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1.

図書
図書
1. Materials for microlithography : radiation-sensitive polymers
L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor ; based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984
出版情報: Washington, D.C. : The Society, 1984  viii, 494 p. ; 24 cm
シリーズ名: ACS symposium series ; 266
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2.

図書
図書
2. Electronic and photonic applications of polymers
Murrae J. Bowden, editor, S. Richard Turner, editor
出版情報: Washington, DC : American Chemical Society, 1988  xiii, 372 p. ; 24 cm
シリーズ名: Advances in chemistry series ; 218
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3.

図書
図書
3. Polymers for high technology : electronics and photonics
Murrae J. Bowden, editor, S. Richard Turner, editor ; developed from a symposium sponsored by the Division of Polymeric Materials--Science and Engineering at the 192nd Meeting of the American Chemical Society, Anaheim, California, September 7-12, 1986
出版情報: Washington, DC : American Chemical Society, 1987  x, 628 p. ; 24 cm
シリーズ名: ACS symposium series ; 346
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目次情報: 続きを見る
Development of Radiation Chemistry Ionizing
Radiation on Condensed Systems
Radiation Effects in Polymers Main
Reactions of Chlorine- and Silicon-Containing Resists
Relations Between Photochemistry and Radiation Chemistry
Characteristics of a Two-layer Resist System
Phenolic Resin-Based Negative Resists
Electron-Beam Sensitivity of Acrylate Resists
A ""One-Layer"" Multilayer Resist
Silicon-Containing Electron-Beam Resist
Systems Lithographic Evaluation of Copolymers Acid-Catalyzed Thermo
Development of Radiation Chemistry Ionizing
Radiation on Condensed Systems
Radiation Effects in Polymers Main
4.

図書
図書
4. Introduction to microlithography : theory, materials, and processing
L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983
出版情報: Washington, D.C. : The American Chemical Society, 1983  ix, 363 p. ; 24 cm
シリーズ名: ACS symposium series ; 219
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目次情報: 続きを見る
An introduction to lithography / L.F. Thompson
The lithographic process
The physics / L.F. Thompson and M.J. Bowden
Organic resist materials
Theory and chemistry / C. Grant Willson
Resist processing / L.F. Thompson and M.J. Bowden
Plasma etching / J.A. Mucha and D.W. Hess
Multi-layer resist systems / B.J. Lin
An introduction to lithography / L.F. Thompson
The lithographic process
The physics / L.F. Thompson and M.J. Bowden
5.

