| Applications of Photoinitiated Cationic Polymerization to the Development of New Photoresists / Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing / Semiempirical Calculations of Electronic Spectra: Use in the Design of Mid-UV Sensitizers / Mid-UV Photosensitization of Diazoquinone Positive Photoresists / Deep UV Photolithography with Composite Photoresists Made of Poly(olefin sulfones) / Method for a Comparative Study of Positive Photoresist Lithographic Performance / Dependence of Dissolution Rate on Processing and Molecular Parameters of Resists / Effect of Composition on Resist Dry-Etching Susceptibility: Novel Vinyl Polymers / Resists for Electron Beam Lithography / Chain-Scission Yields of Methacrylate Copolymers Under Electron Beam Radiation / Poly(tetrafluorochloropropyl methacrylate) as Positive Electron Resist / Radiation-Induced Degradation of Poly(2-methyl-1-pentene sulfone): Kinetics and Mechanism / The Radiation Degradation of Poly(2-methyl-1-pentene sul / CRIVELLO, J. V. / ITO, HIROSHI; WILLSON, C. GRANT / MILLER, R. D.; MCKEAN, D. R.; TOMPKINS, T. L.; CLECAK, N.; WILLSON, C. GRANT; MICHL, J.; DOWNING, J. / BABIE, W. T.; CHOW, M-F.; MOREAU, W. M. / HIRAOKA, H.; WELSH, L. W. / WALKER, C. C.; HELBERT, J. N. / |
| Plasma Polymerized Organometallic Thin Films: Preparation and Properties / Polyacetylene, (CH)x: An Electrode-Active Material in Aqueous and Nonaqueous Electrolytes / / SADHIR, R. K.; SAUNDERS, H. E.; JAMES, W. J. / KANER, R. B.; MACDIARMID, A. G.; MAMMONE, R. J. / |
| Applications of Photoinitiated Cationic Polymerization to the Development of New Photoresists / Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing / Semiempirical Calculations of Electronic Spectra: Use in the Design of Mid-UV Sensitizers / Mid-UV Photosensitization of Diazoquinone Positive Photoresists / Deep UV Photolithography with Composite Photoresists Made of Poly(olefin sulfones) / Method for a Comparative Study of Positive Photoresist Lithographic Performance / Dependence of Dissolution Rate on Processing and Molecular Parameters of Resists / Effect of Composition on Resist Dry-Etching Susceptibility: Novel Vinyl Polymers / Resists for Electron Beam Lithography / Chain-Scission Yields of Methacrylate Copolymers Under Electron Beam Radiation / Poly(tetrafluorochloropropyl methacrylate) as Positive Electron Resist / Radiation-Induced Degradation of Poly(2-methyl-1-pentene sulfone): Kinetics and Mechanism / The Radiation Degradation of Poly(2-methyl-1-pentene sul / CRIVELLO, J. V. / ITO, HIROSHI; WILLSON, C. GRANT / MILLER, R. D.; MCKEAN, D. R.; TOMPKINS, T. L.; CLECAK, N.; WILLSON, C. GRANT; MICHL, J.; DOWNING, J. / BABIE, W. T.; CHOW, M-F.; MOREAU, W. M. / HIRAOKA, H.; WELSH, L. W. / WALKER, C. C.; HELBERT, J. N. / |
| Plasma Polymerized Organometallic Thin Films: Preparation and Properties / Polyacetylene, (CH)x: An Electrode-Active Material in Aqueous and Nonaqueous Electrolytes / / SADHIR, R. K.; SAUNDERS, H. E.; JAMES, W. J. / KANER, R. B.; MACDIARMID, A. G.; MAMMONE, R. J. / |
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