Nanotechnology : an introduction to nanostructuring techniques

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Nanotechnology : an introduction to nanostructuring techniques / Michael Köhler, Wolfgang Fritzsche

資料種別:

図書

出版情報:

Weinheim : Wiley-VCH, c2004

形態:

ix, 272 p ; 25 cm

著者名:

ISBN:

9783527307500 [3527307508]

書誌ID:

BA67445674

子書誌情報

フルテキスト

所蔵情報

他の版・巻

書誌詳細

注記:

Includes bibliographical references and index

主題:

Nanostructures; Nanotechnology

言語:

英語

目次情報:

Introduction / 1：

The Way into the Nanoworld / 1.1：

From Micro- to Nanotechniques / 1.1.1：

Definition of Nanostructures / 1.1.2：

Insight into the Nanoworld / 1.1.3：

Intervention into the Nanoworld / 1.1.4：

Building Blocks of Nanotechnology / 1.2：

Interactions and Topology / 1.3：

The Microscopic Environment of the Nanoworld / 1.4：

Molecular Basics / 2：

Particles and Bonds / 2.1：

Chemical Bonds in Nanotechnology / 2.1.1：

Van der Waals Interactions / 2.1.2：

Dipole-Dipole Interactions / 2.1.3：

Ionic Interactions / 2.1.4：

Metal Bonds / 2.1.5：

Covalent Bonds / 2.1.6：

Coordinative Bonds / 2.1.7：

Hydrogen Bridge Bonds / 2.1.8：

Polyvalent Bonds / 2.1.9：

Chemical Structure / 2.2：

Binding Topologies / 2.2.1：

Building Blocks of Covalent Architecture / 2.2.2：

Units for a Coordinated Architecture / 2.2.3：

Building Blocks for Weakly Bound Aggregates / 2.2.4：

Assembly of Complex Structures through the Internal Hierarchy of Binding Strengths / 2.2.5：

Reaction Probability and Reaction Equilibrium / 2.2.6：

Microtechnological Foundations / 3：

Planar Technology / 3.1：

Preparation of Thin Layers / 3.2：

Condition and Preprocessing of the Substrate Surface / 3.2.1：

Layer Deposition from the Gas Phase / 3.2.2：

Evaporation / 3.2.3：

Sputtering / 3.2.4：

Chemical Vapor Deposition / 3.2.5：

Galvanic Deposition / 3.2.6：

Deposition by Spinning (Spin Coating) / 3.2.7：

Shadow-mask Deposition Techniques / 3.2.8：

Preparation of Ultrathin Inorganic Layers and Surface-bound Nanoparticles / 3.3：

Ultrathin Layers by Vacuum Deposition Processes / 3.3.1：

Deposition of Ultrathin Films from the Liquid Phase / 3.3.2：

In Situ Generation of Ultrathin Inorganic Films by Chemical Surface Modification / 3.3.3：

In Situ Formation of Ultrathin Inorganic Layers on Heteroorganic Materials / 3.3.4：