図書
図書
5. Microelectronics technology : polymers in advanced imaging and packaging : developed from a symposium sponsored by the ACS Division of Polymeric Materials: Science and Engineering, Inc., and the Polymers for Microelectronics Division of the Society of Polymer Science, Japan, at the 209th National Meeting of the American Chemical Society, Anaheim, California, April 2-6, 1995
Elsa Reichmanis, editor... [et al.]
出版情報: Washington, D.C. : American Chemical Society, 1995  xii, 563 p. ; 24 cm
シリーズ名: ACS symposium series ; 614
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目次情報: 続きを見る
An Analysis of Process Issues with Chemically Amplified Positive Resists / O. Nalamasu ; A.G. Timko ; E. Reichmanis ; F.M. Houlihan ; A.E. Novembre ; R. Tarascon ; N. Mnzel ; S.G. Slater
The Annealing Concept for Environmental Stabilization of Chemical Amplification Resists / H. Ito ; G. Breyta ; D.C. Hofer ; R. Sooriyakumaran
Structure-Property Relationship of Acetal- and Ketal-Blocked Polyvinyl Phenols as Polymeric Binder in Two-Component Positive Deep-UV Photoresists / C. Mertesdorf ; N, Mnzel ; P. Falcigno ; H.J. Kirner ; B. Nathal ; H.T. Schacht ; R. Schulz ; A. Zettler
Lithographic Effects of Acid Diffusion in Chemically Amplified Resists / C.A. Mack
Acid Diffusion in Chemically Amplified Resists: The Effect of Prebaking and Post-Exposure Baking Temperature / J. Nakamura ; H. Ban ; A. Tanaka
Correlation of the Strength of Photogenerated Acid with the Post-Exposure Delay Effect in Positive-Tone Chemically Amplified Deep-UV Resists / E. Chin ; J.M. Kometani ; R. Harley
Following the Acid: Effect of Acid Surface Depletion on Phenolic Polymers / J.W. Thackeray ; M.D. Denison ; T.H. Fedynyshyn ; D. Kang ; R. Sinta
Water-Soluble Onium Salts: New Class of Acid Generators for Chemical Amplification Positive Resists / T. Sakamizu ; H. Shiraishi ; T. Ueno
Photoacid and Photobase Generators: Arylmethyl Sulfones and Benzyhydrylammonium Salts / J.E. Hanson ; K.H. Jensen ; N. Gargiulo ; D. Motta ; D.A. Pingor ; D.A. Mixon ; C. Knurek
Functional Imaging with Chemically Amplified Resists / A. M. Vekselman ; C. Zhang ; G.D. Darling
Hydrogen Bonding in Sulfone- and N-Methylmaleimide-Containing Resist Polymers with Hydroxystyrene and Acetoxystyrene: Two-Dimensional NMR Studies / S. A. Heffner ; M. E. Galvin ; L. Gerena ; P. A. Mirau
NMR Investigation of Miscibility in Novolac-Poly(2-methyl-1-pentene sulfone) Resists / A. E. Novembre ; P.A. Mirau
Styrylmethylsulfonamides: Versatile Base-Solubilizing Components of Photoresist Resins / T.X. Neenan ; E.A. Chandross
4-Methanesulfonyloxystyrene: A Means of Improving the Properties of tert-Butoxycarbonyloxystyrene-Based Polymers for Chemically Amplified Deep-UV Resists
Dienone-Phenol Rearrangement Reaction: Design Pathway for Chemically Amplified Photoresists / Y. Jiang ; J. Maher ; D. Bassett
Single-Layer Resist for ArF Excimer Laser Exposure Containing Aromatic Compounds / T. Ushirogouchi ; T. Naito ; K. Asakawa ; N. Shida ; M. Nakase ; T. Tada
Design Considerations for 193-nm Positive Resists / R.D. Allen ; I-Y. Wan ; G. M. Wallraff ; R. A. DiPietro ; R.R. Kunz
Top-Surface Imaged Resists for 193-nm Lithography / R. R. Kunz ; S.C. Palmateer ; M.W. Horn ; A. R. Forte ; M. Rothschild
Silicon-Containing Block Copolymer Resist Materials / A.H. Gabor ; C.K. Ober
A Top-Surface Imaging Approach Based on the Light-Induced Formation of Dry-Etch Barriers / U. Schaedeli ; M. Hofmann ; E. Tinguely
Plasma-Developable Photoresist System Based on Polysiloxane Formation at the Irradiated Surface: A Liquid-Phase Deposition Method / M. Shirai ; N. Nogi ; M. Tsunooka ; T. Matsuo
New Polysiloxanes for Chemically Amplified Resist Applications / J.C. van de Grampel ; R. Puyenbroek ; A. Meetsma ; B.A. C. Rousseeuw ; E.W.J.M. van der Drift
Environmentally Friendly Polysilane Photoresists / J.V. Beach ; D. A. Loy ; Yu-Ling Hsiao ; R. M. Waymouth
Fluoropolymers with Low Dielectric Constants: Triallyl Ether-Hydrosiloxane Resins / H.S.-W. Hu ; J.R. Griffith ; L.J. Buckley ; A.W. Snow
Photophysics, Photochemistry, and Intramolecular Charge Transfer of Polyimides / M. Hasegawa ; Y. Shindo ; T. Sugimura
Structure, Properties, and Intermolecular Charge Transfer of Polyimides / J. Ishii ; T. Matano ; T. Miwa ; M. Ishida ; Y. Okabe ; A. Takahashi
Application of Polyisoimide as a / A. Mochizuki ; M. Ueda
An Analysis of Process Issues with Chemically Amplified Positive Resists / O. Nalamasu ; A.G. Timko ; E. Reichmanis ; F.M. Houlihan ; A.E. Novembre ; R. Tarascon ; N. Mnzel ; S.G. Slater
The Annealing Concept for Environmental Stabilization of Chemical Amplification Resists / H. Ito ; G. Breyta ; D.C. Hofer ; R. Sooriyakumaran
Structure-Property Relationship of Acetal- and Ketal-Blocked Polyvinyl Phenols as Polymeric Binder in Two-Component Positive Deep-UV Photoresists / C. Mertesdorf ; N, Mnzel ; P. Falcigno ; H.J. Kirner ; B. Nathal ; H.T. Schacht ; R. Schulz ; A. Zettler
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