura
Electronic Structure and UV Absorption Spectra of Permethylated Silicon Chains / H.S. Plitt ; J.W. Downing ; H. Teramae ; M.K. Raymond ; J. Michl
Electronic Properties of Polysilanes / K. Seki ; A.Yuyama ; S. Narioka ; H. Ishii ; S. Hasegawa ; H. Isaka ; M. Fujino ; M. Fujiki ; N. Matsumoto ; R. G. Kepler ; Z.G Soos
UV Photoelectron Spectroscopy of Polysilanes and Polygermanes / A. Watanabe ; M. Matsuda ; Y. Yosh
Photophysics, Photochemistry, and Photo-optical Effects in Polymer Solids / K. Horie
Photochemistry of Liquid-Crystalline Polymers / D. Creed ; R. A. Coad ; A.C. Griffin ; C. E. Hoyle ; L. Jin ; P. Subramanian ; S. V. Varma ; K. Venkataram
Dissociative Electron Capture of Polymers with Bridging Acid Anhydrides: Matrix Isolation Electron Spin Resonance Study / P.H. Kasai
5.

図書
図書
5. Polymers for microelectronics and nanoelectronics
editors, Qinghuang Lin, Raymond A. Pearson, Jeffrey C. Hedrick
出版情報: Washington, D.C. : American Chemical Society, c2004  xii, 335 p. ; 24 cm
シリーズ名: ACS symposium series ; 874
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目次情報: 続きを見る
Preface
Recent Progress in Materials for Organic Electronics / Zhenan Bao1.：
PPV Nanotubes, Nanorods, and Nanofilms as well as Carbonized Objects Derived Therefrom / Kyungkon Kim ; Guolun Zhong ; Jung-Il Jin ; Jung Ho Park ; Seoung Hyun Lee ; Dong Woo Kim ; Yung Woo Park ; Whikun Yi2.：
Layer-by-Layer Assembly of Molecular Materials for Electrooptical Applications / M. E. van der Boom ; T. J. Marks3.：
Oxidative Solid-State Cross-Linking of Polymer Precursors to Pattern Intrinsically Conducting Polymers / Sung-Yeon Jang ; Manuel Marquez ; Gregory A. Sotzing4.：
Fluorocarbon Polymer-Based Photoresists for 157-nm Lithography / T. H. Fedynyshyn ; W. A. Mowers ; R. R. Kunz ; R. F. Sinta ; M. Sworin ; A. Cabral ; J. Curtin5.：
157-nm Resist Materials Using Main-Chain Fluorinated Polymers / Toshiro Itani ; Hiroyuki Watanabe ; Tamio Yamazaki ; Seiichi Ishikawa ; Naomi Shida ; Minoru Toriumi6.：
Correlation of the Reaction Front with Roughness in Chemically Amplified Photoresists / Ronald L. Jones ; Vivek M. Prabhu ; Dario L. Goldfarb ; Eric K. Lin ; Christopher L. Soles ; Joseph L. Lenhart ; Wen-li Wu ; Marie Angelopoulos7.：
Utilizing Near Edge X-ray Absorption Fine Structure to Probe Interfacial Issues in Photolithography / Daniel A. Fischer ; Sharadha Sambasivan8.：
Photolabile Ultrathin Polymer Films for Spatially Defined Attachment of Nano Elements / B. Voit ; F. Braun ; Ch. Loppacher ; S. Trogisch ; L. M. Eng ; R. Seidel ; A. Gorbunoff ; W. Pompe ; M. Mertig9.：
Soft Lithography on Block Copolymer Films: Generating Functionalized Patterns on Block Copolymer Films as a Basis to Further Surface Modification / Martin Brehmer ; Lars Conrad ; Lutz Funk ; Dirk Allard ; Patrick Theato ; Anke Helfer10.：
Nanoporous, Low-Dielectric Constant Organosilicate Materials Derived from Inorganic Polymer Blends / R. D. Miller ; W. Volksen ; V. Y. Lee ; E. Connor ; T. Magbitang ; R. Zafran ; L. Sundberg ; C. J. Hawker ; J. L. Hedrick ; E. Huang ; M. Toney ; Q. R. Huang ; C. W. Frank ; H.-C. Kim11.：
Porous Low-k Dielectrics: Material Properties / C. Tyberg ; J. Hedrick ; E. Simonyi ; S. Gates ; S. Cohen ; K. Malone ; H. Wickland ; M. Sankarapandian ; R. Miller ; P. Rice ; L. Lurio12.：
Ultra Low-k Dielectric Films with Ultra Small Pores Using Poragens Chemically Bonded to Siloxane Resin / Bianxiao Zhong ; Eric S. Moyer13.：
Design of Nanoporous Polyarylene Polymers for Use as Low-k Dielectrics in Microelectronic Devices / H. Craig Silvis ; Kevin J. Bouck ; James P. Godschalx ; Q. Jason Niu ; Michael J. Radler ; Ted M. Stokich ; John W. Lyons ; Brandon J. Kern ; Joan G. Marshall ; Karin Syverud ; Mary Leff14.：
Molecular Brushes as Templating Agents for Nanoporous SiLK* Dielectric Films / Steven J. Martin ; Paul H. Townsend15.：
X-ray Reflectivity as a Metrology to Characterize Pores in Low-k Dielectric Films / Hae-Jeong Lee ; Ronald C. Hedden ; Da-wei Liu ; Barry J. Bauer16.：
Micro- and Nanoporous Materials Developed Using Supercritical CO[subscript 2]: Novel Synthetic Methods for the Development of Micro- and Nanoporous Materials Toward Microelectronic Applications / Sara N. Paisner ; Joseph M. DeSimone17.：
Thermally Degradable Photocross-Linking Polymers / Masamitsu Shirai ; Satoshi Morishita ; Akiya Kawaue ; Haruyuki Okamura ; Masahiro Tsunooka18.：
Evaluation of Infrared Spectroscopic Techniques to Asses Molecular Interactions / Robert K. Oldak ; Raymond A. Pearson19.：
Study on Metal Chelates as Catalysts of Epoxy and Anhydride Cure Reactions for No-Flow Underfill Applications / Zhuqing Zhang ; C. P. Wong20.：
Benzocyclobutene-Based Polymers for Microelectronic Applications / Ying-Hung So ; Phil E. Garrou ; Jang-Hi Im ; Karou Ohba21.：
Formation of Nanocomposites by In Situ Intercalative Polymerization of 2-Ethynylpyrdine in Layered Aluminosilicates: A Solid-State NMR Study / A. L. Cholli ; S. K. Sahoo ; D. W. Kim ; J. Kumar ; A. Blumstein22.：
Indexes
Author Index
Subject Index
Preface
Recent Progress in Materials for Organic Electronics / Zhenan Bao1.：
PPV Nanotubes, Nanorods, and Nanofilms as well as Carbonized Objects Derived Therefrom / Kyungkon Kim ; Guolun Zhong ; Jung-Il Jin ; Jung Ho Park ; Seoung Hyun Lee ; Dong Woo Kim ; Yung Woo Park ; Whikun Yi2.：
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