Immobilization of Nanoparticles / 3.3.5：

In Situ Formation of Inorganic Nanoparticles / 3.3.6：

Structure Generation and Fabrication of Lithographic Masks / 3.4：

Adhesive Mask Technique / 3.4.1：

Role of Resist in Photolithography / 3.4.2：

Serial Pattern Transfer / 3.4.3：

Group Transfer Processes / 3.4.4：

Maskless Structure Generation / 3.4.5：

Soft Lithography / 3.4.6：

Etching Processes / 3.5：

Etching Rate and Selectivity / 3.5.1：

Isotropic and Anisotropic Etching Processes / 3.5.2：

Lithographic Resolution in Etching Processes / 3.5.3：

Wet Etching Processes / 3.5.4：

Dry Etching Processes / 3.5.5：

High-resolution Dry Etching Techniques / 3.5.6：

Choice of Mask for Nanolithographic Etching Processes / 3.5.7：

Packaging / 3.6：

Biogenic and Bioanalogue Molecules in Technical Microstructures / 3.7：

Preparation of Nanostructures / 4：

Principles of Fabrication / 4.1：

Subtractive and Additive Creation of Nanostructures / 4.1.1：

Nanostructure Generation by Lift-off Processes / 4.1.2：

Principles of Nanotechnical Shape-definition and Construction / 4.1.3：

Nanomechanical Structure Generation / 4.2：

Scaling Down of Mechanical Processing Techniques / 4.2.1：

Local Mechanical Cutting Processes / 4.2.2：

Surface Transport Methods / 4.2.3：

Reshaping Processes / 4.2.4：

Printing Processes / 4.2.5：

Nanolithography / 4.3：

Structure Transfer by Electromagnetic Radiation / 4.3.1：

Nanolithographic Transfer of Groups of Elements by Optical Projection / 4.3.2：

EUV and X-ray Lithography / 4.3.3：

Multilayer Resists Techniques with Optical Pattern Transfer / 4.3.4：

Near-field Optical Structure Techniques with Contact Masks / 4.3.5：

Energetic Particles in Nanolithographic Structure Transfer / 4.3.6：

Electron Beam Lithography / 4.3.7：

Ion Beam Lithography / 4.3.8：

Atomic Beam Lithography / 4.3.9：

Molecular and Nanoparticle Beam Lithography / 4.3.10：

Direct Writing of Structures by a Particle Beam / 4.3.11：

Single-particle Beam Processes / 4.3.12：

Nanofabrication by Self-structuring Masks / 4.3.13：

Nanofabrication by Scanning Probe Techniques / 4.4：

Scanning Force Probes / 4.4.1：

Particle Manipulation With a Scanning Tunneling Microscope (STM) / 4.4.2：

Thermo-mechanical Writing of Nanostructures / 4.4.3：

Electrically Induced Structure Generation by Scanning Probe Techniques / 4.4.4：

Chemical Electrodeless Induced Scanning Probe Structure Generation / 4.4.5：

Nanostructure Generation by Optical Near-field Probes / 4.4.6：

Nanotechnical Structures / 5：

Inorganic Solids / 5.1：

Influence of Material Morphology on Nanoscale Pattern Processes / 5.1.1：

Inorganic Dielectrics / 5.1.2：

Metals / 5.1.3：

Semiconductors / 5.1.4：

Carbon / 5.1.5：

Organic Solids and Layer Structures / 5.2：

Solids Composed of Smaller Molecules / 5.2.1：

Organic Monolayer and Multilayer Stacks / 5.2.2：

Synthetic Organic Polymers / 5.2.3：

Biopolymers / 5.2.4：

Molecular Monolayer and Layer Architectures / 5.3：

Langmuir-Blodgett Films / 5.3.1：

Self-assembled Surface Films / 5.3.2：

Binding of Molecules on Solid Substrate Surfaces / 5.3.3：

Secondary Coupling of Molecular Monolayers / 5.3.4：

Categories of Molecular Layers / 5.3.5：

Molecular Coupling Components (Linkers) and Distance Components (Spacers) / 5.3.6：

Definition of Binding Spots on Solid Substrates / 5.3.7：

Architectures with Single Molecules / 5.4：

Single Molecules as Nanostructures / 5.4.1：

Strategies of Molecular Construction / 5.4.2：

Biogenic and Bioanalogous Nanoarchitectures / 5.4.3：

DNA Nanoarchitectures / 5.4.4：

Synthetic Supramolecules / 5.4.5：

Nanoparticles and Nanocompartments / 5.4.6：

Combination of Molecular Architectures and Nanoparticles with Planar Technical Structures / 5.5：

Characterization of Nanostructures / 6：

Geometrical Characterization / 6.1：

Layer Thickness and Vertical Structure Dimensions / 6.1.1：

Lateral Dimensions / 6.1.2：

Structures that Assist Measurement / 6.1.3：

Characterization of Composition of Layers and Surfaces / 6.2：

Atomic Composition / 6.2.1：

Characterization of the Chemical Surface / 6.2.2：

Functional Characterization of Nanostructures / 6.3：

Nanotransducers / 7：

Design of Nanotransducers / 7.1：

Nanomechanical Elements / 7.2：

Nanomechanical Sensors / 7.2.1：

Nanometer-precision Position Measurements with Conventional Techniques / 7.2.2：

Electrically Controlled Nanoactuators / 7.2.3：

Chemically Driven Nanoactuators / 7.2.4：

Rigidity of Nanoactuators / 7.2.5：

Nanoelectronic Devices / 7.3：

Electrical Contacts and Nanowires / 7.3.1：

Nanostructured Tunneling Barriers / 7.3.2：

Quantum Dots and Localization of Elementary Particles / 7.3.3：

Nanodiodes / 7.3.4：

Electron Islands and Nanotransistors / 7.3.5：

Nanoswitches, Molecular Switches and Logic Elements / 7.3.6：

Nanooptical Devices / 7.4：

Nanostructures as Optical Sensors / 7.4.1：

Nanostructured Optical Actuators / 7.4.2：

Nanooptical Switching and Conversion Elements / 7.4.3：

Magnetic Nanotransducers / 7.5：

Chemical Nanoscale Sensors and Actuators / 7.6：

Technical Nanosystems / 8：

What are Nanosystems? / 8.1：

Systems with Nanocomponents / 8.2：

Entire Systems with Nanometer Dimensions / 8.3：

Table of Examples

References

Index

Introduction / 1：

The Way into the Nanoworld / 1.1：

From Micro- to Nanotechniques / 1.1.1：

Definition of Nanostructures / 1.1.2：

Insight into the Nanoworld / 1.1.3：

Intervention into the Nanoworld / 1.1.4：

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