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1.

図書
図書
1. Advances in resist technology and processing IV : 2-3 March 1987, Santa Clara, California (pbk.)
Murrae J. Bowden, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
出版情報: Bellingham, Wash., USA : SPIE, c1987  vi, 367 p. ; 28 cm
シリーズ名: Proceedings / SPIE -- the International Society for Optical Engineering ; v. 771
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2.

図書
図書
2. Electronic and photonic applications of polymers
Murrae J. Bowden, editor, S. Richard Turner, editor
出版情報: Washington, DC : American Chemical Society, 1988  xiii, 372 p. ; 24 cm
シリーズ名: Advances in chemistry series ; 218
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3.

図書
図書
3. Polymers for high technology : electronics and photonics
Murrae J. Bowden, editor, S. Richard Turner, editor ; developed from a symposium sponsored by the Division of Polymeric Materials--Science and Engineering at the 192nd Meeting of the American Chemical Society, Anaheim, California, September 7-12, 1986
出版情報: Washington, DC : American Chemical Society, 1987  x, 628 p. ; 24 cm
シリーズ名: ACS symposium series ; 346
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目次情報: 続きを見る
Development of Radiation Chemistry Ionizing
Radiation on Condensed Systems
Radiation Effects in Polymers Main
Reactions of Chlorine- and Silicon-Containing Resists
Relations Between Photochemistry and Radiation Chemistry
Characteristics of a Two-layer Resist System
Phenolic Resin-Based Negative Resists
Electron-Beam Sensitivity of Acrylate Resists
A ""One-Layer"" Multilayer Resist
Silicon-Containing Electron-Beam Resist
Systems Lithographic Evaluation of Copolymers Acid-Catalyzed Thermo
Development of Radiation Chemistry Ionizing
Radiation on Condensed Systems
Radiation Effects in Polymers Main
4.

図書
図書
4. Introduction to microlithography : theory, materials, and processing
L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983
出版情報: Washington, D.C. : The American Chemical Society, 1983  ix, 363 p. ; 24 cm
シリーズ名: ACS symposium series ; 219
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目次情報: 続きを見る
An introduction to lithography / L.F. Thompson
The lithographic process
The physics / L.F. Thompson and M.J. Bowden
Organic resist materials
Theory and chemistry / C. Grant Willson
Resist processing / L.F. Thompson and M.J. Bowden
Plasma etching / J.A. Mucha and D.W. Hess
Multi-layer resist systems / B.J. Lin
An introduction to lithography / L.F. Thompson
The lithographic process
The physics / L.F. Thompson and M.J. Bowden
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